Table of Contents Alert for Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures

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Journal of Vacuum Science & Technology B (Microelectronics and Nanometer Structures)

November 2009

Volume 27, Issue 6 , pp. L33-3260

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Letters Regular Articles Shop Notes Errata PAPERS FROM THE 53rd INTERNATIONAL CONFERENCE ON ELECTRON, ION, AND PHOTON BEAM TECHNOLOGY AND NANOFABRICATION Preface LITHOGRAPHY E-Beam Lithography Ion Beam Based Nanofabrication Maskless Lithography Nanoimprint Lithography Extreme Ultraviolet Lithography Optical Lithography Modelling Lithographic Exposure NANOFABRICATION MATERIALS Resists Directed Assembly on Patterned Substrate Graphene Energy Storage APPLICATIONS Nanobiology Nano-Mems Nanoelectronics Nanophotonics NANOMETROLOGY Nanometrology

Letters
	Proton irradiation effects on Sb-based heterojunction bipolar transistors C. F. Lo, H.-Y. Kim, J. Kim, Shu-Han Chen, Sheng-Yu Wang, Jen-Inn Chyi, B. Y. Chou, K. H. Chen, Y. L. Wang, C. Y. Chang, S. J. Pearton, L. I. Kravchenko, S. Jang, and F. Ren pp. L33-L37 Abstract    Full Text: [ HTML Sectioned HTML   PDF (598 kB)  ]    Order
	Resonant structures based on amorphous silicon suboxide doped with Er3+ with silicon nanoclusters for an efficient emission at 1550  nm D. S. L. Figueira, D. Mustafa, L. R. Tessler, and N. C. Frateschi pp. L38-L41 Abstract    Full Text: [ HTML Sectioned HTML   PDF (435 kB)  ]    Order
	190  nm excimer laser drilling of glass slices: Dependence of drilling rate and via hole shape on the diameter of the via hole K. H. Chen, Wenhsing Wu, Byung Hwan Chu, C. F. Lo, Jenshan Lin, Y. L. Wang, C. Y. Chang, S. J. Pearton, and F. Ren pp. L42-L46 Abstract    Full Text: [ HTML Sectioned HTML   PDF (668 kB)  ]    Order
	Alloy liquid metal ion source for carbon focused ion beams P. Mazarov, A. D. Wieck, L. Bischoff, and W. Pilz pp. L47-L49 Abstract    Full Text: [ HTML Sectioned HTML   PDF (259 kB)  ]    Order
	Selective etching and polymer deposition on InP surface in reactive ion etching with a mixture of methane and hydrogen Norio Yamamoto pp. L50-L53 Abstract    Full Text: [ HTML Sectioned HTML   PDF (232 kB)  ]    Order
	Thermal stability of GeSbTe thin films deposited by layer-by-layer metalorganic chemical vapor deposition Jun-Ku Ahn, Kyoung-Woo Park, Nak-Jin Seong, and Soon-Gil Yoon pp. L54-L57 Abstract    Full Text: [ HTML Sectioned HTML   PDF (367 kB)  ]    Order
Regular Articles
	Investigation of the physical and electronic properties of indium doped zinc oxide nanofibers synthesized by electrospinning A. F. Lotus, Y. C. Kang, R. D. Ramsier, and G. G. Chase pp. 2331-2336 Abstract    Full Text: [ HTML Sectioned HTML   PDF (819 kB)  ]    Order
	Removing plasma-induced sidewall damage in GaN-based light-emitting diodes by annealing and wet chemical treatments Y. Yang and X. A. Cao pp. 2337-2341 Abstract    Full Text: [ HTML Sectioned HTML   PDF (747 kB)  ]    Order
	Damage evolution in GaN under MeV heavy ion implantation Yuan Gao, Jianming Xue, Dongzheng Zhang, Zilong Wang, Chune Lan, Sha Yan, Yugang Wang, Fujun Xu, Bo Shen, and Yanwen Zhang pp. 2342-2346 Abstract    Full Text: [ HTML Sectioned HTML   PDF (696 kB)  ]    Order
	Focused-ion beam fabrication of nanometer orifices for leak detection G. Firpo, L. Repetto, F. Buatier de Mongeot, and U. Valbusa pp. 2347-2350 Abstract    Full Text: [ HTML Sectioned HTML   PDF (527 kB)  ]    Order
	HBr based inductively coupled plasma etching of high aspect ratio nanoscale trenches in InP: Considerations for photonic applications N. Sultana, Wei Zhou, Tim P. LaFave, Jr., and Duncan L. MacFarlane pp. 2351-2356 Abstract    Full Text: [ HTML Sectioned HTML   PDF (792 kB)  ]    Order
	Measuring interface electrostatic potential and surface charge in a scanning electron microscope I. Sychugov, Y. Nakayama, and K. Mitsuishi pp. 2357-2360 Abstract    Full Text: [ HTML Sectioned HTML   PDF (560 kB)  ]    Order
	Selective dry etching of attenuated phase-shift mask materials for extreme ultraviolet lithography using inductively coupled plasmas H. Y. Jung, Y. R. Park, H. J. Lee, N.-E. Lee, C. Y. Jeong, and Jinho Ahn pp. 2361-2365 Abstract    Full Text: [ HTML Sectioned HTML   PDF (417 kB)  ]    Order
	Electrical characteristics of thin boron carbonitride films on Ge(100) and Si(100) P. R. Fitzpatrick and J. G. Ekerdt pp. 2366-2374 Abstract    Full Text: [ HTML Sectioned HTML   PDF (501 kB)  ]    Order
	Study of low temperature growth of III-V alloys for transparent layers L. Wu, S. Iyer, J. Li, K. Gibson, J. Reppert, A. M. Rao, K. Matney, and J. Lewis pp. 2375-2383 Abstract    Full Text: [ HTML Sectioned HTML   PDF (969 kB)  ]    Order
	Influence of sputtering a ZnMgO window layer on the interface and bulk properties of Cu(In,Ga)Se2 solar cells Jian V. Li, Xiaonan Li, Yanfa Yan, Chun-Sheng Jiang, Wyatt K. Metzger, Ingrid L. Repins, Miguel A. Contreras, and Dean H. Levi pp. 2384-2389 Abstract    Full Text: [ HTML Sectioned HTML   PDF (326 kB)  ]    Order
	Physical and electrical characterizations of metal-oxide-semiconductor capacitors fabricated on GaAs substrates with different surface chemical treatments and Al2O3 gate dielectric Domingo I. Garcia-Gutierrez, Davood Shahrjerdi, Vidya Kaushik, and Sanjay K. Banerjee pp. 2390-2395 Abstract    Full Text: [ HTML Sectioned HTML   PDF (554 kB)  ]    Order
	Influence of proton irradiation on the structure and stability of poly(dimethylsiloxane) and poly(dimethylsiloxane)-nanodiamond composite V. Borjanović, L. Bistričić, I. Vlasov, K. Furić, I. Zamboni, M. Jakšić, and O. Shenderova pp. 2396-2403 Abstract    Full Text: [ HTML Sectioned HTML   PDF (604 kB)  ]    Order
	Transport mechanism in aluminum nitride-metal multilayer junctions A. Kabulski and D. Korakakis pp. 2404-2407 Abstract    Full Text: [ HTML Sectioned HTML   PDF (312 kB)  ]    Order
	Simultaneous measurement of thermal conductivity and interface thermal conductance of diamond thin film Byeonghee Lee, Joon Sik Lee, Sun Ung Kim, Kyeongtae Kim, Ohmyoung Kwon, Seungkoo Lee, Jong Hoon Kim, and Dae Soon Lim pp. 2408-2412 Abstract    Full Text: [ HTML Sectioned HTML   PDF (356 kB)  ]    Order
	Hyperthermal atomic hydrogen and oxygen etching of vertically oriented graphene sheets M. Bagge-Hansen, R. A. Outlaw, M. Y. Zhu, H. J. Chen, and D. M. Manos pp. 2413-2419 Abstract    Full Text: [ HTML Sectioned HTML   PDF (561 kB)  ]    Order
	Improving field-emission uniformity of large-area W18O49 nanowire films by electrical treatment Z. L. Li, Fei Liu, N. S. Xu, Jun Chen, and S. Z. Deng pp. 2420-2425 Abstract    Full Text: [ HTML Sectioned HTML   PDF (825 kB)  ]    Order
	Concept and operation of Schottky emitter without suppressor electrode A. K. Dokania and P. Kruit pp. 2426-2431 Abstract    Full Text: [ HTML Sectioned HTML   PDF (493 kB)  ]    Order
	Thermodynamically stable nanotips of Au–Mo alloy K. Nomura, T. Nagao, B. L. Cho, H. Katsuda, T. Matsumura, and C. Oshima pp. 2432-2434 Abstract    Full Text: [ HTML Sectioned HTML   PDF (238 kB)  ]    Order
	Emission site density depending on surface area and morphology of nanotube film emitters Huarong Liu, Shigeki Kato, and Yahachi Saito pp. 2435-2438 Abstract    Full Text: [ HTML Sectioned HTML   PDF (355 kB)  ]    Order
	Protein patterning on the micro- and nanoscale by thermal nanoimprint lithography on a new functionalized copolymer S. Merino, A. Retolaza, V. Trabadelo, A. Cruz, P. Heredia, J. A. Alduncín, D. Mecerreyes, I. Fernández-Cuesta, X. Borrisé, and F. Pérez-Murano pp. 2439-2443 Abstract    Full Text: [ HTML Sectioned HTML   PDF (609 kB)  ]    Order
	Carbon nanotube pillar structures for human neural cell culture Jin Woo Lee, Kyong Soo Lee, Byeong Kwon Ju, Hyun Jin Cho, Nae Sung Lee, Min Young Kim, Eun Hye Kim, and Kyu Back Lee pp. 2444-2448 Abstract    Full Text: [ HTML Sectioned HTML   PDF (1593 kB)  ]    Order
	Fabrication of large-area gallium arsenide nanowires using silicon dioxide nanoparticle mask Ding-Shin Wang, Jiun-Jie Chao, Shih-Che Hung, and Ching-Fuh Lin pp. 2449-2452 Abstract    Full Text: [ HTML Sectioned HTML   PDF (525 kB)  ]    Order
	Growth of InSb epilayers and quantum wells on Ge(001) substrates by molecular beam epitaxy M. C. Debnath, T. D. Mishima, M. B. Santos, K. Hossain, and O. W. Holland pp. 2453-2456 Abstract    Full Text: [ HTML Sectioned HTML   PDF (242 kB)  ]    Order
	Inverted method for fabricating a nano-aperture device with subwavelength structures A. Suutala, J. Olkkonen, D. C. Cox, J. Lappalainen, and H. Jantunen pp. 2457-2461 Abstract    Full Text: [ HTML Sectioned HTML   PDF (537 kB)  ]    Order
	Enhanced charge storage characteristics of silicon nanocrystals fabricated by electron-beam coevaporation of Si and SiOx(x=1  or  2) Chen Chen, Rui Jia, Weilong Li, Haofeng Li, Tianchun Ye, Xinyu Liu, Ming Liu, Seiya Kasai, Hashizume Tamotsu, and Nanjian Wu pp. 2462-2467 Abstract    Full Text: [ HTML Sectioned HTML   PDF (799 kB)  ]    Order
	Retention-failure mechanism of TaN/CuxO/Cu resistive memory with good data retention capability H. J. Wan, P. Zhou, L. Ye, Y. Y. Lin, J. G. Wu, H. Wu, and M. H. Chi pp. 2468-2471 Abstract    Full Text: [ HTML Sectioned HTML   PDF (575 kB)  ]    Order
	High density plasma etching of titanium nitride metal gate electrodes for fully depleted silicon-on-insulator subthreshold transistor integration Steven A. Vitale, Jakub Kedzierski, and Craig L. Keast pp. 2472-2479 Abstract    Full Text: [ HTML Sectioned HTML   PDF (1059 kB)  ]    Order
	Photoresist removal using an O2/N2 medium pressure plasma jet with high speed wafer scanning: Unimplanted resist studies M. Bhargava, B. Craver, Jose L. Torres, H. Guo, S. C. Vemula, A. K. Srivastava, I. Berry, and J. C. Wolfe pp. 2480-2486 Abstract    Full Text: [ HTML Sectioned HTML   PDF (634 kB)  ]    Order
Shop Notes
	Fabrication of oxidation-free contacts to nanopatterned Permalloy structures Hye-Young Kim, Kang Ho Lee, Gyu-Tae Kim, Woun Kang, and Kyung-Jin Lee pp. 2487-2489 Abstract    Full Text: [ HTML Sectioned HTML   PDF (334 kB)  ]    Order
Errata
	Erratum for: “IVNC Preface” [J. Vac. Sci. Technol. B Volume 27, Issue 2, pp. 686–686 (2009)] Jan A. Dziuban p. 2490 Abstract    Full Text: [ HTML Sectioned HTML   PDF (28 kB)  ]    Order
PAPERS FROM THE 53rd INTERNATIONAL CONFERENCE ON ELECTRON, ION, AND PHOTON BEAM TECHNOLOGY AND NANOFABRICATION Preface [ Next Subject | Issue Index | Top / Bottom of Page]
	Preface Elizabeth Dobisz p. 2502 Abstract    Full Text: [ HTML Sectioned HTML   PDF (23 kB)  ]    Order
LITHOGRAPHY E-Beam Lithography [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Method for improving the aspect ratio of ultrahigh-resolution structures in negative electron-beam resist V. A. Sidorkin, P. F. A. Alkemade, H. W. M. Salemink, R. Schmits, and E. van der Drift pp. 2503-2507 Abstract    Full Text: [ HTML Sectioned HTML   PDF (539 kB)  ]    Order
	Patterning decomposable polynorbornene with electron beam lithography to create nanochannels Nicole R. Devlin, Devin K. Brown, and Paul A. Kohl pp. 2508-2511 Abstract    Full Text: [ HTML Sectioned HTML   PDF (684 kB)  ]    Order
	Study on line edge roughness for electron beam acceleration voltages from 50  to  5  kV D. Rio, C. Constancias, M. Saied, B. Icard, and L. Pain pp. 2512-2517 Abstract    Full Text: [ HTML Sectioned HTML   PDF (456 kB)  ]    Order
	Evaluation of each electron beam and exposure results with four column cells in multicolumn e-beam exposure system Akio Yamada, Hiroshi Yasuda, and Masaki Yamabe pp. 2518-2523 Abstract    Full Text: [ HTML Sectioned HTML   PDF (913 kB)  ]    Order
	Reversible shape changes of the end facet on Schottky electron emitters M. S. Bronsgeest and P. Kruit pp. 2524-2531 Abstract    Full Text: [ HTML Sectioned HTML   PDF (531 kB)  ]    Order
	Design for electron beam: A novel approach to electron beam direct writing throughput enhancement for volume production Takashi Maruyama, Yasuhide Machida, Shinji Sugatani, Haruo Tsuchikawa, Hiromi Hoshino, Masaru Ito, Haruyuki Tago, Larry L. Chau, Shone Lee, and Hideaki Komami pp. 2532-2536 Abstract    Full Text: [ HTML Sectioned HTML   PDF (1062 kB)  ]    Order
	Self-powered near field electron lithography Yuerui Lu, Norimasa Yoshimizu, and Amit Lal pp. 2537-2541 Abstract    Full Text: [ HTML Sectioned HTML   PDF (459 kB)  ]    Order
	Microcolumn design for a large scan field and pixel number H. Weigand, S. Gautsch, W. Strohmaier, M. Fleischer, U. Staufer, N. F. de Rooij, and D. P. Kern pp. 2542-2546 Abstract    Full Text: [ HTML Sectioned HTML   PDF (645 kB)  ]    Order
	Off-axis emission properties for the extended Schottky electron source K. Liu, G. A. Schwind, and L. W. Swanson pp. 2547-2552 Abstract    Full Text: [ HTML Sectioned HTML   PDF (508 kB)  ]    Order
	Method of improving the quality of nanopatterning in atomic image projection electron-beam lithography Hyun-Mi Kim, Min Hyun Lee, Hyo-Sung Lee, Jung-Sub Wi, Kipil Lim, and Ki-Bum Kim pp. 2553-2557 Abstract    Full Text: [ HTML Sectioned HTML   PDF (753 kB)  ]    Order
	Amino-propyl-triethoxy-silane on aluminum fiducial grids for spatial-phase-locked electron-beam lithography C. B. Samantaray and J. T. Hastings pp. 2558-2562 Abstract    Full Text: [ HTML Sectioned HTML   PDF (435 kB)  ]    Order
	Image processing using shape recognition for alignment to damaged registration marks in electron beam lithography E. Kratschmer, D. P. Klaus, R. Viswanathan, M. L. Turnidge, P. L. Reed, and B. McPhail pp. 2563-2568 Abstract    Full Text: [ HTML Sectioned HTML   PDF (873 kB)  ]    Order
	Nanoscale geometry assisted proximity effect correction for electron beam direct write nanolithography L. E. Ocola pp. 2569-2571 Abstract    Full Text: [ HTML Sectioned HTML   PDF (600 kB)  ]    Order
	Application of neural network to controlling three-dimensional electron-beam exposure distribution in resist C. Guo, S.-Y. Lee, S. H. Lee, B.-G. Kim, and H.-K. Cho pp. 2572-2579 Abstract    Full Text: [ HTML Sectioned HTML   PDF (917 kB)  ]    Order
	Spatial dose control for fabrication of saw-tooth structures S.-Y. Lee, S. C. Jeon, J. S. Kim, K. N. Kim, M. S. Hyun, J. J. Yoo, and J. W. Kim pp. 2580-2584 Abstract    Full Text: [ HTML Sectioned HTML   PDF (476 kB)  ]    Order
	Fabrication of high density, high-aspect-ratio polyimide nanofilters Olga V. Makarova, Cha-Mei Tang, Platte Amstutz, Ralu Divan, Alexandra Imre, Derrick C. Mancini, Mark Hoffbauer, and Todd Williamson pp. 2585-2587 Abstract    Full Text: [ HTML Sectioned HTML   PDF (701 kB)  ]    Order
	Hydrogen silsesquioxane-based hybrid electron beam and optical lithography for high density circuit prototyping M. Guillorn, J. Chang, N. Fuller, J. Patel, M. Darnon, A. Pyzyna, E. Joseph, S. Engelmann, J. Ott, J. Newbury, D. Klaus, J. Bucchignano, P. Joshi, C. Scerbo, E. Kratschmer et al. pp. 2588-2592 Abstract    Full Text: [ HTML Sectioned HTML   PDF (384 kB)  ]    Order
	Cold-developed electron-beam-patterned ZEP 7000 for fabrication of 13 nm nickel zone plates Julia Reinspach, Magnus Lindblom, Olov von Hofsten, Michael Bertilson, Hans M. Hertz, and Anders Holmberg pp. 2593-2596 Abstract    Full Text: [ HTML Sectioned HTML   PDF (485 kB)  ]    Order
	Resist residues and transistor gate fabrication D. S. Macintyre, O. Ignatova, S. Thoms, and I. G. Thayne pp. 2597-2601 Abstract    Full Text: [ HTML Sectioned HTML   PDF (414 kB)  ]    Order
	Robust, efficient grating couplers for planar optical waveguides using no-photoacid generator SU-8 electron beam lithography A. L. Bross, G. Lafyatis, R. Ayachitula, A. Morss, R. Hardman, and J. Golden pp. 2602-2605 Abstract    Full Text: [ HTML Sectioned HTML   PDF (450 kB)  ]    Order
	Hydrogen silsesquioxane double patterning process for 12  nm resolution x-ray zone plates Weilun Chao, Jihoon Kim, Senajith Rekawa, Peter Fischer, and Erik Anderson pp. 2606-2611 Abstract    Full Text: [ HTML Sectioned HTML   PDF (845 kB)  ]    Order
	Simple technique for beam focusing in electron beam lithography on optically transparent substrates Michael L. Schuette and Wu Lu pp. 2612-2615 Abstract    Full Text: [ HTML Sectioned HTML   PDF (513 kB)  ]    Order
	Limiting factors in sub-10  nm scanning-electron-beam lithography Bryan Cord, Joel Yang, Huigao Duan, David C. Joy, Joseph Klingfus, and Karl K. Berggren pp. 2616-2621 Abstract    Full Text: [ HTML Sectioned HTML   PDF (454 kB)  ]    Order
	Understanding of hydrogen silsesquioxane electron resist for sub-5-nm-half-pitch lithography Joel K. W. Yang, Bryan Cord, Huigao Duan, Karl K. Berggren, Joseph Klingfus, Sung-Wook Nam, Ki-Bum Kim, and Michael J. Rooks pp. 2622-2627 Abstract    Full Text: [ HTML Sectioned HTML   PDF (606 kB)  ]    Order
	Understanding the base development mechanism of hydrogen silsesquioxane Jihoon Kim, Weilun Chao, Brian Griedel, Xiaogan Liang, Mark Lewis, Dawn Hilken, and Deirdre Olynick pp. 2628-2634 Abstract    Full Text: [ HTML Sectioned HTML   PDF (513 kB)  ]    Order
	Contrast enhancement behavior of hydrogen silsesquioxane in a salty developer Sung-Wook Nam, Michael J. Rooks, Joel K. W. Yang, Karl K. Berggren, Hyun-Mi Kim, Min-Hyun Lee, Ki-Bum Kim, Jae Hwan Sim, and Do Yeung Yoon pp. 2635-2639 Abstract    Full Text: [ HTML Sectioned HTML   PDF (621 kB)  ]    Order
	Ultradense gold nanostructures fabricated using hydrogen silsesquioxane resist and applications for surface-enhanced Raman spectroscopy Sookyung Choi, Minjun Yan, Ilesanmi Adesida, Keng H. Hsu, and Nicholas X. Fang pp. 2640-2643 Abstract    Full Text: [ HTML Sectioned HTML   PDF (452 kB)  ]    Order
	Apparatus to measure electron reflection Juan R. Maldonado, Yun Sun, Roger Tsai, Fabian Pease, and Piero Pianetta pp. 2644-2647 Abstract    Full Text: [ HTML Sectioned HTML   PDF (446 kB)  ]    Order
Ion Beam Based Nanofabrication [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Development and characterization of an iodine field emission ion source for focused ion beam applications Timothy P. Fedkiw and Paulo C. Lozano pp. 2648-2653 Abstract    Full Text: [ HTML Sectioned HTML   PDF (328 kB)  ]    Order
	Optimization of focused ion beam performance C. W. Hagen and P. Kruit pp. 2654-2659 Abstract    Full Text: [ HTML Sectioned HTML   PDF (391 kB)  ]    Order
	Beam induced deposition of platinum using a helium ion microscope Colin A. Sanford, Lewis Stern, Louise Barriss, Lou Farkas, Mark DiManna, Russ Mello, Diederik J. Maas, and Paul F. A. Alkemade pp. 2660-2667 Abstract    Full Text: [ HTML Sectioned HTML   PDF (937 kB)  ]    Order
	Ion multibeam nanopatterning for photonic applications: Experiments and simulations, including study of precursor gas induced etching and deposition Christoph Ebm, Elmar Platzgummer, Hans Loeschner, Stefan Eder-Kapl, Peter Joechl, Marco Kuemmel, Ruediger Reitinger, Gerhard Hobler, Anton Koeck, Rainer Hainberger, Markus Wellenzohn, Florian Letzkus, and Mathias Irmscher pp. 2668-2673 Abstract    Full Text: [ HTML Sectioned HTML   PDF (1020 kB)  ]    Order
	Near neighbor averaging: A technique for improving image uniformity in aperture array lithography A. Nasrullah, D. Smith, T. Sherlock, P. Ruchhoeft, and D. Litvinov pp. 2674-2678 Abstract    Full Text: [ HTML Sectioned HTML   PDF (496 kB)  ]    Order
	Nanoimprint lithography stamp modification utilizing focused ion beams Heinz D. Wanzenboeck, Simon Waid, Emmerich Bertagnolli, Michael Muehlberger, Iris Bergmair, and Rainer Schoeftner pp. 2679-2685 Abstract    Full Text: [ HTML Sectioned HTML   PDF (469 kB)  ]    Order
	Ion beam sharpening of diamond tools having small apex angle without facet and ripple formations Takashi Nagase, Hiroyuki Kato, S. A. Pahlovy, Iwao Miyamoto, and Yuya Nakamura pp. 2686-2690 Abstract    Full Text: [ HTML Sectioned HTML   PDF (375 kB)  ]    Order
	Fabrication of complementary metal-oxide-semiconductor integrated nanomechanical devices by ion beam patterning G. Rius, J. Llobet, X. Borrisé, N. Mestres, A. Retolaza, S. Merino, and F. Perez-Murano pp. 2691-2697 Abstract    Full Text: [ HTML Sectioned HTML   PDF (1124 kB)  ]    Order
	Evaluations of the hopping growth characteristics on three-dimensional nanostructure fabrication using focused ion beam Reo Kometani, Shin'ichi Warisawa, and Sunao Ishihara pp. 2698-2701 Abstract    Full Text: [ HTML Sectioned HTML   PDF (537 kB)  ]    Order
	Scanning-helium-ion-beam lithography with hydrogen silsesquioxane resist D. Winston, B. M. Cord, B. Ming, D. C. Bell, W. F. DiNatale, L. A. Stern, A. E. Vladar, M. T. Postek, M. K. Mondol, J. K. W. Yang, and K. K. Berggren pp. 2702-2706 Abstract    Full Text: [ HTML Sectioned HTML   PDF (248 kB)  ]    Order
Maskless Lithography [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Charged particle nanopatterning Elmar Platzgummer and Hans Loeschner pp. 2707-2710 Abstract    Full Text: [ HTML Sectioned HTML   PDF (1478 kB)  ]    Order
	Evaluation of chamber contamination in a scanning electron microscope P. Roediger, H. D. Wanzenboeck, G. Hochleitner, and E. Bertagnolli pp. 2711-2717 Abstract    Full Text: [ HTML Sectioned HTML   PDF (639 kB)  ]    Order
	Roles of secondary electrons and sputtered atoms in ion-beam-induced deposition Ping Chen, Huub W. M. Salemink, and Paul F. A. Alkemade pp. 2718-2721 Abstract    Full Text: [ HTML Sectioned HTML   PDF (390 kB)  ]    Order
	Resolution and total blur: Correlation and focus dependencies in e-beam lithography K. Keil, M. Hauptmann, J. Kretz, C. Constancias, L. Pain, and J.-W. Bartha pp. 2722-2726 Abstract    Full Text: [ HTML Sectioned HTML   PDF (466 kB)  ]    Order
	Gas assisted focused electron beam induced etching of alumina T. Bret, B. Afra, R. Becker, Th. Hofmann, K. Edinger, T. Liang, and P. Hoffmann pp. 2727-2731 Abstract    Full Text: [ HTML Sectioned HTML   PDF (312 kB)  ]    Order
	Fabrication of high-aspect ratio silicon nanopillars and nanocones using deep reactive ion etching C. Fischer, J. W. Menezes, S. A. Moshkalev, C. Veríssimo, A. R. Vaz, and J. W. Swart pp. 2732-2736 Abstract    Full Text: [ HTML Sectioned HTML   PDF (671 kB)  ]    Order
	Direct write of optical waveguides on chalcogenide thin films using electron beams G. B. Hoffman, W. Zhou, R. Sooryakumar, and R. M. Reano pp. 2737-2741 Abstract    Full Text: [ HTML Sectioned HTML   PDF (488 kB)  ]    Order
	High density submicron features using a laser pattern generator and double patterning Mikhail E. Gaevski, G. Patrick Watson, and Anthony E. Novembre pp. 2742-2744 Abstract    Full Text: [ HTML Sectioned HTML   PDF (334 kB)  ]    Order
	Laser print patterning of planar spiral inductors and interdigitated capacitors N. Klejwa, R. Misra, J. Provine, R. T. Howe, and S. J. Klejwa pp. 2745-2749 Abstract    Full Text: [ HTML Sectioned HTML   PDF (967 kB)  ]    Order
	Generating integrated-circuit patterns via cutting and stitching of gratings Lin Zhao, Yi Xuan, and Minghao Qi pp. 2750-2754 Abstract    Full Text: [ HTML Sectioned HTML   PDF (442 kB)  ]    Order
	Precision material modification and patterning with He ions David C. Bell, Max C. Lemme, Lewis A. Stern, and Charles M. Marcus pp. 2755-2758 Abstract    Full Text: [ HTML Sectioned HTML   PDF (598 kB)  ]    Order
	Electron postgrowth irradiation of platinum-containing nanostructures grown by electron-beam-induced deposition from Pt(PF3)4 A. Botman, C. W. Hagen, J. Li, B. L. Thiel, K. A. Dunn, J. J. L. Mulders, S. Randolph, and M. Toth pp. 2759-2763 Abstract    Full Text: [ HTML Sectioned HTML   PDF (803 kB)  ]    Order
	Atomic precision lithography on Si J. N. Randall, J. W. Lyding, S. Schmucker, J. R. Von Ehr, J. Ballard, R. Saini, H. Xu, and Y. Ding pp. 2764-2768 Abstract    Full Text: [ HTML Sectioned HTML   PDF (456 kB)  ]    Order
	High rate gas dosing for tip based nanofabrication processes M. P. Kanouff, J. N. Randall, M. Nadesalingham, W. P. Kirk, and R. M. Wallace pp. 2769-2775 Abstract    Full Text: [ HTML Sectioned HTML   PDF (696 kB)  ]    Order
Nanoimprint Lithography [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Evaluation of nanoimprint lithography as a fabrication process of phase-shifted diffraction gratings of distributed feedback laser diodes Masaki Yanagisawa, Yukihiro Tsuji, Hiroyuki Yoshinaga, Naoya Kono, and Kenji Hiratsuka pp. 2776-2780 Abstract    Full Text: [ HTML Sectioned HTML   PDF (650 kB)  ]    Order
	Complete reversal imprinting for fabricating microlens arrays with faithful shape replication Po-Hsun Huang and Sen-Yeu Yang pp. 2781-2785 Abstract    Full Text: [ HTML Sectioned HTML   PDF (503 kB)  ]    Order
	Direct indium tin oxide patterning using thermal nanoimprint lithography for highly efficient optoelectronic devices Ki-Yeon Yang, Kyung-Min Yoon, SangWoo Lim, and Heon Lee pp. 2786-2789 Abstract    Full Text: [ HTML Sectioned HTML   PDF (365 kB)  ]    Order
	Self-aligned fabrication of 10 nm wide asymmetric trenches for Si/SiGe heterojunction tunneling field effect transistors using nanoimprint lithography, shadow evaporation, and etching Chao Wang and Stephen Y. Chou pp. 2790-2794 Abstract    Full Text: [ HTML Sectioned HTML   PDF (657 kB)  ]    Order
	SU-8-based immunoisolative microcontainer with nanoslots defined by nanoimprint lithography Joonbum Kwon, Krutarth Trivedi, Nemani V. Krishnamurthy, Walter Hu, Jeong-Bong Lee, and Barjor Gimi pp. 2795-2800 Abstract    Full Text: [ HTML Sectioned HTML   PDF (570 kB)  ]    Order
	Fabrication of poly(3-hexylthiophene) self-switching diodes using thermal nanoimprint lithography and argon milling J. Kettle, S. Whitelegg, A. M. Song, M. B. Madec, S. Yeates, M. L. Turner, Libor Kotacka, and Vladimir Kolarik pp. 2801-2804 Abstract    Full Text: [ HTML Sectioned HTML   PDF (231 kB)  ]    Order
	UV irradiation effect on sol-gel indium tin oxide nanopatterns replicated by room-temperature nanoimprint Yuji Kang, Makoto Okada, Ken-Ichiro Nakamatsu, Kazuhiro Kanda, Yuichi Haruyama, and Shinji Matsui pp. 2805-2809 Abstract    Full Text: [ HTML Sectioned HTML   PDF (826 kB)  ]    Order
	Formation of TiO2 nanopattern using reverse imprinting and sol-gel method Kyung-min Yoon, Ki-Yeon Yang, Heon Lee, and Hyeong-Seok Kim pp. 2810-2813 Abstract    Full Text: [ HTML Sectioned HTML   PDF (349 kB)  ]    Order
	Thermal roller imprint on surface of Teflon perfluoroalkoxy inlet tube Harutaka Mekaru, Eri Fukushima, Yoshihito Hiyama, and Masaharu Takahashi pp. 2814-2819 Abstract    Full Text: [ HTML Sectioned HTML   PDF (549 kB)  ]    Order
	Thermal imprinting on quartz fiber using glasslike carbon mold Harutaka Mekaru, Chieko Okuyama, Akihisa Ueno, and Masaharu Takahashi pp. 2820-2825 Abstract    Full Text: [ HTML Sectioned HTML   PDF (421 kB)  ]    Order
	Thermal stability of confined flip-chip laminated -functionalized monolayers M. Coll, C. A. Richter, and C. A. Hacker pp. 2826-2831 Abstract    Full Text: [ HTML Sectioned HTML   PDF (351 kB)  ]    Order
	Fabrication of nanodot array molds by using an inorganic electron-beam resist and a postexposure bake Tetsuro Manabe, Jun Taniguchi, and Kiyoshi Ishikawa pp. 2832-2836 Abstract    Full Text: [ HTML Sectioned HTML   PDF (1198 kB)  ]    Order
	Sub-15  nm nanoimprint molds and pattern transfer Debbie Morecroft, Joel K. W. Yang, S. Schuster, Karl K. Berggren, Qiangfei Xia, Wei Wu, and R. Stanley Williams pp. 2837-2840 Abstract    Full Text: [ HTML Sectioned HTML   PDF (512 kB)  ]    Order
	Fabrication of a seamless roll mold by direct writing with an electron beam on a rotating cylindrical substrate Jun Taniguchi and Masao Aratani pp. 2841-2845 Abstract    Full Text: [ HTML Sectioned HTML   PDF (862 kB)  ]    Order
	Transparent hybrid polymer stamp copies with sub-50-nm resolution for thermal and UV-nanoimprint lithography Helmut Schift, Christian Spreu, Menouer Saidani, Martin Bednarzik, Jens Gobrecht, Anna Klukowska, Freimut Reuther, Gabi Gruetzner, and Harun H. Solak pp. 2846-2849 Abstract    Full Text: [ HTML Sectioned HTML   PDF (243 kB)  ]    Order
	Easy mask-mold fabrication for combined nanoimprint and photolithography Helmut Schift, Christian Spreu, Arne Schleunitz, Jens Gobrecht, Anna Klukowska, Freimut Reuther, and Gabi Gruetzner pp. 2850-2853 Abstract    Full Text: [ HTML Sectioned HTML   PDF (316 kB)  ]    Order
	Nanogratings containing sub-10-nm wide trenches by dimension reduction from sloped polymer profile Krutarth Trivedi and Walter Hu pp. 2854-2857 Abstract    Full Text: [ HTML Sectioned HTML   PDF (330 kB)  ]    Order
	Hierarchical structure formation induced by dewetting in an imprinting process I. T. Pai, D. W. Chiou, M. H. Hon, and I. C. Leu pp. 2858-2861 Abstract    Full Text: [ HTML Sectioned HTML   PDF (328 kB)  ]    Order
	Release force reduction in UV nanoimprint by mold orientation control and by gas environment Hiroshi Hiroshima pp. 2862-2865 Abstract    Full Text: [ HTML Sectioned HTML   PDF (432 kB)  ]    Order
	Numerical study on bubble trapping in UV nanoimprint lithography Daisuke Morihara, Yoshinori Nagaoka, Hiroshi Hiroshima, and Yoshihiko Hirai pp. 2866-2868 Abstract    Full Text: [ HTML Sectioned HTML   PDF (277 kB)  ]    Order
	Ultrathin fluorinated diamondlike carbon coating for nanoimprint lithography imprinters Ryan W. Fillman and Robert R. Krchnavek pp. 2869-2872 Abstract    Full Text: [ HTML Sectioned HTML   PDF (436 kB)  ]    Order
	Double-anchoring fluorinated molecules for antiadhesion mold treatment in UV nanoimprint lithography M. Zelsmann, D. Truffier-Boutry, A. Francone, C. Alleaume, I. Kurt, A. Beaurain, B. Pelissier, B. Pépin-Donat, C. Lombard, and J. Boussey pp. 2873-2876 Abstract    Full Text: [ HTML Sectioned HTML   PDF (315 kB)  ]    Order
	Nanoimprint planarization of high aspect ratio nanostructures using inorganic and organic resist materials Allan S. P. Chang, Christophe Peroz, Xiaogan Liang, Scott Dhuey, Bruce Harteneck, and Stefano Cabrini pp. 2877-2881 Abstract    Full Text: [ HTML Sectioned HTML   PDF (828 kB)  ]    Order
	Recovery prevention via pressure control in thermal nanoimprint lithography Hella-Christin Scheer, Nicolas Bogdanski, Saskia Möllenbeck, and Andre Mayer pp. 2882-2887 Abstract    Full Text: [ HTML Sectioned HTML   PDF (427 kB)  ]    Order
Extreme Ultraviolet Lithography [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Comparison of fast three-dimensional simulation and actinic inspection for extreme ultraviolet masks with buried defects and absorber features Chris H. Clifford, Sandy Wiraatmadja, Tina T. Chan, Andrew R. Neureuther, Kenneth A. Goldberg, Iacopo Mochi, and Ted Liang pp. 2888-2893 Abstract    Full Text: [ HTML Sectioned HTML   PDF (580 kB)  ]    Order
	Low energy Ar+ ion beam machining of Si thin layer deposited on a Zerodur® substrate for extreme ultraviolet lithography projection optics T. Iwata, K. Fujiwara, S. A. Pahlovy, and I. Miyamoto pp. 2894-2899 Abstract    Full Text: [ HTML Sectioned HTML   PDF (932 kB)  ]    Order
	Two stage ion beam figuring and smoothening method for shape error correction of ULE® substrates of extreme ultraviolet lithography projection optics: Evaluation of high-spatial frequency roughness Kazuma Kamijo, Ryou Uozumi, Kenta Moriziri, S. A. Pahlovy, and Iwao Miyamoto pp. 2900-2904 Abstract    Full Text: [ HTML Sectioned HTML   PDF (516 kB)  ]    Order
	Experimental determination of image placement accuracy in extreme ultraviolet lithography Sudhar Raghunathan, Obert Wood, Pradeep Vukkadala, Roxann Engelstad, and John G. Hartley pp. 2905-2910 Abstract    Full Text: [ HTML Sectioned HTML   PDF (669 kB)  ]    Order
	Pushing extreme ultraviolet lithography development beyond 22 nm half pitch Patrick P. Naulleau, Christopher N. Anderson, Lorie-Mae Baclea-an, Paul Denham, Simi George, Kenneth A. Goldberg, Michael Goldstein, Brian Hoef, Gideon Jones, Chawon Koh, Bruno La Fontaine, Warren Montgomery, and Tom Wallow pp. 2911-2915 Abstract    Full Text: [ HTML Sectioned HTML   PDF (773 kB)  ]    Order
	EUV pattern defect detection sensitivity based on aerial image linewidth measurements K. A. Goldberg, I. Mochi, P. Naulleau, T. Liang, P.-Y. Yan, and S. Huh pp. 2916-2921 Abstract    Full Text: [ HTML Sectioned HTML   PDF (456 kB)  ]    Order
	Improvement of imaging properties by optimizing the capping structure in extreme ultraviolet lithography Chang Young Jeong, Sangsul Lee, Hyun-Duck Shin, Tae Geun Kim, and Jinho Ahn pp. 2922-2926 Abstract    Full Text: [ HTML Sectioned HTML   PDF (1099 kB)  ]    Order
	Iterative procedure for in situ extreme ultraviolet optical testing with an incoherent source Ryan Miyakawa, Patrick Naulleau, and Avideh Zakhor pp. 2927-2930 Abstract    Full Text: [ HTML Sectioned HTML   PDF (255 kB)  ]    Order
	Talbot lithography: Self-imaging of complex structures A. Isoyan, F. Jiang, Y. C. Cheng, F. Cerrina, P. Wachulak, L. Urbanski, J. Rocca, C. Menoni, and M. Marconi pp. 2931-2937 Abstract    Full Text: [ HTML Sectioned HTML   PDF (905 kB)  ]    Order
Optical Lithography [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Characterization of pattern-placement error for sub-40-nm memory devices Jangho Shin, Dongho Cha, Jeongho Yeo, Hochul Kim, Seong-Woon Choi, and Chan-Hoon Park pp. 2938-2940 Abstract    Full Text: [ HTML Sectioned HTML   PDF (357 kB)  ]    Order
	Influence of polarization on absorbance modulated subwavelength grating structures J. E. Foulkes and R. J. Blaikie pp. 2941-2946 Abstract    Full Text: [ HTML Sectioned HTML   PDF (571 kB)  ]    Order
	Coherent diffraction lithography: Periodic patterns via mask-based interference lithography Corey P. Fucetola, Amil A. Patel, Euclid E. Moon, Thomas B. O'Reilly, and Henry I. Smith pp. 2947-2950 Abstract    Full Text: [ HTML Sectioned HTML   PDF (320 kB)  ]    Order
	Stitching periodic submicron fringes by utilizing step-and-align interference lithography Yung-Pin Chen, Cheng-Hung Chen, Jer-Haur Chang, Hsin-Chieh Chiu, Guan-Yu Chen, Chieh-Hsiu Chiang, Lien-Sheng Chen, Ching-Tung Tseng, Chih-Hsien Lee, Jia-Yush Yen, and Lon A. Wang pp. 2951-2957 Abstract    Full Text: [ HTML Sectioned HTML   PDF (904 kB)  ]    Order
	Low-cost interference lithography Corey P. Fucetola, Hasan Korre, and Karl K. Berggren pp. 2958-2961 Abstract    Full Text: [ HTML Sectioned HTML   PDF (190 kB)  ]    Order
Modelling Lithographic Exposure [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Design specific variation in via/contact pattern transfer: Full chip analysis Jun-Ho Choy, Valeriy Sukharev, Ara Markosian, Armen Kteyan, Yuri Granik, and Vladimir Bliznetsov pp. 2962-2971 Abstract    Full Text: [ HTML Sectioned HTML   PDF (736 kB)  ]    Order
	Model based optical proximity correction runtime saving with multisegment solver Jianliang Li, Xiaohai Li, Steven Deeth, Robert Lugg, and Lawrence S. Melvin, III pp. 2972-2978 Abstract    Full Text: [ HTML Sectioned HTML   PDF (766 kB)  ]    Order
	Low-roughness active microdisk resonators fabricated by focused ion beam L. A. M. Barea, F. Vallini, A. R. Vaz, J. R. Mialichi, and N. C. Frateschi pp. 2979-2981 Abstract    Full Text: [ HTML Sectioned HTML   PDF (353 kB)  ]    Order
	Electron beam induced deposition of cobalt for use as single- and multiwalled carbon nanotube growth catalyst M. H. Ervin and B. M. Nichols pp. 2982-2985 Abstract    Full Text: [ HTML Sectioned HTML   PDF (332 kB)  ]    Order
NANOFABRICATION MATERIALS Resists [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Alternative developer solutions for extreme ultraviolet resist Toshiro Itani and Julius Joseph Santillan pp. 2986-2989 Abstract    Full Text: [ HTML Sectioned HTML   PDF (633 kB)  ]    Order
	Thermal development of a calixarene resist V. Auzelyte, A. Langner, and H. H. Solak pp. 2990-2992 Abstract    Full Text: [ HTML Sectioned HTML   PDF (451 kB)  ]    Order
	Control of the critical dimensions and line edge roughness with pre-organized block copolymer pixelated photoresists Huiman Kang, Yun Jun Kim, Padma Gopalan, and Paul F. Nealey pp. 2993-2997 Abstract    Full Text: [ HTML Sectioned HTML   PDF (406 kB)  ]    Order
	Negative tone molecular resists using cationic polymerization: Comparison of epoxide and oxetane functional groups Richard A. Lawson, David E. Noga, Todd R. Younkin, Laren M. Tolbert, and Clifford L. Henderson pp. 2998-3003 Abstract    Full Text: [ HTML Sectioned HTML   PDF (392 kB)  ]    Order
	Bond contribution model for the prediction of glass transition temperature in polyphenol molecular glass resists Richard A. Lawson, Wei-Ming Yeh, and Clifford L. Henderson pp. 3004-3009 Abstract    Full Text: [ HTML Sectioned HTML   PDF (148 kB)  ]    Order
	Investigation of surface roughness of poly(methylmethacrylate) developed at reduced temperatures M. Yan, S. Choi, J. Lee, K. R. V. Subramanian, and I. Adesida pp. 3010-3013 Abstract    Full Text: [ HTML Sectioned HTML   PDF (701 kB)  ]    Order
	Defectivity issues in topcoatless photoresists Jason Cantone, Youri van Dommelen, Aiqin Jiang, Shannon Dunn, Tom Winter, Karen Petrillo, Rick Johnson, Peggy Lawson, Will Conley, and Ryan Callahan pp. 3014-3019 Abstract    Full Text: [ HTML Sectioned HTML   PDF (781 kB)  ]    Order
	Submillisecond post-exposure bake of chemically amplified resists by CO2 laser spike annealing Jing Sha, Byungki Jung, Michael O. Thompson, Christopher K. Ober, Manish Chandhok, and Todd R. Younkin pp. 3020-3024 Abstract    Full Text: [ HTML Sectioned HTML   PDF (534 kB)  ]    Order
Directed Assembly on Patterned Substrate [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Curing process of silsesquioxane in self-organized diblock copolymer template Naoko Kihara, Kazutaka Takizawa, Ryosuke Yamamoto, Hiroki Tanaka, and Hiroyuki Hieda pp. 3025-3030 Abstract    Full Text: [ HTML Sectioned HTML   PDF (870 kB)  ]    Order
	Lithographically directed surface modification Richard P. Kingsborough, Russell B. Goodman, and Theodore H. Fedynyshyn pp. 3031-3037 Abstract    Full Text: [ HTML Sectioned HTML   PDF (739 kB)  ]    Order
	Modification of a polystyrene brush layer by insertion of poly(methyl methacrylate) molecules Guoliang Liu, Shengxiang Ji, Karl O. Stuen, Gordon S. W. Craig, Paul F. Nealey, and F. J. Himpsel pp. 3038-3042 Abstract    Full Text: [ HTML Sectioned HTML   PDF (377 kB)  ]    Order
	Focused ion beam-assisted bending of silicon nanowires for complex three dimensional structures Kimin Jun, Jaebum Joo, and Joseph M. Jacobson pp. 3043-3047 Abstract    Full Text: [ HTML Sectioned HTML   PDF (307 kB)  ]    Order
	Positioning Pd catalyst particles for carbon nanotube growth using charge patterns created with a scanning electron microscope A. C. Zonnevylle, C. W. Hagen, P. Kruit, M. Valenti, and A. Schmidt-Ott pp. 3048-3050 Abstract    Full Text: [ HTML Sectioned HTML   PDF (648 kB)  ]    Order
	Conductive atomic force microscopy study of self-assembled silicon nanostructures M. R. Bari, R. J. Blaikie, F. Fang, and A. Markwitz pp. 3051-3054 Abstract    Full Text: [ HTML Sectioned HTML   PDF (298 kB)  ]    Order
	Embedded vertical nanosheets of SiO2 in PDMS using an alternative nanopatterning process L. Jalabert, C. Bottier, M. Kumemura, and H. Fujita pp. 3055-3058 Abstract    Full Text: [ HTML Sectioned HTML   PDF (644 kB)  ]    Order
Graphene [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Direct e-beam writing of 1  nm thin carbon nanoribbons C. T. Nottbohm, A. Turchanin, A. Beyer, and A. Gölzhäuser pp. 3059-3062 Abstract    Full Text: [ HTML Sectioned HTML   PDF (382 kB)  ]    Order
	Graphitization at interface between amorphous carbon and liquid gallium for fabricating large area graphene sheets Jun-ichi Fujita, Ryuuichi Ueki, Yousuke Miyazawa, and Toshinari Ichihashi pp. 3063-3066 Abstract    Full Text: [ HTML Sectioned HTML   PDF (478 kB)  ]    Order
Energy Storage [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Process and properties of the carbon nanotube assisted LiCoO2 thin-film battery electrode by pulsed laser deposition An-Ya Lo, Chuan-Shu Sun, Wen-Shou Tseng, and Cheng-Tzu Kuo pp. 3067-3072 Abstract    Full Text: [ HTML Sectioned HTML   PDF (886 kB)  ]    Order
	Solid-state dye-sensitized solar cell based on semiconducting nanomaterials Tao-Hua Lee, Dazhi Sun, Xi Zhang, Hung-Jue Sue, and Xing Cheng pp. 3073-3077 Abstract    Full Text: [ HTML Sectioned HTML   PDF (451 kB)  ]    Order
APPLICATIONS Nanobiology [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Preparation of diamond-shaped channels in SU-8 for optical control of the filling state S. Möllenbeck, N. Bogdanski, A. Mayer, H.-C. Scheer, J. Zajadacz, and K. Zimmer pp. 3078-3081 Abstract    Full Text: [ HTML Sectioned HTML   PDF (404 kB)  ]    Order
	In situ synthesis and direct immobilization of ssDNA on electron beam patterned hydrogen silsesquioxane Omar D. Negrete, M. Sendar Onses, Paul F. Nealy, and Franco Cerrina pp. 3082-3087 Abstract    Full Text: [ HTML Sectioned HTML   PDF (465 kB)  ]    Order
	Gold-tipped elastomeric pillars for cellular mechanotransduction S. Ghassemi, O. Rossier, M. P. Sheetz, S. J. Wind, and J. Hone pp. 3088-3091 Abstract    Full Text: [ HTML Sectioned HTML   PDF (316 kB)  ]    Order
	Gallium phosphide nanowire arrays and their possible application in cellular force investigations Dmitry B. Suyatin, Waldemar Hällström, Lars Samuelson, Lars Montelius, Christelle N. Prinz, and Martin Kanje pp. 3092-3094 Abstract    Full Text: [ HTML Sectioned HTML   PDF (485 kB)  ]    Order
	Fabrication of nanoscale “curtain rods” for DNA curtains using nanoimprint lithography T. A. Fazio, M. Visnapuu, E. C. Greene, and S. J. Wind pp. 3095-3098 Abstract    Full Text: [ HTML Sectioned HTML   PDF (241 kB)  ]    Order
	Electrical detection of proteins and DNA using bioactivated microfluidic channels: Theoretical and experimental considerations M. Javanmard, H. Esfandyarpour, F. Pease, and R. W. Davis pp. 3099-3103 Abstract    Full Text: [ HTML Sectioned HTML   PDF (369 kB)  ]    Order
	Fabrication methods for creating flexible polymer substrate sensor tags Harvey Ho and Jack L. Skinner pp. 3104-3108 Abstract    Full Text: [ HTML Sectioned HTML   PDF (467 kB)  ]    Order
Nano-Mems [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Electrothermal actuation of silicon carbide ring resonators Enrico Mastropaolo, Rebecca Cheung, Anne Henry, and Erik Janzén pp. 3109-3114 Abstract    Full Text: [ HTML Sectioned HTML   PDF (648 kB)  ]    Order
	Lateral-flow particle filtration and separation with multilayer microfluidic channels Hyun Chul Kim, Jaewon Park, Younghak Cho, Hyunsoo Park, Arum Han, and Xing Cheng pp. 3115-3119 Abstract    Full Text: [ HTML Sectioned HTML   PDF (715 kB)  ]    Order
	Real-time detection of airborne dust particles using paddle-type silicon cantilevers Bonghyun Park, Jiseok Hong, and Seung-Beck Lee pp. 3120-3124 Abstract    Full Text: [ HTML Sectioned HTML   PDF (328 kB)  ]    Order
	Nanofabrication of sharp diamond tips by e-beam lithography and inductively coupled plasma reactive ion etching Nicolaie Moldovan, Ralu Divan, Hongjun Zeng, and John A. Carlisle pp. 3125-3131 Abstract    Full Text: [ HTML Sectioned HTML   PDF (762 kB)  ]    Order
	Parallel proximal probe arrays with vertical interconnections Y. Sarov, A. Frank, Tzv. Ivanov, J.-P. Zöllner, K. Ivanova, B. Volland, I. W. Rangelow, A. Brogan, R. Wilson, P. Zawierucha, M. Zielony, T. Gotszalk, N. Nikolov, M. Zier, B. Schmidt et al. pp. 3132-3138 Abstract    Full Text: [ HTML Sectioned HTML   PDF (888 kB)  ]    Order
	Electrical and mechanical properties of carbon nanotube-polyimide composites D. Thuau, V. Koutsos, and R. Cheung pp. 3139-3144 Abstract    Full Text: [ HTML Sectioned HTML   PDF (458 kB)  ]    Order
Nanoelectronics [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Void-free filling of spin-on dielectric in 22  nm wide ultrahigh aspect ratio Si trenches Krutarth Trivedi, Carlo Floresca, Sangjeoung Kim, Hyunjin Kim, Deogbae Kim, Jaehyun Kim, Moon J. Kim, and Walter Hu pp. 3145-3148 Abstract    Full Text: [ HTML Sectioned HTML   PDF (429 kB)  ]    Order
	Nanostructuring of epitaxial graphene layers on SiC by means of field-induced atomic force microscopy modification G. Rius, N. Camara, P. Godignon, F. Pérez-Murano, and N. Mestres pp. 3149-3152 Abstract    Full Text: [ HTML Sectioned HTML   PDF (506 kB)  ]    Order
	Fully self-aligned process for fabricating 100  nm gate length enhancement mode GaAs metal-oxide-semiconductor field-effect transistors Xu Li, Richard J. W. Hill, Paolo Longo, Martin C. Holland, Haiping Zhou, Stephen Thoms, Douglas S. Macintyre, and Iain G. Thayne pp. 3153-3157 Abstract    Full Text: [ HTML Sectioned HTML   PDF (497 kB)  ]    Order
	Effects of visible light illumination on the conductance of Al/AlOx single-electron transistors Hubert C. George, Alexei O. Orlov, Robin A. Joyce, Yong Tang, and Gregory L. Snider pp. 3158-3163 Abstract    Full Text: [ HTML Sectioned HTML   PDF (478 kB)  ]    Order
	Fabrication of nanoscale ZnO field effect transistors using the functional precursor zinc neodecanoate directly as a negative electron beam lithography resist G. A. C. Jones, G. Xiong, and D. Anderson pp. 3164-3168 Abstract    Full Text: [ HTML Sectioned HTML   PDF (493 kB)  ]    Order
Nanophotonics [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Perturbed frequency-selective surfaces fabricated on large thin polymer membranes for multiband infrared applications Juan-José Sanz-Fernández, George Goussetis, and Rebecca Cheung pp. 3169-3174 Abstract    Full Text: [ HTML Sectioned HTML   PDF (708 kB)  ]    Order
	Subwavelength grating structures with magnetic resonances at visible frequencies fabricated by nanoimprint lithography for large area applications Alex F. Kaplan, Yi-Hao Chen, Myung-Gyu Kang, L. Jay Guo, Ting Xu, and Xiangang Luo pp. 3175-3179 Abstract    Full Text: [ HTML Sectioned HTML   PDF (444 kB)  ]    Order
	Advanced silicon processing for active planar photonic devices Michael Shearn, Kenneth Diest, Xiankai Sun, Avi Zadok, Harry Atwater, Amnon Yariv, and Axel Scherer pp. 3180-3182 Abstract    Full Text: [ HTML Sectioned HTML   PDF (260 kB)  ]    Order
	Diameter-dependent guided resonance of dielectric hole-array membrane Neil Ou, J. H. Shyu, H. M. Lee, and J. C. Wu pp. 3183-3186 Abstract    Full Text: [ HTML Sectioned HTML   PDF (412 kB)  ]    Order
	Fabrication of novel digital optical spectrometer on chip S. Babin, C. Peroz, A. Bugrov, A. Goltsov, I. Ivonin, V. Yankov, S. Dhuey, S. Cabrini, E.-B. Kley, and H. Schmidt pp. 3187-3191 Abstract    Full Text: [ HTML Sectioned HTML   PDF (974 kB)  ]    Order
NANOMETROLOGY Nanometrology [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Iterative phase recovery using wavelet domain constraints Leili Baghaei, Ali Rad, Bing Dai, Piero Pianetta, Jianwei Miao, and R. Fabian W. Pease pp. 3192-3195 Abstract    Full Text: [ HTML Sectioned HTML   PDF (417 kB)  ]    Order
	On the influence of the sputtering in determining the resolution of a scanning ion microscope V. Castaldo, C. W. Hagen, P. Kruit, E. van Veldhoven, and D. Maas pp. 3196-3202 Abstract    Full Text: [ HTML Sectioned HTML   PDF (869 kB)  ]    Order
	Mask observation results using a coherent extreme ultraviolet scattering microscope at NewSUBARU Tetsuo Harada, Junki Kishimoto, Takeo Watanabe, Hiroo Kinoshita, and Dong Gun Lee pp. 3203-3207 Abstract    Full Text: [ HTML Sectioned HTML   PDF (463 kB)  ]    Order
	Inspection method for contact/via-holes using a low-energy electron microcolumn Y. C. Kim, D. W. Kim, S. Ahn, T. S. Oh, J. B. Kim, Y. S. Roh, D. G. Hasko, and H. S. Kim pp. 3208-3212 Abstract    Full Text: [ HTML Sectioned HTML   PDF (642 kB)  ]    Order
	Development of pseudorandom binary arrays for calibration of surface profile metrology tools Samuel K. Barber, Paul Soldate, Erik H. Anderson, Rossana Cambie, Wayne R. McKinney, Peter Z. Takacs, Dmytro L. Voronov, and Valeriy V. Yashchuk pp. 3213-3219 Abstract    Full Text: [ HTML Sectioned HTML   PDF (1290 kB)  ]    Order
	Automatic measurement of electron beam size by beam metrology technique using 20  nm test pattern C. Peroz, S. Babin, M. Machin, E. Anderson, S. Cabrini, S. Dhuey, and B. Harteneck pp. 3220-3225 Abstract    Full Text: [ HTML Sectioned HTML   PDF (768 kB)  ]    Order
	Toroidal spectrometer for signal detection in scanning ion/electron microscopes H. Q. Hoang and A. Khursheed pp. 3226-3231 Abstract    Full Text: [ HTML Sectioned HTML   PDF (777 kB)  ]    Order
	Real time scatterometry for profile control during resist trimming process M. El Kodadi, S. Soulan, M. Besacier, and P. Schiavone pp. 3232-3237 Abstract    Full Text: [ HTML Sectioned HTML   PDF (629 kB)  ]    Order
	Grazing incident small angle x-ray scattering: A metrology to probe nanopatterned surfaces T. Hofmann, E. Dobisz, and B. M. Ocko pp. 3238-3243 Abstract    Full Text: [ HTML Sectioned HTML   PDF (366 kB)  ]    Order
	Subsurface damage from helium ions as a function of dose, beam energy, and dose rate Richard Livengood, Shida Tan, Yuval Greenzweig, John Notte, and Shawn McVey pp. 3244-3249 Abstract    Full Text: [ HTML Sectioned HTML   PDF (992 kB)  ]    Order
	Understanding imaging modes in the helium ion microscope Larry Scipioni, Colin A. Sanford, John Notte, Bill Thompson, and Shawn McVey pp. 3250-3255 Abstract    Full Text: [ HTML Sectioned HTML   PDF (715 kB)  ]    Order
	Design of a multiple-electron-beam imaging technique for surface inspection T. Luo, A. Khursheed, M. Osterberg, and H. Hoang pp. 3256-3260 Abstract    Full Text: [ HTML Sectioned HTML   PDF (663 kB)  ]    Order

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