Research Highlights & News from J. Appl. Phys.

News & Announcements from Journal of Applied Physics APS-March Meeting 21–25 March Meet the Editors You can meet some of JAP's editors at the joint AIP/APS Meet the Editors Reception on Tuesday, 22 March at 4:00 p.m.in the Dallas Convention Center, Lobby E. Enter to Win an iPad JAP will also be represented at AIP Publishing booth #400 at the APS March Meeting, 21–25 March. When you visit the AIP Publishing booth you can enter to win an iPad and discover the latest news about JAP and other AIP journals. Top Downloads View the 20 most downloaded articles published in Journal of Applied Physics, updated monthly. Image from Advanced mechanical properties of graphene paper Ali R. Ranjbartoreh, Bei Wang, Xiaoping Shen, and Guoxiu Wang J. Appl. Phys. 109, 014306 (2011) Research Highlights Ultrananocrystalline diamond film deposition by direct-current plasma assisted chemical vapor deposition using hydrogen-rich precursor gas in the absence of the positive column Hak-Joo Lee, Hyeongtag Jeon, and Wook-Seong Lee The ultrananocrystalline diamond deposition by direct-current plasma assisted chemical vapor deposition on a Si wafer, using hydrogen-rich and argon-rich precursor gases containing additive nitrogen, has been investigated. The discharge stability and impurity incorporation are sensitive to the cathode material and to the precursor gas composition. J. Appl. Phys. 109, 023303 (2011) Kinetics of illuminated complex plasmas considering Mie scattering by spherical dust particles with a size distribution M. S. Sodha, S. K. Mishra, and Shikha Misra The effect of Mie scattering of light by dust particles on the kinetics of an illuminated complex plasma, having a size distribution of particles, is investigated. Theory is based on number and energy balance of constituents, charge balance on the particles and generation of electrons/ions by ionization of gas, and photoelectric electron emission by the particles. J. Appl. Phys. 109, 013303 (2011) Microwave air plasma source at atmospheric pressure: Experiment and theory E. Tatarova, F. M. Dias, E. Felizardo, J. Henriques1, M. J. Pinheiro, C. M. Ferreira, and B. Gordiets Measurements of the gas temperature and of the intensities of the O(777.4 nm), O(844.6 nm), and O(630 nm) atomic lines and the NO(γ) molecular band versus input power and axial position were carried out. Amplitude and phase sensitive measurements are also performed to derive the surface wave dispersion characteristics. J. Appl. Phys. 108, 123305 (2010) More Research Highlights AIP Labs AIP Labs is a new interactive workspace that lets our technology team loose to showcase the latest plug-ins, apps, and other gee-whiz products they've been working on. Check out the following apps in AIP Labs today: PermaCode generator Cool Iris wall Google Chrome extensions iPeer Review Visit AIP Labs Now Keep up-to-date with all the latest news and articles in JAP Sign up for RSS feeds Sign up for JAP Table of Content Alerts today! Did you know? Supplementary data, images or other information can be submitted alongside your manuscript. For more information, visit the Supplemental Material homepage. Stay informed, with Journal of Applied Physics on: Submit your manuscript Information for Contributors

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