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Table of Contents Alert for Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures

Journal of Vacuum Society and Technology B

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Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures -- September 2008

Volume 26, Issue 5 , pp. L41-1823

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  • Letters
  • Articles
  • Brief Reports and Comments
  • Shop Notes
  • Letters

  • Study of substrate-directed ordering of long double-stranded DNA molecules on bare highly oriented pyrolytic graphite surface based on atomic force microscopy relocation imaging
    Huabin Wang, Hongjie An, Feng Zhang, Zhixiang Zhang, Ming Ye, Peng Xiu, Yi Zhang, and Jun Hu
    pp. L41-L44
    Abstract    Full Text: [ HTML Sectioned HTML   PDF (299 kB)  GZipped PS   ]    Order
  • Articles

  • Study of 193  nm photoresist degradation during short time fluorocarbon plasma exposure. I. Studies of modified layer formation
    M. Sumiya, R. Bruce, S. Engelmann, F. Weilnboeck, and G. S. Oehrlein
    pp. 1637-1646
    Abstract    Full Text: [ HTML Sectioned HTML   PDF (311 kB)  GZipped PS   ]    Order
  • Study of 193  nm photoresist degradation during short time fluorocarbon plasma exposures. II. Plasma parameter trends for photoresist degradation
    M. Sumiya, R. Bruce, S. Engelmann, F. Weilnboeck, and G. S. Oehrlein
    pp. 1647-1653
    Abstract    Full Text: [ HTML Sectioned HTML   PDF (266 kB)  GZipped PS   ]    Order
  • Comparative study of thermally cured and electron-beam-exposed hydrogen silsesquioxane resists
    Sookyung Choi, Michael J. Word, Vipan Kumar, and Ilesanmi Adesida
    pp. 1654-1659
    Abstract    Full Text: [ HTML Sectioned HTML   PDF (140 kB)  GZipped PS   ]    Order
  • Nanofabrication by mechanical and electrical processes using electrically conductive diamond tip
    Shojiro Miyake, Haifeng Zheng, Jongduk Kim, and Mei Wang
    pp. 1660-1665
    Abstract    Full Text: [ HTML Sectioned HTML   PDF (673 kB)  GZipped PS   ]    Order
  • Sub-50-nm track pitch mold using electron beam lithography for discrete track recording media
    R. Sbiaa, E. L. Tan, R. M. Seoh, K. O. Aung, S. K. Wong, and S. N. Piramanayagam
    pp. 1666-1669
    Abstract    Full Text: [ HTML Sectioned HTML   PDF (654 kB)  GZipped PS   ]    Order
  • Oxidation behavior of In95Sn5 solid solution
    S. Ramasamy, V. Sabarinathan, Nipun Agarwal, and David J. Smith
    pp. 1670-1674
    Abstract    Full Text: [ HTML Sectioned HTML   PDF (591 kB)  GZipped PS   ]    Order
  • Comparative study of Cl2, Cl2/O2, and Cl2/N2 inductively coupled plasma processes for etching of high-aspect-ratio photonic-crystal holes in InP
    C. F. Carlström, R. van der Heijden, M. S. P. Andriesse, F. Karouta, R. W. van der Heijden, E. van der Drift, and H. W. M. Salemink
    pp. 1675-1683
    Abstract    Full Text: [ HTML Sectioned HTML   PDF (912 kB)  GZipped PS   ]    Order
  • Plasma etch removal of poly(methyl methacrylate) in block copolymer lithography
    Yuk-Hong Ting, Sang-Min Park, Chi-Chun Liu, Xiaosong Liu, F. J. Himpsel, Paul F. Nealey, and Amy E. Wendt
    pp. 1684-1689
    Abstract    Full Text: [ HTML Sectioned HTML   PDF (436 kB)  GZipped PS   ]    Order
  • Fabrication of concave gratings by curved surface UV-nanoimprint lithography
    Yung-Pin Chen, Yuet-Ping Lee, Jer-Haur Chang, and Lon A. Wang
    pp. 1690-1695
    Abstract    Full Text: [ HTML Sectioned HTML   PDF (917 kB)  GZipped PS   ]    Order
  • Growth of nitrogen doped ZnO films through a nitrogen diffusion process from WN films formed by a cosputtering technique
    Jonghyun Lee, Jaehwan Ha, Jinpyo Hong, Seungnam Cha, and Ungyu Paik
    pp. 1696-1699
    Abstract    Full Text: [ HTML Sectioned HTML   PDF (174 kB)  GZipped PS   ]    Order
  • Field-emission fluorescent lamp using carbon nanotubes on a wire-type cold cathode and a reflecting anode
    J. X. Huang, Jun Chen, S. Z. Deng, J. C. She, and N. S. Xu
    pp. 1700-1704
    Abstract    Full Text: [ HTML Sectioned HTML   PDF (748 kB)  GZipped PS   ]    Order
  • Fabrication and properties of Cu–Ni mixed-metal periodical array for midinfrared filtering and hydrophobic application
    Wen-Hsien Huang, Yu-Lin Yang, and Shich-Chuan Wu
    pp. 1705-1711
    Abstract    Full Text: [ HTML Sectioned HTML   PDF (909 kB)  GZipped PS   ]    Order
  • Correlation of the growth rate for selective epitaxial growth of silicon and oxide thickness and oxide coverage in a reduced pressure chemical vapor deposition pancake reactor
    Kung-Yen Lee
    pp. 1712-1717
    Abstract    Full Text: [ HTML Sectioned HTML   PDF (352 kB)  GZipped PS   ]    Order
  • Optical properties and critical-point energies of BaTiO3 (001) from 1.5  to  5.2  eV
    S. G. Choi, A. M. Dattelbaum, S. T. Picraux, S. K. Srivastava, and C. J. Palmstrøm
    pp. 1718-1722
    Abstract    Full Text: [ HTML Sectioned HTML   PDF (104 kB)  GZipped PS   ]    Order
  • Comparative study of ZrN and Zr–Ge–N thin films as diffusion barriers for Cu metallization on Si
    L. C. Leu, P. Sadik, D. P. Norton, L. McElwee-White, and T. J. Anderson
    pp. 1723-1727
    Abstract    Full Text: [ HTML Sectioned HTML   PDF (422 kB)  GZipped PS   ]    Order
  • Nanochannels fabricated in polydimethylsiloxane using sacrificial electrospun polyethylene oxide nanofibers
    Leon M. Bellan, Elizabeth A. Strychalski, and Harold G. Craighead
    pp. 1728-1731
    Abstract    Full Text: [ HTML Sectioned HTML   PDF (377 kB)  GZipped PS   ]    Order
  • Programmable proximity aperture lithography with MeV ion beams
    Nitipon Puttaraksa, Sergey Gorelick, Timo Sajavaara, Mikko Laitinen, Somsorn Singkarat, and Harry J. Whitlow
    pp. 1732-1739
    Abstract    Full Text: [ HTML Sectioned HTML   PDF (658 kB)  GZipped PS   ]    Order
  • Comparison of selective Ge growth in SiO2 trenches on Si(001) and on blanket Si(001) substrates: Surface roughness and doping
    J.-S. Park, M. Curtin, J. M. Hydrick, M. Carroll, J. G. Fiorenza, A. Lochtefeld, and S. Novak
    pp. 1740-1744
    Abstract    Full Text: [ HTML Sectioned HTML   PDF (767 kB)  GZipped PS   ]    Order
  • Large areas of periodic nanoholes perforated in multistacked films produced by lift-off
    Wei Wu, Dibyendu Dey, Alex Katsnelson, Omer G. Memis, and Hooman Mohseni
    pp. 1745-1747
    Abstract    Full Text: [ HTML Sectioned HTML   PDF (415 kB)  GZipped PS   ]    Order
  • Self-aligned metal-contact and passivation technique for submicron ridge waveguide laser fabrication
    J. H. Teng, E. L. Lim, S. J. Chua, S. S. Ang, L. F. Chong, J. R. Dong, and R. Yin
    pp. 1748-1752
    Abstract    Full Text: [ HTML Sectioned HTML   PDF (242 kB)  GZipped PS   ]    Order
  • Iterative imprint for multilayered nanostructures by feeding, vacuum forming, and bonding of sheets
    Hideaki Suzuki, Keisuke Nagato, Shuntaro Sugimoto, Kensuke Tsuchiya, Tetsuya Hamaguchi, and Masayuki Nakao
    pp. 1753-1756
    Abstract    Full Text: [ HTML Sectioned HTML   PDF (445 kB)  GZipped PS   ]    Order
  • Electron field emission from ZnOx nanoparticles decorated on vertically aligned carbon nanotubes prepared by vapor-phase transport
    A. Wisitsoraat, A. Tuantranont, V. Patthanasettakul, and S. Mongpraneet
    pp. 1757-1760
    Abstract    Full Text: [ HTML Sectioned HTML   PDF (751 kB)  GZipped PS   ]    Order
  • Fabrication of gold tips suitable for tip-enhanced Raman spectroscopy
    Craig Williams and Debdulal Roy
    pp. 1761-1764
    Abstract    Full Text: [ HTML Sectioned HTML   PDF (382 kB)  GZipped PS   ]    Order
  • Effect of ZnO catalyst on carbon nanotube growth by thermal chemical vapor deposition
    Shih-Fong Lee, Yung-Ping Chang, and Li-Ying Lee
    pp. 1765-1770
    Abstract    Full Text: [ HTML Sectioned HTML   PDF (1008 kB)  GZipped PS   ]    Order
  • Single-pass forming for three-dimensional microstructures by high-speed shearing of multilayer thin films
    Tetsuya Hamaguchi, Hiroki Yonemoto, Keisuke Nagato, Kensuke Tsuchiya, and Masayuki Nakao
    pp. 1771-1774
    Abstract    Full Text: [ HTML Sectioned HTML   PDF (428 kB)  GZipped PS   ]    Order
  • ArF resist-friendly etching technology
    Toshio Hayashi, Yasuhiro Morikawa, Koukou Suu, and Michio Ishikawa
    pp. 1775-1781
    Abstract    Full Text: [ HTML Sectioned HTML   PDF (986 kB)  GZipped PS   ]    Order
  • Specific spectral features in electron emission from nanocrystalline silicon quasi-ballistic cold cathode detected by an angle-resolved high resolution analyzer
    Daisuke Sakai, Chunhei Oshima, Toshiyuki Ohta, and Nobuyoshi Koshida
    pp. 1782-1786
    Abstract    Full Text: [ HTML Sectioned HTML   PDF (911 kB)  GZipped PS   ]    Order
  • Deposition of NiOx thin films with radio frequency magnetron sputtering and their characteristics as a source/drain electrode for the pentacene thin film transistor
    Dong-Jin Yun and Shi-Woo Rhee
    pp. 1787-1793
    Abstract    Full Text: [ HTML Sectioned HTML   PDF (868 kB)  GZipped PS   ]    Order
  • Overcoming material challenges for replication of “motheye lenses” using step and flash imprint lithography for optoelectronic applications
    J. Kettle, R. T. Hoyle, R. M. Perks, and S. Dimov
    pp. 1794-1799
    Abstract    Full Text: [ HTML Sectioned HTML   PDF (544 kB)  GZipped PS   ]    Order
  • Deposition of WNxCy for diffusion barrier application using the imido guanidinato complex W(NiPr)Cl3[iPrNC(NMe2)NiPr]
    Hiral M. Ajmera, Andrew T. Heitsch, Timothy J. Anderson, Corey B. Wilder, Laurel L. Reitfort, Lisa McElwee-White, and David P. Norton
    pp. 1800-1807
    Abstract    Full Text: [ HTML Sectioned HTML   PDF (771 kB)  GZipped PS   ]    Order
  • Transferring optical proximity correction effects into a process model
    Jianliang Li, Qiliang Yan, and Lawrence S. Melvin, III
    pp. 1808-1812
    Abstract    Full Text: [ HTML Sectioned HTML   PDF (577 kB)  GZipped PS   ]    Order
  • Use of ion beam assisted deposition and low temperature annealing for the fabrication of low loss, vertically stacked alumina waveguide structures
    J. R. Nightingale, R. Goswami, J. Duperre, J. M. Dawson, L. A. Hornak, and D. Korakakis
    pp. 1813-1816
    Abstract    Full Text: [ HTML Sectioned HTML   PDF (206 kB)  GZipped PS   ]    Order
  • Brief Reports and Comments

  • Nonvolatile memory and antifuse behavior in Pt/a-TiO2/Ag structures
    T. Busani and R. A. B. Devine
    pp. 1817-1820
    Abstract    Full Text: [ HTML Sectioned HTML   PDF (81 kB)  GZipped PS   ]    Order
  • Shop Notes

  • Electron-beam lithography of multiple-layer submicrometer periodic arrays on a barium fluoride substrate
    J. S. Tharp, D. J. Shelton, S. L. Wadsworth, and G. D. Boreman
    pp. 1821-1823
    Abstract    Full Text: [ HTML Sectioned HTML   PDF (160 kB)  GZipped PS   ]    Order
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    The above Table of Contents is for individual, noncommercial uses only. A limited license is granted to individuals to print or electronically store this document on their personal computer or workstation. Redistribution beyond person-to-person exchanges requires consent from the Journal of Vacuum Society and Technology B (web@jvstb.org).
    Copyright 2008 Journal of Vacuum Society and Technology B