News & Announcements from
Journal of Applied Physics JAP at MRS Fall 2010 Meeting  Visit Journal of Applied Physics at booth #117 in the Exposition Hall at the MRS Fall 2010 National meeting in Boston to learn about news from the Journal, including online enhancements and for your chance to win an Apple iPad.
Research Highlights  The mechanism of low-k SiOCH film modification by oxygen atoms
O. V. Braginsky, A. S. Kovalev, D. V. Lopaev, E. M. Malykhin, Yu. A. Mankelevich, T. V. Rakhimova, A. T. Rakhimov, A. N. Vasilieva, S. M. Zyryanov, and M. R. Baklanov
It is shown that surface recombination on the pore wall surface determines the profile and penetration depth of O atoms into the films. The reaction of O atoms with methyl groups has lower probability and therefore proceeds in the background mode.
J. Appl. Phys. 108, 073303 (2010)
 Laser peen forming induced two way bending of thin sheet metals and its mechanisms
Yongxiang Hu, Xiaoxia Xu, Zhenqiang Yao, and Jun Hu
Experimental investigation has been carried out to understand the effect of process parameters such as laser intensity and scanning velocity on the bending deformation of thin sheet metal with different thicknesses. It is found that the sheet metal can be made to bend not only toward but also away from the laser beam depending on the process condition.
J. Appl. Phys. 108, 073117 (2010)
 Atomically controlled fabrications of subnanometer scale electrode gaps
Makusu Tsutsui, Takahito Ohshiro, Kazuki Matsubara, Masayuki Furuhashi, Masateru Taniguchi, and Tomoji Kawai
We report electrode gap formation at high-temperature using a self-breaking technique, thereby demonstrating the possible use of high-temperature Au nanocontact self-breaking processes for controlled fabrication of electrode gaps useful for DNA sequence readout with quantum mechanics.
J. Appl. Phys. 108, 064312 (2010)
 More Research Highlights
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We encourage scientific researchers to join UniPHY to begin to create and participate in dynamic conversations that will enhance and accelerate their research interests and activities.
Join the Journal of Applied Physics group now Author Select AIP is pleased to announce that through its Author Select® initiative, authors now have the option to choose to provide free online access to their published article, in perpetuity, to any online user. To learn more, visit the Author Select Information page. Top 20 Most Downloaded Articles View the 20 most downloaded articles published in Journal of Applied Physics, updated monthly. Did you know...? Multimedia files can be included in the online version of published papers and viewed by simply clicking on a link in the paper. Guidelines for submission | 
