Table of Contents Alert for Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures

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Journal of Vacuum Science & Technology B (Microelectronics and Nanometer Structures)

November 2010

Volume 28, Issue 6, pp. L61-C6S27

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Letters
	Sputtering of (001)AlN thin films: Control of polarity by a seed layer E. Milyutin, S. Harada, D. Martin, J. F. Carlin, N. Grandjean, V. Savu, O. Vaszquez-Mena, J. Brugger, and P. Muralt pp. L61-L63 Abstract   Full Text: [ Read Online (HTML)   PDF  (228 kB)  ]    Order
Editorial
	Editorial Gerry Lucovsky p. P1 Abstract   Full Text: [ Read Online (HTML)   PDF  (28 kB)  ]    Order
Regular Articles
	Different growth mechanisms of vertical carbon nanotubes by rf- or dc-plasma enhanced chemical vapor deposition at low temperature Huiyao Wang and John J. Moore pp. 1081-1085 Abstract   Full Text: [ Read Online (HTML)   PDF  (526 kB)  ]    Order
	Influence of the tip work function on scanning tunneling microscopy and spectroscopy on zinc doped GaAs A. P. Wijnheijmer, J. K. Garleff, M. A. v. d. Heijden, and P. M. Koenraad pp. 1086-1092 Abstract   Full Text: [ Read Online (HTML)   PDF  (599 kB)  ]    Order
	Field-emission of TiSi2 thin film deposited by an in situ chloride-generated route Yemin Hu, Ying Li, Mingyuan Zhu, Zheng Hu, and Leshu Yu pp. 1093-1096 Abstract   Full Text: [ Read Online (HTML)   PDF  (270 kB)  ]    Order
	Characterization of electrodeposited Ni–Fe–SiC alloys for microelectromechanical applications Xiaohu Zheng, Xing Chen, Feng Gu, YuanWei Liu, and Dong-Weon Lee pp. 1097-1099 Abstract   Full Text: [ Read Online (HTML)   PDF  (221 kB)  ]    Order
	UV ozone passivation of the metal/dielectric interface for HfO2-based organic thin film transistors W. M. Tang, W. T. Ng, M. G. Helander, M. T. Greiner, and Z. H. Lu pp. 1100-1103 Abstract   Full Text: [ Read Online (HTML)   PDF  (249 kB)  ]    Order
	Surface and near-surface modifications of ultralow dielectric constant materials exposed to plasmas under sidewall-like conditions Ming-Shu Kuo and G. S. Oehrlein pp. 1104-1110 Abstract   Full Text: [ Read Online (HTML)   PDF  (476 kB)  ]    Order
	Growth of size and density controlled GaAs/InxGa1−xAs/GaAs (x=0.10) nanowires on anodic alumina membrane-assisted etching of nanopatterned GaAs Aloysius A. Gunawan, S. Jha, and T. F. Kuech pp. 1111-1119 Abstract   Full Text: [ Read Online (HTML)   PDF  (694 kB)  ]    Order
	Complex dielectric function and refractive index spectra of epitaxial CdO thin film grown on r-plane sapphire from 0.74 to 6.45 eV S. G. Choi, J. Zúñiga-Pérez, V. Muñoz-Sanjosé, A. G. Norman, C. L. Perkins, and D. H. Levi pp. 1120-1124 Abstract   Full Text: [ Read Online (HTML)   PDF  (330 kB)  ]    Order
	Formation of three-dimensional and nanowall structures on silicon using a hydrogen-assisted high aspect ratio etching S. Azimi, M. Mehran, A. Amini, A. Vali, S. Mohajerzadeh, and M. Fathipour pp. 1125-1131 Abstract   Full Text: [ Read Online (HTML)   PDF  (1944 kB)  ]    Order
	Statistical-noise effect on discrete power spectrum of line-edge and line-width roughness Atsushi Hiraiwa (平岩篤) and Akio Nishida (西田彰男) pp. 1132-1137 Abstract   Full Text: [ Read Online (HTML)   PDF  (486 kB)  ]    Order
	Defect-free etching process for GaAs/AlGaAs hetero-nanostructure using chlorine/argon mixed neutral beam Xuan-Yu Wang, Chi-Hsien Huang, Yuzo Ohno, Mokoto Igarashi, Akihiro Murayama, and Seiji Samukawa pp. 1138-1142 Abstract   Full Text: [ Read Online (HTML)   PDF  (477 kB)  ]    Order
	Effect of Al doping on resistive switching behavior of NiOx films for nonvolatile memory application Jonggi Kim, Heedo Na, Jinho Oh, Dae-Hong Ko, and Hyunchul Sohn pp. 1143-1147 Abstract   Full Text: [ Read Online (HTML)   PDF  (389 kB)  ]    Order
	Mechanical and electronic characteristics of scanning probe microscopy probes based on coaxial palladium nanowire/carbon nanotube hybrid structures Ian Thomas Clark, Gemma Rius, Yuki Matsuoka, and Masamichi Yoshimura pp. 1148-1152 Abstract   Full Text: [ Read Online (HTML)   PDF  (361 kB)  ]    Order
	CO2 laser treatment for stabilization of the superhydrophobicity of carbon nanotube surfaces S. C. Ramos, G. Vasconcelos, E. F. Antunes, A. O. Lobo, V. J. Trava-Airoldi, and E. J. Corat pp. 1153-1157 Abstract   Full Text: [ Read Online (HTML)   PDF  (422 kB)  ]    Order
	Dose loss of phosphorus due to interface segregation in silicon-on-insulator substrates Ruey-Dar Chang, Chia-Chi Ma, and Jung-Ruey Tsai pp. 1158-1163 Abstract   Full Text: [ Read Online (HTML)   PDF  (217 kB)  ]    Order
	Influence of surface treatment and interface layers on electrical spin injection efficiency and transport in InAs L. Zhu and E. T. Yu pp. 1164-1168 Abstract   Full Text: [ Read Online (HTML)   PDF  (361 kB)  ]    Order
	Electron detection performance of diamond avalanche diode Hideo Morishita, Takashi Ohshima, Michio Hatano, Yoko Iwakaji, Osamu Maida, and Toshimichi Ito pp. 1169-1172 Abstract   Full Text: [ Read Online (HTML)   PDF  (473 kB)  ]    Order
	Thin film transistors with a ZnO channel and gate dielectric layers of HfO2 by atomic layer deposition Ronald Grundbacher, Kiran Chikkadi, and Christofer Hierold pp. 1173-1178 Abstract   Full Text: [ Read Online (HTML)   PDF  (345 kB)  ]    Order
	Silicon nitride hardmask fabrication using a cyclic CHF3-based reactive ion etching process for vertical profile nanostructures Peter Kaspar, Yogesh Jeyaram, Heinz Jäckel, Annette Foelske, Rüdiger Kötz, and Sandro Bellini pp. 1179-1186 Abstract   Full Text: [ Read Online (HTML)   PDF  (407 kB)  ]    Order
	Hydrogen etching and cutting of multiwall carbon nanotubes Michael J. Behr, E. Ashley Gaulding, K. Andre Mkhoyan, and Eray S. Aydil pp. 1187-1194 Abstract   Full Text: [ Read Online (HTML)   PDF  (876 kB)  ]    Order
	Controlled sacrificial sidewall surface micromachining for the release of high length-to-thickness aspect ratio bridges Christopher R. Raum, R. Niall Tait, and Robert Gauthier pp. 1195-1201 Abstract   Full Text: [ Read Online (HTML)   PDF  (596 kB)  ]    Order
	Field emission stability and properties of simultaneously grown microcrystalline diamond and carbon nanostructure films Kishore Uppireddi, Brad R. Weiner, and Gerardo Morell pp. 1202-1205 Abstract   Full Text: [ Read Online (HTML)   PDF  (390 kB)  ]    Order
	Electron beam induced etching of silicon with SF6 N. Vanhove, P. Lievens, and W. Vandervorst pp. 1206-1209 Abstract   Full Text: [ Read Online (HTML)   PDF  (203 kB)  ]    Order
	Simultaneous observation of surface topography and elasticity at atomic scale by multifrequency frequency modulation atomic force microscopy Yoshitaka Naitoh, Zongmin Ma, Yan Jun Li, Masami Kageshima, and Yasuhiro Sugawara pp. 1210-1214 Abstract   Full Text: [ Read Online (HTML)   PDF  (447 kB)  ]    Order
	Nonlinearities in depth profiling nanometer layers M. P. Seah, C. P. A. Mulcahy, and S. Biswas pp. 1215-1221 Abstract   Full Text: [ Read Online (HTML)   PDF  (455 kB)  ]    Order
	Challenges in the fabrication of an optical frequency ground plane cloak consisting of silicon nanorod arrays J. Blair, D. Brown, V. A. Tamma, W. Park, and C. Summers pp. 1222-1230 Abstract   Full Text: [ Read Online (HTML)   PDF  (1545 kB)  ]    Order
	Ni full-filling into Al2O3/Al film with etched tunnels using a polyethylene glycol solution bath in electroless-plating Joo-Hee Jang, Chang-Hyoung Lee, Woo-Sung Choi, Nam-Jeong Kim, Taek-You Kim, Tae-Yoo Kim, Jang-Hyun Kim, Chan Park, and Su-Jeong Suh pp. 1231-1234 Abstract   Full Text: [ Read Online (HTML)   PDF  (461 kB)  ]    Order
	Antimonide-based depletion-mode metal-oxide-semiconductor field-effect transistors using small-bandgap InAs channel layers H.-K. Lin, G.-Y. Liau, and H.-K. Liu pp. 1235-1238 Abstract   Full Text: [ Read Online (HTML)   PDF  (166 kB)  ]    Order
	Impact of exposure doses on demolding process in UV nanoimprint lithography Toshiaki Tanabe, Noriyoshi Fujii, Masato Matsue, Hiroaki Kawata, and Yoshihiko Hirai pp. 1239-1241 Abstract   Full Text: [ Read Online (HTML)   PDF  (157 kB)  ]    Order
	Statistical-noise effect on autocorrelation function of line-edge and line-width roughness Atsushi Hiraiwa (平岩篤) and Akio Nishida (西田彰男) pp. 1242-1250 Abstract   Full Text: [ Read Online (HTML)   PDF  (802 kB)  ]    Order
	Thin polymer films viscosity measurements from nanopatterning method Tanguy Leveder, Stefan Landis, Nicolas Chaix, and Laurent Davoust pp. 1251-1258 Abstract   Full Text: [ Read Online (HTML)   PDF  (473 kB)  ]    Order
	Effect of resist on the transfer of line-edge roughness spatial metrics from mask to wafer Patrick P. Naulleau and Gregg M. Gallatin pp. 1259-1266 Abstract   Full Text: [ Read Online (HTML)   PDF  (503 kB)  ]    Order
	Performance and reliability analysis of p-type metal-oxide-semiconductor field effect transistors with various combinations of Ru and Al gate metal Hong Bae Park, Chang Seo Park, Chang Yong Kang, Seung-Chul Song, Byoung Hun Lee, Tea Wan Kim, Tae-Young Jang, Dong-Hyoub Kim, Jae Kyeong Jeong, and Rino Choi pp. 1267-1270 Abstract   Full Text: [ Read Online (HTML)   PDF  (119 kB)  ]    Order
	Structural and optical properties of self-assembled InAs quantum dot molecules on GaAs substrates Peng Tian, Lirong Huang, Yi Yu, and Dexiu Huang pp. 1271-1273 Abstract   Full Text: [ Read Online (HTML)   PDF  (240 kB)  ]    Order
	Fabrication and field emission of carbon nanotubes/TiO2/Ti composite nanostructures Jian-Biao Chen, Cheng-Wei Wang, Rui-Sheng Guo, Lin-Qing Wang, Wei-Dong Zhu, Feng Zhou, and Wei-Min Liu pp. 1274-1278 Abstract   Full Text: [ Read Online (HTML)   PDF  (370 kB)  ]    Order
	Atomic resolution force microscopy imaging on a strongly ionic surface with differently functionalized tips T. Arai, S. Gritschneder, L. Tröger, and M. Reichling pp. 1279-1283 Abstract   Full Text: [ Read Online (HTML)   PDF  (289 kB)  ]    Order
	Electron field emission from well-aligned GaP nanotips Hung-Chun Lo, Jeff T. H. Tsai, Jih-Perng Leu, and Chia-Fu Chen pp. 1284-1286 Abstract   Full Text: [ Read Online (HTML)   PDF  (4013 kB)  ]    Order
	Sputtering behavior and evolution of depth resolution upon low energy ion irradiation of GaAs M. J. P. Hopstaken, M. S. Gordon, D. Pfeiffer, D. K. Sadana, T. Topuria, P. M. Rice, C. Gerl, M. Richter, and C. Marchiori pp. 1287-1297 Abstract   Full Text: [ Read Online (HTML)   PDF  (676 kB)  ]    Order
	Relaxation of misfit strain in silicon-germanium (Si1−xGex) films during dry oxidation Jung-Ho Yoo, Sun-Wook Kim, Byoung-Gi Min, Hyunchul Sohn, Dae-Hong Ko, and Mann-Ho Cho pp. 1298-1303 Abstract   Full Text: [ Read Online (HTML)   PDF  (291 kB)  ]    Order
	Quantifying reaction spread and x-ray exposure sensitivity in hydrogen silsesquioxane latent resist patterns with x-ray spectromicroscopy Allison G. Caster, Stefan Kowarik, Adam M. Schwartzberg, Stephen R. Leone, Alexei Tivanski, and Mary K. Gilles pp. 1304-1313 Abstract   Full Text: [ Read Online (HTML)   PDF  (721 kB)  ]    Order
	Reduction of spin-flip scattering in metallic nonlocal spin valves H. Zou, X. J. Wang, and Y. Ji pp. 1314-1317 Abstract   Full Text: [ Read Online (HTML)   PDF  (223 kB)  ]    Order
	Single-walled carbon nanotube alignment by grating-guided electrostatic self-assembly Huifeng Li, Dazhi Sun, Hung-Jue Sue, and Xing Cheng pp. 1318-1321 Abstract   Full Text: [ Read Online (HTML)   PDF  (281 kB)  ]    Order
Brief Reports and Comments
	Moisture effect on electromigration characteristics for copper dual damascene interconnection Yi-Lung Cheng, Wei-Yuan Chang, and Ying-Lang Wang pp. 1322-1325 Abstract   Full Text: [ Read Online (HTML)   PDF  (453 kB)  ]    Order
Shop Notes
	Simple derivation of the formula for Sommerfeld supply density used in electron-emission physics and limitations on its use Richard G. Forbes pp. 1326-1329 Abstract   Full Text: [ Read Online (HTML)   PDF  (70 kB)  ]    Order
PAPERS FROM THE 54th INTERNATIONAL CONFERENCE ON ELECTRON, ION, AND PHOTON BEAM TECHNOLOGY AND NANOFABRICATION
	Preface Martin Feldman p. C6a1 Abstract   Full Text: [ Read Online (HTML)   PDF  (21 kB)  ]    Order
Plenary [ Next Subject | Issue Index | Top / Bottom of Page]
	To charge or not to charge: 50 years of lithographic choices R. Fabian Pease pp. C6A1-C6A6 Abstract   Full Text: [ Read Online (HTML)   PDF  (935 kB)  ]    Order
Directed Assembly [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Argon ion multibeam nanopatterning of Ni–Cu inserts for injection molding Anton Koeck, Roman Bruck, Markus Wellenzohn, Rainer Hainberger, Elmar Platzgummer, Hans Loeschner, Peter Joechl, Stefan Eder-Kapl, Christoph Ebm, Peter Czepl, Kurt Kaiblinger, Friedrich Pipelka, Florian Letzkus, Mathias Irmscher, and Bernd Heitkamp pp. C6B1-C6B6 Abstract   Full Text: [ Read Online (HTML)   PDF  (1316 kB)  ]    Order
	Directed assembly of solution processed single-walled carbon nanotubes via dielectrophoresis: From aligned array to individual nanotube devices Paul Stokes and Saiful I. Khondaker pp. C6B7-C6B12 Abstract   Full Text: [ Read Online (HTML)   PDF  (578 kB)  ]    Order
	Mechanism and dynamics of block copolymer directed assembly with density multiplication on chemically patterned surfaces Guoliang Liu, Sean P. Delcambre, Karl O. Stuen, Gordon S. W. Craig, Juan J. de Pablo, Paul F. Nealey, Kim Nygård, Dillip K. Satapathy, Oliver Bunk, and Harun H. Solak pp. C6B13-C6B19 Abstract   Full Text: [ Read Online (HTML)   PDF  (527 kB)  ]    Order
	Nanostructure fabrication by self-assembly of block copolymers on three-dimensional diamondlike carbon structures Hiroyuki Mino, Reo Kometani, Shin-ichi Warisawa, and Sunao Ishihara pp. C6B20-C6B23 Abstract   Full Text: [ Read Online (HTML)   PDF  (275 kB)  ]    Order
	Shape control and density multiplication of cylinder-forming ternary block copolymer-homopolymer blend thin films on chemical patterns Huiman Kang, Francois Detcheverry, Karl O. Stuen, Gordon S. W. Craig, Juan J. de Pablo, Padma Gopalan, and Paul F. Nealey pp. C6B24-C6B29 Abstract   Full Text: [ Read Online (HTML)   PDF  (770 kB)  ]    Order
	Integration of block copolymer directed assembly with 193 immersion lithography Chi-Chun Liu, Paul F. Nealey, Alex K. Raub, Philip J. Hakeem, Steve R. J. Brueck, Eungnak Han, and Padma Gopalan pp. C6B30-C6B34 Abstract   Full Text: [ Read Online (HTML)   PDF  (464 kB)  ]    Order
Electron Beams [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	High-current electron optical design for reflective electron beam lithography direct write lithography Mark McCord, Shinichi Kojima, Paul Petric, Alan Brodie, and Jeff Sun pp. C6C1-C6C5 Abstract   Full Text: [ Read Online (HTML)   PDF  (244 kB)  ]    Order
	Reflective electron beam lithography: A maskless ebeam direct write lithography approach using the reflective electron beam lithography concept Paul Petric, Chris Bevis, Mark McCord, Allen Carroll, Alan Brodie, Upendra Ummethala, Luca Grella, Anthony Cheung, and Regina Freed pp. C6C6-C6C13 Abstract   Full Text: [ Read Online (HTML)   PDF  (896 kB)  ]    Order
	5 kV multielectron beam lithography: MAPPER tool and resist process characterization D. Rio, C. Constancias, M. Martin, B. Icard, J. van Nieuwstadt, J. Vijverberg, and L. Pain pp. C6C14-C6C20 Abstract   Full Text: [ Read Online (HTML)   PDF  (649 kB)  ]    Order
	Excitation and imaging of resonant optical modes of Au triangular nanoantennas using cathodoluminescence spectroscopy Anil Kumar, Kin-Hung Fung, James C. Mabon, Edmond Chow, and Nicholas X. Fang pp. C6C21-C6C25 Abstract   Full Text: [ Read Online (HTML)   PDF  (295 kB)  ]    Order
	Field induced shape and work function modification for the ZrO/W(100) Schottky cathode K. Liu, G. A. Schwind, L. W. Swanson, and J. A. Campbell pp. C6C26-C6C33 Abstract   Full Text: [ Read Online (HTML)   PDF  (770 kB)  ]    Order
	Performance characterization of negative resists for sub-10-nm electron beam lithography R. Bonam, P. Verhagen, A. Munder, and J. Hartley pp. C6C34-C6C40 Abstract   Full Text: [ Read Online (HTML)   PDF  (1033 kB)  ]    Order
	Simulation of scanning electron microscope images taking into account local and global electromagnetic fields Sergey Babin, Sergey S. Borisov, Hiroyuki Ito, Andrei Ivanchikov, and Makoto Suzuki pp. C6C41-C6C47 Abstract   Full Text: [ Read Online (HTML)   PDF  (1135 kB)  ]    Order
	Simulation of electron beam lithography of nanostructures M. Stepanova, T. Fito, Zs. Szabó, K. Alti, A. P. Adeyenuwo, K. Koshelev, M. Aktary, and S. K. Dew pp. C6C48-C6C57 Abstract   Full Text: [ Read Online (HTML)   PDF  (886 kB)  ]    Order
	Sub-10-nm half-pitch electron-beam lithography by using poly(methyl methacrylate) as a negative resist Huigao Duan, Donald Winston, Joel K. W. Yang, Bryan M. Cord, Vitor R. Manfrinato, and Karl K. Berggren pp. C6C58-C6C62 Abstract   Full Text: [ Read Online (HTML)   PDF  (603 kB)  ]    Order
	Analysis of surface electromagnetic wave resonant structures for potential application in an array of compact photoelectron sources Heon J. Choi and Timothy R. Groves pp. C6C63-C6C68 Abstract   Full Text: [ Read Online (HTML)   PDF  (229 kB)  ]    Order
	Inspection of open defects in a thin film transistor-liquid crystal display panel by using a low-energy electron microcolumn Tae Sik Oh, Dae-Wook Kim, Young Chul Kim, Seungjoon Ahn, Gun-hee Lee, and Ho Seob Kim pp. C6C69-C6C73 Abstract   Full Text: [ Read Online (HTML)   PDF  (548 kB)  ]    Order
	Brightness limitations of cold field emitters caused by Coulomb interactions B. Cook, T. Verduin, C. W. Hagen, and P. Kruit pp. C6C74-C6C79 Abstract   Full Text: [ Read Online (HTML)   PDF  (703 kB)  ]    Order
Emerging Technologies [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Direct transformation of a resist pattern into a graphene field effect transistor through interfacial graphitization of liquid gallium Jun-ichi Fujita, Yosuke Miyazawa, Ryuichi Ueki, Mio Sasaki, and Takeshi Saito pp. C6D1-C6D4 Abstract   Full Text: [ Read Online (HTML)   PDF  (373 kB)  ]    Order
	Fabrication of metal patterns on freestanding graphenoid nanomembranes André Beyer, Andrey Turchanin, Christoph T. Nottbohm, Nils Mellech, Mark Schnietz, and Armin Gölzhäuser pp. C6D5-C6D10 Abstract   Full Text: [ Read Online (HTML)   PDF  (508 kB)  ]    Order
	Study of transport properties in graphene monolayer flakes on SiO2 substrates J. M. Tirado, D. Nezich, X. Zhao, J. W. Chung, J. Kong, and T. Palacios pp. C6D11-C6D14 Abstract   Full Text: [ Read Online (HTML)   PDF  (398 kB)  ]    Order
Extreme Ultraviolet Lithography [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Wavelength-specific reflections: A decade of extreme ultraviolet actinic mask inspection research K. A. Goldberg and I. Mochi pp. C6E1-C6E10 Abstract   Full Text: [ Read Online (HTML)   PDF  (403 kB)  ]    Order
	Actinic imaging and evaluation of phase structures on extreme ultraviolet lithography masks Iacopo Mochi, Kenneth A. Goldberg, and Sungmin Huh pp. C6E11-C6E16 Abstract   Full Text: [ Read Online (HTML)   PDF  (401 kB)  ]    Order
	Assessing the mask clamping ability of a low thermal expansion material chuck J. R. Zeuske, P. Vukkadala, R. L. Engelstad, A. R. Mikkelson, G. Kalkowski, S. Risse, and S. Mueller pp. C6E17-C6E22 Abstract   Full Text: [ Read Online (HTML)   PDF  (999 kB)  ]    Order
	Extreme ultraviolet mask substrate surface roughness effects on lithographic patterning Simi A. George, Patrick P. Naulleau, Iacopo Mochi, Farhad Salmassi, Eric M. Gullikson, Kenneth A. Goldberg, and Erik H. Anderson pp. C6E23-C6E30 Abstract   Full Text: [ Read Online (HTML)   PDF  (328 kB)  ]    Order
	Extreme ultraviolet mask surface cleaning effects on lithography process performance Simi A. George, Lorie Mae Baclea-an, Patrick P. Naulleau, Robert J. Chen, and Ted Liang pp. C6E31-C6E35 Abstract   Full Text: [ Read Online (HTML)   PDF  (376 kB)  ]    Order
	High transmission pellicles for extreme ultraviolet lithography reticle protection Yashesh A. Shroff, Michael Leeson, Pei-Yang Yan, Eric Gullikson, and Farhad Salmassi pp. C6E36-C6E41 Abstract   Full Text: [ Read Online (HTML)   PDF  (952 kB)  ]    Order
Focused Ion Beams [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Focused chromium ion beam A. V. Steele, B. Knuffman, J. J. McClelland, and J. Orloff pp. C6F1-C6F5 Abstract   Full Text: [ Read Online (HTML)   PDF  (422 kB)  ]    Order
	Analysis of subsurface beam spread and its impact on the image resolution of the helium ion microscope Sybren Sijbrandij, John Notte, Colin Sanford, and Ray Hill pp. C6F6-C6F9 Abstract   Full Text: [ Read Online (HTML)   PDF  (146 kB)  ]    Order
	Design of a parallel mass spectrometer for focused ion beam columns A. Khursheed, K. H. Cheong, and H. Q. Hoang pp. C6F10-C6F14 Abstract   Full Text: [ Read Online (HTML)   PDF  (460 kB)  ]    Order
	Gas field ion source and liquid metal ion source charged particle material interaction study for semiconductor nanomachining applications Shida Tan, Richard Livengood, Darryl Shima, John Notte, and Shawn McVey pp. C6F15-C6F21 Abstract   Full Text: [ Read Online (HTML)   PDF  (846 kB)  ]    Order
	Model for nanopillar growth by focused helium ion-beam-induced deposition Paul F. A. Alkemade, Ping Chen, Emile van Veldhoven, and Diederik Maas pp. C6F22-C6F25 Abstract   Full Text: [ Read Online (HTML)   PDF  (237 kB)  ]    Order
	Ga+ beam lithography for suspended lateral beams and nanowires M. David Henry, Michael Shearn, and Axel Scherer pp. C6F26-C6F30 Abstract   Full Text: [ Read Online (HTML)   PDF  (475 kB)  ]    Order
	Transmission electron microscopy study of damage layer formed through ion beam induced deposition of platinum on silicon substrate Byong Chon Park, Yun Chang Park, Hwack Joo Lee, and Young Heon Kim pp. C6F31-C6F37 Abstract   Full Text: [ Read Online (HTML)   PDF  (814 kB)  ]    Order
	Piezoresistive effect in the three-dimensional diamondlike carbon nanostructure fabricated by focused-ion-beam chemical vapor deposition Reo Kometani, Kouki Yusa, Shin'ichi Warisawa, and Sunao Ishihara pp. C6F38-C6F41 Abstract   Full Text: [ Read Online (HTML)   PDF  (301 kB)  ]    Order
Masks and Maskless Lithography [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Blanking characteristics of a miniature electron beam column C. S. Silver, J. P. Spallas, and L. P. Muray pp. C6G1-C6G4 Abstract   Full Text: [ Read Online (HTML)   PDF  (258 kB)  ]    Order
	Multibeam scanning electron microscope: Experimental results A. Mohammadi-Gheidari, C. W. Hagen, and P. Kruit pp. C6G5-C6G10 Abstract   Full Text: [ Read Online (HTML)   PDF  (479 kB)  ]    Order
Metrology and Imaging [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Application of analytic scanning electron microscopy to critical dimensions metrology at nanometer scale Sergey Babin, Konstantin Bay, and Justin J. Hwu pp. C6H1-C6H5 Abstract   Full Text: [ Read Online (HTML)   PDF  (566 kB)  ]    Order
	Linewidth metrology for sub-10-nm lithography S. Thoms and D. S. Macintyre pp. C6H6-C6H10 Abstract   Full Text: [ Read Online (HTML)   PDF  (282 kB)  ]    Order
	Metrology for electron-beam lithography and resist contrast at the sub-10 nm scale Huigao Duan, Vitor R. Manfrinato, Joel K. W. Yang, Donald Winston, Bryan M. Cord, and Karl K. Berggren pp. C6H11-C6H17 Abstract   Full Text: [ Read Online (HTML)   PDF  (773 kB)  ]    Order
	Robust estimation of line width roughness parameters Kedar Patel, Soumendra N. Lahiri, and Costas J. Spanos pp. C6H18-C6H33 Abstract   Full Text: [ Read Online (HTML)   PDF  (1003 kB)  ]    Order
	Understanding the relationship between true and measured resist feature critical dimension and line edge roughness using a detailed scanning electron microscopy simulator Richard A. Lawson and Clifford L. Henderson pp. C6H34-C6H39 Abstract   Full Text: [ Read Online (HTML)   PDF  (414 kB)  ]    Order
Microfluidics [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Three-dimensional microfluidic mixers using ion beam lithography and micromachining E. Palacios, L. E. Ocola, A. Joshi-Imre, S. Bauerdick, M. Berse, and L. Peto pp. C6I1-C6I6 Abstract   Full Text: [ Read Online (HTML)   PDF  (794 kB)  ]    Order
	Fabricating millimeter to nanometer sized cavities concurrently for nanofluidic devices Nicole R. Devlin and Devin K. Brown pp. C6I7-C6I10 Abstract   Full Text: [ Read Online (HTML)   PDF  (341 kB)  ]    Order
	Nanofluidic channels fabricated by e-beam lithography and polymer reflow sealing Mina Fouad, Mustafa Yavuz, and Bo Cui pp. C6I11-C6I13 Abstract   Full Text: [ Read Online (HTML)   PDF  (249 kB)  ]    Order
	Rotation speed control of Janus particles by dielectrophoresis in a microfluidic channel T. Honegger, O. Lecarme, K. Berton, and D. Peyrade pp. C6I14-C6I19 Abstract   Full Text: [ Read Online (HTML)   PDF  (776 kB)  ]    Order
Modeling [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Mask-topography-induced phase effects and wave aberrations in optical and extreme ultraviolet lithography A. Erdmann, F. Shao, P. Evanschitzky, and T. Fühner pp. C6J1-C6J7 Abstract   Full Text: [ Read Online (HTML)   PDF  (948 kB)  ]    Order
	High accuracy electron beam model development in MICHELLE: eBEAM Serguei G. Ovtchinnikov, Simon J. Cooke, Roman Shtokhamer, Alexander N. Vlasov, Masis M. Mkrtchyan, Christopher Kostas, John J. Petillo, and Baruch Levush pp. C6J8-C6J12 Abstract   Full Text: [ Read Online (HTML)   PDF  (121 kB)  ]    Order
	Monte Carlo modeling of electron backscattering from carbon nanotube forests M. K. Alam, P. Yaghoobi, and A. Nojeh pp. C6J13-C6J18 Abstract   Full Text: [ Read Online (HTML)   PDF  (477 kB)  ]    Order
	Reducing the pattern redundancy in optical proximity correction modeling by analyzing the pattern linearity Jianliang Li, Lin Zhang, Qiliang Yan, Lawrence S. Melvin, III, Chadwick Lin, Eason Su, and Nail Tang pp. C6J19-C6J24 Abstract   Full Text: [ Read Online (HTML)   PDF  (968 kB)  ]    Order
Nanobiology [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Fabrication of three-dimensional structures for the assessment of cell mechanical interactions within cell monolayers David Fuard, Michel Moussus, Caterina Tomba, David Peyrade, and Alice Nicolas pp. C6K1-C6K7 Abstract   Full Text: [ Read Online (HTML)   PDF  (399 kB)  ]    Order
	Texturing of silicon using a microporous polymer etch mask N. S. Korivi, J. Hoffpauir, and P. K. Ajmera pp. C6K8-C6K12 Abstract   Full Text: [ Read Online (HTML)   PDF  (387 kB)  ]    Order
	Gelatin/glycerol coating to preserve mechanically compliant nanowire electrodes from damage during brain implantation Jolanda A. Witteveen, Dmitry B. Suyatin, Lina Gällentoft, Jens Schouenborg, Nils Danielsen, and Christelle N. Prinz pp. C6K13-C6K16 Abstract   Full Text: [ Read Online (HTML)   PDF  (425 kB)  ]    Order
	Microfluidics-assisted photo nanoimprint lithography for the formation of cellular bioimprints V. Nock, L. Murray, F. Samsuri, M. M. Alkaisi, and J. J. Evans pp. C6K17-C6K22 Abstract   Full Text: [ Read Online (HTML)   PDF  (572 kB)  ]    Order
Nanoelectronics [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Low damage fully self-aligned replacement gate process for fabricating deep sub-100 nm gate length GaAs metal-oxide-semiconductor field-effect transistors X. Li, S. Bentley, H. McLelland, M. C. Holland, H. Zhou, S. Thoms, D. S. Macintyre, and I. G. Thayne pp. C6L1-C6L5 Abstract   Full Text: [ Read Online (HTML)   PDF  (627 kB)  ]    Order
	Platinum single-electron transistors with tunnel barriers made by atomic layer deposition Hubert C. George, Alexei O. Orlov, and Gregory L. Snider pp. C6L6-C6L8 Abstract   Full Text: [ Read Online (HTML)   PDF  (252 kB)  ]    Order
	Si single electron transistor fabricated by chemical mechanical polishing Yen-Chun Lee, Vishwanath Joshi, Alexei O. Orlov, and Gregory L. Snider pp. C6L9-C6L13 Abstract   Full Text: [ Read Online (HTML)   PDF  (543 kB)  ]    Order
Nanoimprint [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Aspects of hybrid pattern definition while combining thermal nanoimprint with optical lithography H.-C. Scheer, S. Möllenbeck, A. Mayer, and K. Dhima pp. C6M1-C6M6 Abstract   Full Text: [ Read Online (HTML)   PDF  (699 kB)  ]    Order
	Defect analysis for patterned media Zhengmao Ye, John Fretwell, Kang Luo, Steven Ha, Gerard Schmid, Dwayne LaBrake, Douglas J. Resnick, and S. V. Sreenivasan pp. C6M7-C6M11 Abstract   Full Text: [ Read Online (HTML)   PDF  (398 kB)  ]    Order
	45 nm hp line/space patterning into a thin spin coat film by UV nanoimprint based on condensation Hiroshi Hiroshima, Qing Wang, and Sung-Won Youn pp. C6M12-C6M16 Abstract   Full Text: [ Read Online (HTML)   PDF  (454 kB)  ]    Order
	Evaluation of oxygen inhibition for UV-curable resins by adhesion force measurement using scanning probe microscope Makoto Okada, Masayuki Iwasa, Hiroto Miyake, Takeshi Ohsaki, Yuichi Haruyama, Kazuhiro Kanda, and Shinji Matsui pp. C6M17-C6M22 Abstract   Full Text: [ Read Online (HTML)   PDF  (422 kB)  ]    Order
	Assessment of release properties in UV nanoimprint lithography using high-aspect-ratio nanoscale molds Junki Takahashi, Jun Taniguchi, and Yasuhiro Kamiya pp. C6M23-C6M27 Abstract   Full Text: [ Read Online (HTML)   PDF  (712 kB)  ]    Order
	Characterizations of nanoembossed Pb(Zr0.3,Ti0.7)O3 ferroelectric films Zhenkui Shen, Zhihui Chen, Qian Lu, Anquan Jiang, Zhijun Qiu, Xinping Qu, Yifang Chen, and Ran Liu pp. C6M28-C6M31 Abstract   Full Text: [ Read Online (HTML)   PDF  (490 kB)  ]    Order
	Electrical properties of transferred metal nanopattern using metal oxide release layer Noriyuki Unno, Jun Taniguchi, and Shouichi Ide pp. C6M32-C6M36 Abstract   Full Text: [ Read Online (HTML)   PDF  (499 kB)  ]    Order
	Fabrication of mesas with micro- and nanopatterned surface relief used as working stamps for step and stamp imprint lithography Arne Schleunitz, Christian Spreu, Tomi Haatainen, Anna Klukowska, and Helmut Schift pp. C6M37-C6M40 Abstract   Full Text: [ Read Online (HTML)   PDF  (360 kB)  ]    Order
	Fabrication of ordered nanospheres using a combination of nanoimprint lithography and controlled dewetting Arne Schleunitz, Christian Spreu, JaeJong Lee, and Helmut Schift pp. C6M41-C6M44 Abstract   Full Text: [ Read Online (HTML)   PDF  (431 kB)  ]    Order
	Fabrication of seamless three-dimensional roll mold using direct electron-beam writing on rotating cylindrical substrate Jun Taniguchi, Shintaro Tsuji, and Masao Aratani pp. C6M45-C6M49 Abstract   Full Text: [ Read Online (HTML)   PDF  (822 kB)  ]    Order
	Facile wide-scale defect detection of UV-nanoimprinted resist patterns by fluorescent microscopy Kei Kobayashi, Shoichi Kubo, Shinji Matsui, and Masaru Nakagawa pp. C6M50-C6M56 Abstract   Full Text: [ Read Online (HTML)   PDF  (4724 kB)  ]    Order
	High accuracy UV-nanoimprint lithography step-and-repeat master stamp fabrication for wafer level camera application G. Kreindl, T. Glinsner, R. Miller, D. Treiblmayr, and R. Födisch pp. C6M57-C6M62 Abstract   Full Text: [ Read Online (HTML)   PDF  (506 kB)  ]    Order
	Hole mobility enhancement by chain alignment in nanoimprinted poly(3-hexylthiophene) nanogratings for organic electronics Min Zhou, Mukti Aryal, Kamil Mielczarek, Anvar Zakhidov, and Walter Hu pp. C6M63-C6M67 Abstract   Full Text: [ Read Online (HTML)   PDF  (413 kB)  ]    Order
	Impact of molecular size on resist filling process in nanoimprint lithography: Molecular dynamics study Akihiro Taga, Masaaki Yasuda, Hiroaki Kawata, and Yoshihiko Hirai pp. C6M68-C6M71 Abstract   Full Text: [ Read Online (HTML)   PDF  (547 kB)  ]    Order
	Impact of the resist properties on the antisticking layer degradation in UV nanoimprint lithography A. Francone, C. Iojoiu, C. Poulain, C. Lombard, B. Pépin-Donat, J. Boussey, and M. Zelsmann pp. C6M72-C6M76 Abstract   Full Text: [ Read Online (HTML)   PDF  (366 kB)  ]    Order
	Impact of substrate deformation on demolding force for thermal imprint process H. Kawata, Y. Watanabe, N. Fujikawa, M. Yasuda, and Y. Hirai pp. C6M77-C6M82 Abstract   Full Text: [ Read Online (HTML)   PDF  (440 kB)  ]    Order
	Imprinted quarter wave plate at terahertz frequency Shimul C. Saha, Yong Ma, James P. Grant, A. Khalid, and David R. S. Cumming pp. C6M83-C6M87 Abstract   Full Text: [ Read Online (HTML)   PDF  (516 kB)  ]    Order
	Long-range ordered aluminum oxide nanotubes by nanoimprint-assisted aluminum film surface engineering Kunbae Noh, Chulmin Choi, Jin-Yeol Kim, Young Oh, Karla S. Brammer, Mariana C. Loya, and Sungho Jin pp. C6M88-C6M92 Abstract   Full Text: [ Read Online (HTML)   PDF  (549 kB)  ]    Order
	Nanofabrication of surface-enhanced Raman scattering device by an integrated block-copolymer and nanoimprint lithography method E. L. Yang, C. C. Liu, C. Y. P. Yang, C. A. Steinhaus, P. F. Nealey, and J. L. Skinner pp. C6M93-C6M97 Abstract   Full Text: [ Read Online (HTML)   PDF  (579 kB)  ]    Order
	Nanoimprinting for diffractive light trapping in solar cells Dirk N. Weiss, Hao-Chih Yuan, Benjamin G. Lee, Howard M. Branz, Stephen T. Meyers, Andrew Grenville, and Douglas A. Keszler pp. C6M98-C6M103 Abstract   Full Text: [ Read Online (HTML)   PDF  (368 kB)  ]    Order
	Nanoimprinted P3HT/C60 solar cells optimized by oblique deposition of C60 Yi Yang, Mukti Aryal, Kamil Mielczarek, Walter Hu, and Anvar Zakhidov pp. C6M104-C6M107 Abstract   Full Text: [ Read Online (HTML)   PDF  (234 kB)  ]    Order
	Process-simulation system for UV-nanoimprint lithography Mayuko Shibata, Akira Horiba, Yoshinori Nagaoka, Hiroaki Kawata, Masaaki Yasuda, and Yoshihiko Hirai pp. C6M108-C6M113 Abstract   Full Text: [ Read Online (HTML)   PDF  (607 kB)  ]    Order
	Rapid patterning of spin-on-glass using ultrasonic nanoimprint Harutaka Mekaru and Masaharu Takahashi pp. C6M114-C6M121 Abstract   Full Text: [ Read Online (HTML)   PDF  (653 kB)  ]    Order
	Rapid thermal imprinting of high-aspect-ratio nanostructures with dynamic heating of mold surface Keisuke Nagato, Shuntaro Hattori, Tetsuya Hamaguchi, and Masayuki Nakao pp. C6M122-C6M124 Abstract   Full Text: [ Read Online (HTML)   PDF  (438 kB)  ]    Order
	Residual layer uniformity using complementary patterns to compensate for pattern density variation in UV nanoimprint lithography Qing Wang, Hiroshi Hiroshima, Hidemasa Atobe, and Sung-Won Youn pp. C6M125-C6M129 Abstract   Full Text: [ Read Online (HTML)   PDF  (660 kB)  ]    Order
	Spectroscopic ellipsometry optical critical dimension measurements of templates and imprinted resist for patterned magnetic media applications Zhaoning Yu, Justin Hwu, Yongdong Liu, Zhenpeng Su, Henry Yang, Hongying Wang, Wei Hu, Yuan Xu, Nobuo Kurataka, Yautzong Hsu, Shifu Lee, Gene Gauzner, Kim Lee, and David Kuo pp. C6M130-C6M135 Abstract   Full Text: [ Read Online (HTML)   PDF  (554 kB)  ]    Order
	Sputtering with an etch-free lift-off in thermal nanoimprint lithography Andre Mayer, Nicolas Bogdanski, Saskia Möllenbeck, Khalid Dhima, Marc Papenheim, and Hella-Christin Scheer pp. C6M136-C6M139 Abstract   Full Text: [ Read Online (HTML)   PDF  (396 kB)  ]    Order
Nanomechanics [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Microelectromechanical systems for biomimetical applications Rhonira Latif, Enrico Mastropaolo, Andy Bunting, Rebecca Cheung, Thomas Koickal, Alister Hamilton, Michael Newton, and Leslie Smith pp. C6N1-C6N6 Abstract   Full Text: [ Read Online (HTML)   PDF  (779 kB)  ]    Order
	Microfabricated resistive high-sensitivity nanoprobe for scanning thermal microscopy G. Wielgoszewski, P. Sulecki, T. Gotszalk, P. Janus, D. Szmigiel, P. Grabiec, and E. Zschech pp. C6N7-C6N11 Abstract   Full Text: [ Read Online (HTML)   PDF  (523 kB)  ]    Order
	Micromachined scanning proximal probes with integrated piezoresistive readout and bimetal actuator for high eigenmode operation Mirosaw Woszczyna, Pawe Zawierucha, Piotr Paetko, Micha Zielony, Teodor Gotszalk, Yanko Sarov, Tzvetan Ivanov, Andreas Frank, Jens-Peter Zöllner, and Ivo W. Rangelow pp. C6N12-C6N17 Abstract   Full Text: [ Read Online (HTML)   PDF  (624 kB)  ]    Order
	Piezoelectrically driven silicon carbide resonators Enrico Mastropaolo, Isaac Gual, Graham Wood, Andrew Bunting, and Rebecca Cheung pp. C6N18-C6N23 Abstract   Full Text: [ Read Online (HTML)   PDF  (622 kB)  ]    Order
Nanophotonics [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	On the fabrication of three-dimensional silicon-on-insulator based optical phased array for agile and large angle laser beam steering systems Amir Hosseini, David Kwong, Yang Zhang, Saurabh A. Chandorkar, Filip Crnogorac, Andrew Carlson, Babak Fallah, Seth Bank, Emanuel Tutuc, John Rogers, R. Fabian W. Pease, and Ray T. Chen pp. C6O1-C6O7 Abstract   Full Text: [ Read Online (HTML)   PDF  (627 kB)  ]    Order
	Tunable optofluidic nano-Bragg microcavity filter A. S. Jugessur, J. Dou, and J. S. Aitchison pp. C6O8-C6O10 Abstract   Full Text: [ Read Online (HTML)   PDF  (389 kB)  ]    Order
	Colloidal optical waveguides with integrated local light sources built by capillary force assembly O. Lecarme, T. Pinedo Rivera, L. Arbez, T. Honegger, K. Berton, and D. Peyrade pp. C6O11-C6O15 Abstract   Full Text: [ Read Online (HTML)   PDF  (600 kB)  ]    Order
	Resonant coupling to a dipole absorber inside a metamaterial: Anticrossing of the negative index response Svyatoslav Smolev, Zahyun Ku, S. R. J Brueck, Igal Brener, Michael B. Sinclair, Gregory A. Ten Eyck, W. L. Langston, and Lorena I. Basilio pp. C6O16-C6O20 Abstract   Full Text: [ Read Online (HTML)   PDF  (666 kB)  ]    Order
	Fabrication and characterization of coupled metal-dielectric-metal nanoantennas Bhuwan Joshi, Xuejin Wen, Kai Sun, Wu Lu, and Qi-Huo Wei pp. C6O21-C6O25 Abstract   Full Text: [ Read Online (HTML)   PDF  (381 kB)  ]    Order
	Fabrication of nanostar arrays by nanoimprint lithography Teodor Veres, Bo Cui, and Liviu Clime pp. C6O26-C6O29 Abstract   Full Text: [ Read Online (HTML)   PDF  (445 kB)  ]    Order
	Fabrication techniques for three-dimensional metamaterials in the midinfrared J. R. Wendt, D. B. Burckel, G. A. Ten Eyck, A. R. Ellis, I. Brener, and M. B. Sinclair pp. C6O30-C6O33 Abstract   Full Text: [ Read Online (HTML)   PDF  (424 kB)  ]    Order
	Self-aligned gold nanocone probe tips B. Zeeb, S. Jäger, C. Schäfer, P. Nill, A. J. Meixner, D. P. Kern, and M. Fleischer pp. C6O34-C6O37 Abstract   Full Text: [ Read Online (HTML)   PDF  (289 kB)  ]    Order
	Large area three-dimensional photonic crystals with embedded waveguides Alex K. Raub and S. R. J. Brueck pp. C6O38-C6O44 Abstract   Full Text: [ Read Online (HTML)   PDF  (1137 kB)  ]    Order
	Sub-10 nm patterning of gold nanostructures on silicon-nitride membranes for plasmon mapping with electron energy-loss spectroscopy Ai Leen Koh, David W. McComb, Stefan A. Maier, H. Y. Low, and Joel K. W. Yang pp. C6O45-C6O49 Abstract   Full Text: [ Read Online (HTML)   PDF  (672 kB)  ]    Order
	Geometry enhanced asymmetric rectifying tunneling diodes Kwangsik Choi, Geunmin Ryu, Filiz Yesilkoy, Athanasios Chryssis, Neil Goldsman, Mario Dagenais, and Martin Peckerar pp. C6O50-C6O55 Abstract   Full Text: [ Read Online (HTML)   PDF  (515 kB)  ]    Order
	Waveguide-plasmon resonances in gold-capped silicon-nitride disk photonic crystal slabs Jia-Hong Shyu, Huang-Ming Lee, Jui-Hsing Chien, and Jong-Ching Wu pp. C6O56-C6O59 Abstract   Full Text: [ Read Online (HTML)   PDF  (201 kB)  ]    Order
	Multilayer pattern transfer for plasmonic color filter applications Alex F. Kaplan, Ting Xu, Yi-Kuei Wu, and L. Jay Guo pp. C6O60-C6O63 Abstract   Full Text: [ Read Online (HTML)   PDF  (355 kB)  ]    Order
Nanostructures [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Batch wafer scale fabrication of passivated carbon nanotube transistors for electrochemical sensing applications I. Martin-Fernandez, X. Borrisé, E. Lora-Tamayo, P. Godignon, and F. Perez-Murano pp. C6P1-C6P5 Abstract   Full Text: [ Read Online (HTML)   PDF  (531 kB)  ]    Order
	Copper-plated 50 nm T-gate fabrication Richard K. Oxland, Xu Li, Susan Ferguson, Steven Bentley, and Iain G. Thayne pp. C6P6-C6P10 Abstract   Full Text: [ Read Online (HTML)   PDF  (255 kB)  ]    Order
	Direct synthesis of vertical -Fe2O3 nanowires from sputtered Fe thin film Keisuke Nagato, Masaki Furubayashi, Tetsuya Hamaguchi, and Masayuki Nakao pp. C6P11-C6P13 Abstract   Full Text: [ Read Online (HTML)   PDF  (399 kB)  ]    Order
	Pyrolysis of two-dimensional and three-dimensional interferometrically patterned resist structures D. B. Burckel, C. M. Washburn, D. D. Koleske, and R. Polsky pp. C6P14-C6P17 Abstract   Full Text: [ Read Online (HTML)   PDF  (504 kB)  ]    Order
	Fabrication and initial characterization of ultrahigh aspect ratio vias in gold using the helium ion microscope Larry Scipioni, David C. Ferranti, Vincent S. Smentkowski, and Radislav A. Potyrailo pp. C6P18-C6P23 Abstract   Full Text: [ Read Online (HTML)   PDF  (799 kB)  ]    Order
	Fabrication of poly(ethylene glycol) hydrogel structures for pharmaceutical applications using electron beam and optical lithography Misuk Bae, Richard A. Gemeinhart, Ralu Divan, Kamlesh J. Suthar, and Derrick C. Mancini pp. C6P24-C6P29 Abstract   Full Text: [ Read Online (HTML)   PDF  (527 kB)  ]    Order
	Nanofabrication of x-ray zone plates using ultrananocrystalline diamond molds and electroforming Michael J. Wojcik, Vishwanath Joshi, Anirudha V. Sumant, Ralu Divan, Leonidas E. Ocola, Ming Lu, and Derrick C. Mancini pp. C6P30-C6P35 Abstract   Full Text: [ Read Online (HTML)   PDF  (760 kB)  ]    Order
	Nanomachining and clamping point optimization of silicon carbon nitride resonators using low voltage electron beam lithography and cold development M. A. Mohammad, C. Guthy, S. Evoy, S. K. Dew, and M. Stepanova pp. C6P36-C6P41 Abstract   Full Text: [ Read Online (HTML)   PDF  (520 kB)  ]    Order
	Nanoporous ultrananocrystalline diamond membranes Olga Makarova, Ralu Divan, Nicolaie Moldovan, Daniel Rosenmann, and Cha-Mei Tang pp. C6P42-C6P47 Abstract   Full Text: [ Read Online (HTML)   PDF  (1232 kB)  ]    Order
	Nanostructured silicon membranes for control of molecular transport Bernadeta R. Srijanto, Scott T. Retterer, Jason D. Fowlkes, and Mitchel J. Doktycz pp. C6P48-C6P52 Abstract   Full Text: [ Read Online (HTML)   PDF  (432 kB)  ]    Order
	Semiconductor crystal islands for three-dimensional integration F. Crnogorac, S. Wong, and R. F. W. Pease pp. C6P53-C6P58 Abstract   Full Text: [ Read Online (HTML)   PDF  (632 kB)  ]    Order
	Structure and properties of polymer core-shell systems: Helium ion microscopy and electrical conductivity studies Valery Bliznyuk, Alexander Pud, Larry Scipioni, Chuong Huynh, Nikolay Ogurtsov, and David Ferranti pp. C6P59-C6P65 Abstract   Full Text: [ Read Online (HTML)   PDF  (841 kB)  ]    Order
	Noise analysis of carbon nanotube field effect transistors irradiated by electron beam Jack Chan, Deborah Kidd, Brian Burke, Lloyd Harriott, and Keith Williams pp. C6P66-C6P69 Abstract   Full Text: [ Read Online (HTML)   PDF  (354 kB)  ]    Order
	Plasma etch fabrication of 60:1 aspect ratio silicon nanogratings with 200 nm pitch Pran Mukherjee, Alexander Bruccoleri, Ralf K. Heilmann, Mark L. Schattenburg, Alex F. Kaplan, and L. Jay Guo pp. C6P70-C6P75 Abstract   Full Text: [ Read Online (HTML)   PDF  (725 kB)  ]    Order
Novel Imaging-Optical Lithography [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Optical and computed evaluation of keyhole diffractive imaging for lensless x-ray microscopy Bing Dai, Diling Zhu, Ronnachai Jaroensri, Kanokwan Kulalert, Piero Pianetta, and R. Fabian W. Pease pp. C6Q1-C6Q5 Abstract   Full Text: [ Read Online (HTML)   PDF  (537 kB)  ]    Order
	Customized illumination for process window optimization and yield improvement in mask aligner lithography systems Michael Hornung, Uwe Vogler, and Reinhard Voelkel pp. C6Q6-C6Q11 Abstract   Full Text: [ Read Online (HTML)   PDF  (746 kB)  ]    Order
	Projection lithography below lambda/7 through deep-ultraviolet evanescent optical imaging P. Xie and B. W. Smith pp. C6Q12-C6Q19 Abstract   Full Text: [ Read Online (HTML)   PDF  (530 kB)  ]    Order
	Development of a simple, compact, low-cost interference lithography system Hasan Korre, Corey P. Fucetola, Jeremy A. Johnson, and Karl K. Berggren pp. C6Q20-C6Q24 Abstract   Full Text: [ Read Online (HTML)   PDF  (344 kB)  ]    Order
	Nondestructive detection of deviation in integrated circuits Leili Baghaei, Bing Dai, Piero Pianetta, and R. Fabian W. Pease pp. C6Q25-C6Q27 Abstract   Full Text: [ Read Online (HTML)   PDF  (127 kB)  ]    Order
Resists [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Impact of development chemistry on extreme ultraviolet resist performance Roel Gronheid pp. C6S1-C6S5 Abstract   Full Text: [ Read Online (HTML)   PDF  (369 kB)  ]    Order
	Comparison of positive tone versus negative tone resist pattern collapse behavior Wei-Ming Yeh, David E. Noga, Richard A. Lawson, Laren M. Tolbert, and Clifford L. Henderson pp. C6S6-C6S11 Abstract   Full Text: [ Read Online (HTML)   PDF  (299 kB)  ]    Order
	High sensitivity nonchemically amplified molecular resists based on photosensitive dissolution inhibitors Richard A. Lawson, Laren M. Tolbert, and Clifford L. Henderson pp. C6S12-C6S18 Abstract   Full Text: [ Read Online (HTML)   PDF  (297 kB)  ]    Order
	Photopatternable inorganic hardmask Alan Telecky, Peng Xie, Jason Stowers, Andrew Grenville, Bruce Smith, and Douglas A. Keszler pp. C6S19-C6S22 Abstract   Full Text: [ Read Online (HTML)   PDF  (246 kB)  ]    Order
	Effects of salty-developer temperature on electron-beam-exposed hydrogen silsesquioxane resist for ultradense pattern transfer M. Yan, J. Lee, B. Ofuonye, S. Choi, J. H. Jang, and I. Adesida pp. C6S23-C6S27 Abstract   Full Text: [ Read Online (HTML)   PDF  (643 kB)  ]    Order

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