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Table of Contents Alert for Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures


Journal of Vacuum Science & Technology B (Microelectronics and Nanometer Structures)

September 2009

Volume 27, Issue 5 , pp. L21-2323

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  • Letters
  • Articles
  • Brief Reports and Comments
  • Letters

  • Effect of sidewall passivation in BCl3/N2 inductively coupled plasma etching of two-dimensional GaAs photonic crystals
    Kirill A. Atlasov, Pascal Gallo, Alok Rudra, Benjamin Dwir, and Eli Kapon
    pp. L21-L24

    Abstract    Full Text: [ HTML Sectioned HTML   PDF (450 kB)  ]    Order
  • Effects of Ga+ milling on InGaAsP quantum well laser with mirrors milled by focused ion beam
    F. Vallini, D. S. L. Figueira, P. F. Jarschel, L. A. M. Barea, A. A. G. Von Zuben, and N. C. Frateschi
    pp. L25-L27

    Abstract    Full Text: [ HTML Sectioned HTML   PDF (215 kB)  ]    Order
  • Analysis of dielectric constant of a self-forming barrier layer with Cu–Mn alloy on TEOS-SiO2
    S.-M. Chung and J. Koike
    pp. L28-L31

    Abstract    Full Text: [ HTML Sectioned HTML   PDF (341 kB)  ]    Order
  • Articles

  • Impact of in situ SiNx layer grown with metal organic vapor phase epitaxy on the electrical and optical properties of AlN/GaN metal insulator semiconductor field effect transistor structures
    E. Cho, S. Seo, C. Jin, D. Pavlidis, G. Fu, J. Tuerck, and W. Jaegermann
    pp. 2079-2083

    Abstract    Full Text: [ HTML Sectioned HTML   PDF (425 kB)  ]    Order
  • Analysis of thermally activated kinetics and uniformity of photoresist ashing process on 300 mm wafers
    D. L. Mézerette, K. Tanimura, and G. K. Vinogradov
    pp. 2084-2090

    Abstract    Full Text: [ HTML Sectioned HTML   PDF (485 kB)  ]    Order
  • Effects of exposure time on defects and demolding force in soft ultraviolet nanoimprint lithography
    Xiangdong Ye, Yucheng Ding, Yugang Duan, Hongzhong Liu, and Bingheng Lu
    pp. 2091-2096

    Abstract    Full Text: [ HTML Sectioned HTML   PDF (442 kB)  ]    Order
  • Inductively coupled plasma reactive ion etching of bulk ZnO single crystal and molecular beam epitaxy grown ZnO films
    M. Mehta, M. Ruth, K. A. Piegdon, D. Krix, H. Nienhaus, and C. Meier
    pp. 2097-2101

    Abstract    Full Text: [ HTML Sectioned HTML   PDF (435 kB)  ]    Order
  • Enhancement of operation temperature of InAs/GaAs quantum-dot infrared photodetectors with hydrogen-plasma treatment
    Wei-Hsun Lin, Chi-Che Tseng, Kuang-Ping Chao, Shih-Yen Lin, and Meng-Chyi Wu
    pp. 2102-2105

    Abstract    Full Text: [ HTML Sectioned HTML   PDF (320 kB)  ]    Order
  • Growth scaling of metal oxide columnar thin films deposited by glancing angle depositions
    M. T. Taschuk, K. M. Krause, J. J. Steele, M. A. Summers, and M. J. Brett
    pp. 2106-2111

    Abstract    Full Text: [ HTML Sectioned HTML   PDF (255 kB)  ]    Order
  • Effect of Ta buffer layer and thickness on the structural and magnetic properties of Co thin films
    K. Vahaplar, S. Tari, H. Tokuc, and S. Okur
    pp. 2112-2116

    Abstract    Full Text: [ HTML Sectioned HTML   PDF (589 kB)  ]    Order
  • Mechanism of reducing line edge roughness in ArF photoresist by using CF3I plasma
    Eiichi Soda, Seiichi Kondo, Shuichi Saito, Koji Koyama, Butsurin Jinnai, and Seiji Samukawa
    pp. 2117-2123

    Abstract    Full Text: [ HTML Sectioned HTML   PDF (1177 kB)  ]    Order
  • Structural and electrical properties of metal contacts on n-type ZnO thin film deposited by vacuum coating technique
    C. Periasamy and P. Chakrabarti
    pp. 2124-2127

    Abstract    Full Text: [ HTML Sectioned HTML   PDF (343 kB)  ]    Order
  • Transparent dual-gate InGaZnO thin film transistors: OR gate operation
    Wantae Lim, E. A. Douglas, Jaewon Lee, Junghun Jang, V. Craciun, D. P. Norton, S. J. Pearton, F. Ren, S. Y. Son, J. H. Yuh, H. Shen, and W. Chang
    pp. 2128-2131

    Abstract    Full Text: [ HTML Sectioned HTML   PDF (330 kB)  ]    Order
  • Plasma treatment methods to improve indium bump bonding via indium oxide removal
    Frank Greer, Matthew Dickie, R. P. Vasquez, Todd J. Jones, Michael E. Hoenk, and Shouleh Nikzad
    pp. 2132-2137

    Abstract    Full Text: [ HTML Sectioned HTML   PDF (1637 kB)  ]    Order
  • Highly sensitive positive-working molecular resist based on new molecule
    Shigeki Hattori, Arisa Yamada, Satoshi Saito, Koji Asakawa, Takeshi Koshiba, and Tetsuro Nakasugi
    pp. 2138-2144

    Abstract    Full Text: [ HTML Sectioned HTML   PDF (1033 kB)  ]    Order
  • Pd/Ru/Au Ohmic contacts to InAlSb/InAs heterostructures for high electron mobility transistors
    R. Dormaier, Q. Zhang, Y.-C. Chou, M. D. Lange, J. M. Yang, A. Oki, and S. E. Mohney
    pp. 2145-2152

    Abstract    Full Text: [ HTML Sectioned HTML   PDF (1082 kB)  ]    Order
  • Controlled etching and regrowth of tunnel oxide for antenna-coupled metal-oxide-metal diodes
    Badri Tiwari, Jeffrey A. Bean, Gergő Szakmány, Gary H. Bernstein, Patrick Fay, and Wolfgang Porod
    pp. 2153-2160

    Abstract    Full Text: [ HTML Sectioned HTML   PDF (973 kB)  ]    Order
  • Nonlinear large deflection of nanopillars fabricated by focused ion-beam induced chemical vapor deposition using double-cantilever testing
    Hiro Tanaka, Masaki Shinkai, Yoji Shibutani, and Yasuo Kogo
    pp. 2161-2165

    Abstract    Full Text: [ HTML Sectioned HTML   PDF (237 kB)  ]    Order
  • Cu-plated through-wafer vias for AlGaN/GaN high electron mobility transistors on Si
    K.-H. Chen, F. Ren, A. Pais, Huikai Xie, B. P. Gila, S. J. Pearton, J. W. Johnson, P. Rajagopal, J. C. Roberts, E. L. Piner, and K. J. Linthicum
    pp. 2166-2169

    Abstract    Full Text: [ HTML Sectioned HTML   PDF (537 kB)  ]    Order
  • Fabrication and optical properties of Ti-doped W18O49 nanorods using a modified plasma-arc gas-condensation technique
    Cherng-Yuh Su, Hsuan-Ching Lin, and Chung-Kwei Lin
    pp. 2170-2174

    Abstract    Full Text: [ HTML Sectioned HTML   PDF (460 kB)  ]    Order
  • Effects of Si interlayer on resistance switching of Pt/Si/TiO2/Pt structures
    Seunghee Go, Kyunghoon Jeong, Kwanwoo Lee, Ara Kim, Hyun Ruh, Chang Soo Kim, and Jaegab Lee
    pp. 2175-2181

    Abstract    Full Text: [ HTML Sectioned HTML   PDF (892 kB)  ]    Order
  • Novel heterostructure of CdS nanoparticle/WO3 nanowhisker: Synthesis and photocatalytic properties
    Hyeyoung Kim, Youngjo Tak, Karuppanan Senthil, Jinmyoung Joo, Sangmin Jeon, and Kijung Yong
    pp. 2182-2186

    Abstract    Full Text: [ HTML Sectioned HTML   PDF (437 kB)  ]    Order
  • Evolution of surface morphology of dry-etched ZnO with Cl2/Ar plasma
    Kuang-Po Hsueh, Ren-Jie Hou, and Chun-Ju Tun
    pp. 2187-2191

    Abstract    Full Text: [ HTML Sectioned HTML   PDF (635 kB)  ]    Order
  • Effect of liquid dispensing on flow field for immersion lithography
    Wenyu Chen, Ying Chen, Jun Zou, Xin Fu, Huayong Yang, Xiaodong Ruan, and Guofang Gong
    pp. 2192-2199

    Abstract    Full Text: [ HTML Sectioned HTML   PDF (1123 kB)  ]    Order
  • The effect of acid on superconformal filling in 100  nm trenches
    Joshua W. Gallaway and Alan C. West
    pp. 2200-2205

    Abstract    Full Text: [ HTML Sectioned HTML   PDF (336 kB)  ]    Order
  • Organopalladium catalyst on S-terminated GaAs(001)-(2×6) surface
    Tomoya Konishi, Takashi Toujyou, Takuma Ishikawa, Gavin R. Bell, and Shiro Tsukamoto
    pp. 2206-2208

    Abstract    Full Text: [ HTML Sectioned HTML   PDF (359 kB)  ]    Order
  • Characterization of focused-ion-beam induced defect structures in graphite for the future guided self-assembly of molecules
    Sarah E. O'Donnell and Petra Reinke
    pp. 2209-2216

    Abstract    Full Text: [ HTML Sectioned HTML   PDF (778 kB)  ]    Order
  • Calculation of electron emission from a gated single nanowire
    Da Lei, Weibiao Wang, Leyong Zeng, and Jingqiu Liang
    pp. 2217-2221

    Abstract    Full Text: [ HTML Sectioned HTML   PDF (268 kB)  ]    Order
  • Electrical characterization of thin InAs films grown on patterned W/GaAs substrates
    Gvidas Astromskas, L. Reine Wallenberg, and Lars-Erik Wernersson
    pp. 2222-2226

    Abstract    Full Text: [ HTML Sectioned HTML   PDF (384 kB)  ]    Order
  • Comparison of conjugated polymer deposition techniques by photoluminescence spectroscopy
    K. R. Lantz, R. Pate, A. D. Stiff-Roberts, A. G. Duffell, E. R. Smith, and H. O. Everitt
    pp. 2227-2231

    Abstract    Full Text: [ HTML Sectioned HTML   PDF (296 kB)  ]    Order
  • Oxygen effects on radiation hardness of ZnO thin films
    Emre Gür, Hatice Asıl, Kübra Çınar, C. Coskun, S. Tüzemen, Kadem Meral, Y. Onganer, and Korkmaz Serifoğlu
    pp. 2232-2237

    Abstract    Full Text: [ HTML Sectioned HTML   PDF (727 kB)  ]    Order
  • Luminescence mechanisms in Si quantum dots-SiNx nanocomposite structures
    Béchir Rezgui, Abel Sibai, Tetyana Nychyporuk, Mustapha Lemiti, and Georges Brémond
    pp. 2238-2241

    Abstract    Full Text: [ HTML Sectioned HTML   PDF (459 kB)  ]    Order
  • Surface plasmon resonance of gold nanoparticles formed by cathodic arc plasma ion implantation into polymer
    F. S. Teixeira, M. C. Salvadori, Mauro Cattani, S. M. Carneiro, and I. G. Brown
    pp. 2242-2247

    Abstract    Full Text: [ HTML Sectioned HTML   PDF (636 kB)  ]    Order
  • Structural and luminescent properties of Er-doped ZnO films grown by metalorganic chemical vapor deposition
    Yoshikazu Terai, Keisuke Yamaoka, Takashi Yamaguchi, and Yasufumi Fujiwara
    pp. 2248-2251

    Abstract    Full Text: [ HTML Sectioned HTML   PDF (312 kB)  ]    Order
  • Etch stop in via-hole etching on aluminum interconnection using inductively coupled C2F6 plasma with O2 additive gas
    Shin-ichi Imai and Nobuhiro Jiwari
    pp. 2252-2258

    Abstract    Full Text: [ HTML Sectioned HTML   PDF (556 kB)  ]    Order
  • Nanoimprint mold fabrication and duplication for embedded servo and discrete track recording media
    E. L. Tan, K. O. Aung, R. Sbiaa, S. K. Wong, H. K. Tan, W. C. Poh, S. N. Piramanayagam, and C. C. Chum
    pp. 2259-2263

    Abstract    Full Text: [ HTML Sectioned HTML   PDF (767 kB)  ]    Order
  • Uniformity conditioning of diamond field emitter arrays
    J. D. Jarvis, H. L. Andrews, C. A. Brau, B. K. Choi, J. Davidson, W.-P. Kang, and Y.-M. Wong
    pp. 2264-2269

    Abstract    Full Text: [ HTML Sectioned HTML   PDF (512 kB)  ]    Order
  • Time-multiplexed, inductively coupled plasma process with separate SiCl4 and O2 steps for etching of GaAs with high selectivity
    S. Golka, M. Arens, M. Reetz, T. Kwapien, S. Bouchoule, and G. Patriarche
    pp. 2270-2279

    Abstract    Full Text: [ HTML Sectioned HTML   PDF (3465 kB)  ]    Order
  • Numerical approach for the theory of harmonic self-heating technique to measure thermophysical properties of suspended thin samples
    Bo Feng, Zhixin Li, Xing Zhang, and G. P. Peterson
    pp. 2280-2285

    Abstract    Full Text: [ HTML Sectioned HTML   PDF (537 kB)  ]    Order
  • Film-thickness dependence of 10 GHz Nb coplanar-waveguide resonators
    Kunihiro Inomata, Tsuyoshi Yamamoto, Michio Watanabe, Kazuaki Matsuba, and Jaw-Shen Tsai
    pp. 2286-2291

    Abstract    Full Text: [ HTML Sectioned HTML   PDF (662 kB)  ]    Order
  • Self-assembled monolayers of poly(ethylene glycol) siloxane as a resist for ultrahigh-resolution electron beam lithography on silicon oxide
    Bo Gao, Gary H. Bernstein, and Marya Lieberman
    pp. 2292-2300

    Abstract    Full Text: [ HTML Sectioned HTML   PDF (1124 kB)  ]    Order
  • Effect of etch-clean delay time on post-etch residue removal for front-end-of-line applications
    Ingrid Vos, David Hellin, Guy Vereecke, Elizabeth Pavel, Werner Boullart, and Johan Vertommen
    pp. 2301-2308

    Abstract    Full Text: [ HTML Sectioned HTML   PDF (1474 kB)  ]    Order
  • Diagnostics and modeling of CH4–CO2 plasmas for nanosmooth diamond deposition: Comparison to experimental data
    T. Gries, L. Vandenbulcke, S. de Persis, O. Aubry, and J. L. Delfau
    pp. 2309-2320

    Abstract    Full Text: [ HTML Sectioned HTML   PDF (1021 kB)  ]    Order
  • Brief Reports and Comments

  • Influence of room temperature control on atomic force microscope imaging
    Joseph Fu, Chu Wei, and Theodore Vorburger
    pp. 2321-2323

    Abstract    Full Text: [ HTML Sectioned HTML   PDF (734 kB)  ]    Order
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