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Journal of Vacuum Society and Technology B

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Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures -- November 2008

Volume 26, Issue 6 , pp. L45-2635

[ Previous Issue | Available Volumes | Issue Index ]

Letters Regular Articles Errata PAPERS FROM THE 52ND INTERNATIONAL CONFERENCE ON ELECTRON, ION, AND PHOTON BEAM TECHNOLOGY AND NANOFABRICATION E-Beam Maskless Lithography Electron Beam Sources Ion Beam Technology Photon Beam Technology Nano-optical Devices Metamaterials EUV Lithography Line Edge Roughness/Resists Metrology, Alignment, and Inspection Imaging/Microscopy Nanoimprint Process Simulation Beam Induced Processing Diblock Copolymers Directed Self Assembly New Nanopatterning Techniques Cell/Pattern Interactions Nanopattering and Energy Nanobio Devices Nanoelectronics Patterned Media/Data Storage Nanomachine, Nanomanipulation, and NEMS

Letters
	Fabrication of thin-film silicon on insulator by separation by implanted oxygen layer transfer Xing Wei, Ai Min Wu, Meng Chen, Jing Chen, Miao Zhang, Xi Wang, and Cheng Lu Lin pp. L45-L47 Abstract    Full Text: [ HTML Sectioned HTML   PDF (336 kB)  GZipped PS   ]    Order
	Fabrication of Ag-tetracyanoquinodimethane nanostructures using ink-jet printing/vapor-solid chemical reaction process Ravi Aggarwal, Roger J. Narayan, Kai Xiao, and David B. Geohegan pp. L48-L52 Abstract    Full Text: [ HTML Sectioned HTML   PDF (719 kB)  GZipped PS   ]    Order
Regular Articles
	The transition mechanisms of a ten-period InAs/GaAs quantum-dot infrared photodetector Chi-Che Tseng, Shu-Ting Chou, Shin-Yen Lin, Cheng-Nan Chen, Wei-Hsun Lin, Yi-Hao Chen, Tung-Hsun Chung, and Meng-Chyi Wu pp. 1831-1833 Abstract    Full Text: [ HTML Sectioned HTML   PDF (145 kB)  GZipped PS   ]    Order
	Fabrication and testing of through-silicon vias used in three-dimensional integration I. U. Abhulimen, A. Kamto, Y. Liu, S. L. Burkett, and L. Schaper pp. 1834-1840 Abstract    Full Text: [ HTML Sectioned HTML   PDF (599 kB)  GZipped PS   ]    Order
	GaN nanowire and Ga2O3 nanowire and nanoribbon growth from ion implanted iron catalyst Jason L. Johnson, Yongho Choi, and Ant Ural pp. 1841-1847 Abstract    Full Text: [ HTML Sectioned HTML   PDF (832 kB)  GZipped PS   ]    Order
	Gigahertz surface acoustic wave generation on ZnO thin films deposited by radio frequency magnetron sputtering on III-V semiconductor substrates Qi Jie Wang, Christian Pflügl, William F. Andress, Donhee Ham, Federico Capasso, and Masamichi Yamanishi pp. 1848-1851 Abstract    Full Text: [ HTML Sectioned HTML   PDF (218 kB)  GZipped PS   ]    Order
	Large-area dielectric and metallic freestanding gratings for midinfrared optical filtering applications Grégory Vincent, Stéphane Collin, Nathalie Bardou, Jean-Luc Pelouard, and Riad Haïdar pp. 1852-1855 Abstract    Full Text: [ HTML Sectioned HTML   PDF (1276 kB)  GZipped PS   ]    Order
	Optimization of antireflection structures of polymer based on nanoimprinting using anodic porous alumina Takashi Yanagishita, Toshiaki Kondo, Kazuyuki Nishio, and Hideki Masuda pp. 1856-1859 Abstract    Full Text: [ HTML Sectioned HTML   PDF (681 kB)  GZipped PS   ]    Order
	A new approach to fabricating high density nanoarrays by nanocontact printing Jian Gu, Xiaoyin Xiao, Bharath R. Takulapalli, Michael E. Morrison, Peiming Zhang, and Frederic Zenhausern pp. 1860-1865 Abstract    Full Text: [ HTML Sectioned HTML   PDF (758 kB)  GZipped PS   ]    Order
	Neutral particle proximity lithography: Noncontact nanoscale printing without charge-related artifacts Barry Craver, Hatem Nounu, James Wasson, and John C. Wolfe pp. 1866-1870 Abstract    Full Text: [ HTML Sectioned HTML   PDF (531 kB)  GZipped PS   ]    Order
	Epitaxial cubic HfN diffusion barriers deposited on Si (001) by using a TiN buffer layer Roy A. Araujo, Xinghang Zhang, and Haiyan Wang pp. 1871-1874 Abstract    Full Text: [ HTML Sectioned HTML   PDF (387 kB)  GZipped PS   ]    Order
	Tungsten metal gate etching in Cl2/O2 inductively coupled high density plasmas T. Morel, S. Bamola, R. Ramos, A. Beaurain, E. Pargon, and O. Joubert pp. 1875-1882 Abstract    Full Text: [ HTML Sectioned HTML   PDF (1024 kB)  GZipped PS   ]    Order
	High and low temperature behavior of Ohmic contacts to AlGaN/GaN heterostructures with a thin GaN cap M. A. Miller and S. E. Mohney pp. 1883-1886 Abstract    Full Text: [ HTML Sectioned HTML   PDF (252 kB)  GZipped PS   ]    Order
	Characterization of a sol-gel based high-k dielectric field effect transistor for cryogenic operation M. Ziaur Rahman Khan, D. G. Hasko, M. S. M. Saifullah, and M. E. Welland pp. 1887-1891 Abstract    Full Text: [ HTML Sectioned HTML   PDF (591 kB)  GZipped PS   ]    Order
	Improved field emission properties from polycrystalline indium oxide-coated single-walled carbon nanotubes Jungwoo Lee, Wonjoo Lee, Kijo Sim, Sung-Hwan Han, and Whikun Yi pp. 1892-1895 Abstract    Full Text: [ HTML Sectioned HTML   PDF (464 kB)  GZipped PS   ]    Order
	HBr-based inductively coupled plasma etching of high aspect ratio nanoscale trenches in GaInAsP/InP Wei Zhou, N. Sultana, and D. L. MacFarlane pp. 1896-1902 Abstract    Full Text: [ HTML Sectioned HTML   PDF (1750 kB)  GZipped PS   ]    Order
	Spatial scaling metrics of mask-induced line-edge roughness Patrick P. Naulleau and Gregg Gallatin pp. 1903-1910 Abstract    Full Text: [ HTML Sectioned HTML   PDF (1895 kB)  GZipped PS   ]    Order
	Feature profile evolution during shallow trench isolation etch in chlorine-based plasmas. I. Feature scale modeling John Hoang, Cheng-Che Hsu, and Jane P. Chang pp. 1911-1918 Abstract    Full Text: [ HTML Sectioned HTML   PDF (764 kB)  GZipped PS   ]    Order
	Feature profile evolution during shallow trench isolation etch in chlorine-based plasmas. II. Coupling reactor and feature scale models Cheng-Che Hsu, John Hoang, Vu Le, and Jane P. Chang pp. 1919-1925 Abstract    Full Text: [ HTML Sectioned HTML   PDF (364 kB)  GZipped PS   ]    Order
	Damage mechanism in low-dielectric (low-k) films during plasma processes Butsurin Jinnai, Toshihisa Nozawa, and Seiji Samukawa pp. 1926-1932 Abstract    Full Text: [ HTML Sectioned HTML   PDF (879 kB)  GZipped PS   ]    Order
	Photoconductivity of vertically aligned ZnO nanoneedle array Dongseok Park and Kijung Yong pp. 1933-1936 Abstract    Full Text: [ HTML Sectioned HTML   PDF (325 kB)  GZipped PS   ]    Order
	Improved crystalline quality nonpolar a-GaN films grown by hydride vapor phase epitaxy A. A. Donskov, L. I. D'yakonov, A. V. Govorkov, Y. P. Kozlova, S. S. Malakhov, A. V. Markov, M. V. Mezhennyi, V. F. Pavlov, A. Y. Polyakov, N. B. Smirnov, T. G. Yugova, and S. J. Pearton pp. 1937-1941 Abstract    Full Text: [ HTML Sectioned HTML   PDF (522 kB)  GZipped PS   ]    Order
	Solid-phase growth mechanism of tungsten oxide nanowires synthesized on sputtered tungsten film Y. Kojima, K. Kasuya, K. Nagato, T. Hamaguchi, and M. Nakao pp. 1942-1947 Abstract    Full Text: [ HTML Sectioned HTML   PDF (751 kB)  GZipped PS   ]    Order
	The coexistence of surface reconstruction domains on strained heteroepitaxial films Lee E. Sears, Joanna Mirecki Millunchick, and Chris Pearson pp. 1948-1951 Abstract    Full Text: [ HTML Sectioned HTML   PDF (300 kB)  GZipped PS   ]    Order
	Ge1−ySny photoconductor structures at 1.55  µm: From advanced materials to prototype devices R. Roucka, J. Xie, J. Kouvetakis, J. Mathews, V. D'Costa, J. Menéndez, J. Tolle, and S.-Q. Yu pp. 1952-1959 Abstract    Full Text: [ HTML Sectioned HTML   PDF (657 kB)  GZipped PS   ]    Order
	Growth of Si nanowires on micropillars for the study of their dopant distribution by atom probe tomography T. Xu, J. P. Nys, B. Grandidier, D. Stiévenard, Y. Coffinier, R. Boukherroub, R. Larde, E. Cadel, and P. Pareige pp. 1960-1963 Abstract    Full Text: [ HTML Sectioned HTML   PDF (342 kB)  GZipped PS   ]    Order
	Modifications of dielectric films induced by plasma ashing processes: Hybrid versus porous SiOCH materials M. Darnon, T. Chevolleau, T. David, N. Posseme, J. Ducote, C. Licitra, L. Vallier, O. Joubert, and J. Torres pp. 1964-1970 Abstract    Full Text: [ HTML Sectioned HTML   PDF (767 kB)  GZipped PS   ]    Order
	Formation and stability of NiSi in the presence of Co and Fe alloying elements D. Deduytsche, C. Detavernier, R. L. Van Meirhaeghe, J. L. Jordan-Sweet, and C. Lavoie pp. 1971-1977 Abstract    Full Text: [ HTML Sectioned HTML   PDF (920 kB)  GZipped PS   ]    Order
	Study of 193  nm photoresist degradation during short time fluorocarbon plasma exposure III. Effect of fluorocarbon film and initial surface condition on photoresist degradation M. Sumiya, R. Bruce, S. Engelmann, F. Weilnboeck, and G. S. Oehrlein pp. 1978-1986 Abstract    Full Text: [ HTML Sectioned HTML   PDF (758 kB)  GZipped PS   ]    Order
	Interface states mediated reverse leakage through metal/AlxGa1−xN/GaN Schottky diodes Changzhi Lu, Xiaoling Zhang, Xuesong Xie, Shiwei Feng, Ibrahima Diagne, Arif Khan, and S. Noor Mohammad pp. 1987-1992 Abstract    Full Text: [ HTML Sectioned HTML   PDF (452 kB)  GZipped PS   ]    Order
	Investigation of the oxide-assisted growth mechanism for nanowire growth and a model for this mechanism S. Noor Mohammad pp. 1993-2007 Abstract    Full Text: [ HTML Sectioned HTML   PDF (5178 kB)  GZipped PS   ]    Order
	Bias power dependence of reactive ion etching lag in contact hole etching using inductively coupled fluorocarbon plasma Shin-ichi Imai pp. 2008-2012 Abstract    Full Text: [ HTML Sectioned HTML   PDF (361 kB)  GZipped PS   ]    Order
Errata
	Erratum: “Spherical field emission cathode based on carbon nanotube paste and its application in luminescent bulbs” [J. Vac. Sci. Technol. B 26, 1404 (2008)] Weiqi Fu, Peng Liu, Jie Tang, Liang Liu, and Shoushan Fan p. 2013 Abstract    Full Text: [ HTML Sectioned HTML   PDF (83 kB)  GZipped PS   ]    Order
PAPERS FROM THE 52ND INTERNATIONAL CONFERENCE ON ELECTRON, ION, AND PHOTON BEAM TECHNOLOGY AND NANOFABRICATION E-Beam Maskless Lithography [ Next Subject | Issue Index | Top / Bottom of Page]
	Electron beams in individual column cells of multicolumn cell system Akio Yamada, Hiroshi Yasuda, and Masaki Yamabe pp. 2025-2031 Abstract    Full Text: [ HTML Sectioned HTML   PDF (1064 kB)  GZipped PS   ]    Order
	Process variation-aware three-dimensional proximity effect correction for electron beam direct writing at 45  nm node and beyond Kozo Ogino, Hiromi Hoshino, and Yasuhide Machida pp. 2032-2038 Abstract    Full Text: [ HTML Sectioned HTML   PDF (861 kB)  GZipped PS   ]    Order
	Charging and error budgets in electron beam lithography tools John G. Hartley and Adam Lyons pp. 2039-2042 Abstract    Full Text: [ HTML Sectioned HTML   PDF (584 kB)  GZipped PS   ]    Order
	An innovative design of wafer height and tilt sensor for lithography systems Junru Ruan and John Hartley pp. 2043-2048 Abstract    Full Text: [ HTML Sectioned HTML   PDF (608 kB)  GZipped PS   ]    Order
	Influence of hydrogen silsesquioxane resist exposure temperature on ultrahigh resolution electron beam lithography Vadim Sidorkin, Emile van der Drift, and Huub Salemink pp. 2049-2053 Abstract    Full Text: [ HTML Sectioned HTML   PDF (437 kB)  GZipped PS   ]    Order
	Dynamic stencil lithography on full wafer scale Veronica Savu, Marc A. F. van den Boogaart, Juergen Brugger, Julien Arcamone, Marc Sansa, and Francesc Perez-Murano pp. 2054-2058 Abstract    Full Text: [ HTML Sectioned HTML   PDF (432 kB)  GZipped PS   ]    Order
	Projection maskless patterning for nanotechnology applications Elmar Platzgummer, Hans Loeschner, and Gerhard Gross pp. 2059-2063 Abstract    Full Text: [ HTML Sectioned HTML   PDF (739 kB)  GZipped PS   ]    Order
Electron Beam Sources [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Sub-50  nm resolution surface electron emission lithography using nano-Si ballistic electron emitter A. Kojima, H. Ohyi, and N. Koshida pp. 2064-2068 Abstract    Full Text: [ HTML Sectioned HTML   PDF (449 kB)  GZipped PS   ]    Order
	Multilevel visualization of local electric field at probe apex using scanning electron microscopy Jun-ichi Fujita, Yuta Ikeda, and Ikumi Suzuki pp. 2069-2072 Abstract    Full Text: [ HTML Sectioned HTML   PDF (398 kB)  GZipped PS   ]    Order
	Effect of the electric field on the form stability of a Schottky electron emitter: A step model M. S. Bronsgeest and P. Kruit pp. 2073-2079 Abstract    Full Text: [ HTML Sectioned HTML   PDF (390 kB)  GZipped PS   ]    Order
	Range of validity of field emission equations A. S. Bahm, G. A. Schwind, and L. W. Swanson pp. 2080-2084 Abstract    Full Text: [ HTML Sectioned HTML   PDF (171 kB)  GZipped PS   ]    Order
	Evaluation of electron energy spread in CsBr based photocathodes Juan R. Maldonado, Yun Sun, Zhi Liu, Xuefeng Liu, Sayaka Tanimoto, Piero Pianetta, and Fabian Pease pp. 2085-2090 Abstract    Full Text: [ HTML Sectioned HTML   PDF (527 kB)  GZipped PS   ]    Order
Ion Beam Technology [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Brightness measurements of a gallium liquid metal ion source C. W. Hagen, E. Fokkema, and P. Kruit pp. 2091-2096 Abstract    Full Text: [ HTML Sectioned HTML   PDF (174 kB)  GZipped PS   ]    Order
	The use of ionic liquid ion sources in focused ion beam applications Anthony N. Zorzos and Paulo C. Lozano pp. 2097-2102 Abstract    Full Text: [ HTML Sectioned HTML   PDF (218 kB)  GZipped PS   ]    Order
	Elemental analysis with the helium ion microscope Sybren Sijbrandij, Bill Thompson, John Notte, Bill W. Ward, and Nicholas P. Economou pp. 2103-2106 Abstract    Full Text: [ HTML Sectioned HTML   PDF (709 kB)  GZipped PS   ]    Order
	Sputtering limits versus signal-to-noise limits in the observation of Sn balls in a Ga+ microscope V. Castaldo, C. W. Hagen, B. Rieger, and P. Kruit pp. 2107-2115 Abstract    Full Text: [ HTML Sectioned HTML   PDF (656 kB)  GZipped PS   ]    Order
Photon Beam Technology [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Enhancement in hyper-numerical-aperture imaging through selective TM polarization Bruce Smith, Jianming Zhou, and Peng Xie pp. 2116-2120 Abstract    Full Text: [ HTML Sectioned HTML   PDF (765 kB)  GZipped PS   ]    Order
	Image quality improvement in focused ion beam photomask repair system Anto Yasaka, Fumio Aramaki, Masashi Muramatsu, Tomokazu Kozakai, Osamu Matsuda, Yasuhiko Sugiyama, Toshio Doi, Osamu Takaoka, Ryoji Hagiwara, and Koji Nakamae pp. 2121-2123 Abstract    Full Text: [ HTML Sectioned HTML   PDF (540 kB)  GZipped PS   ]    Order
	High-speed optical beam-steering based on phase-arrayed waveguides Mona Jarrahi, R. Fabian, W. Pease, David A. B. Miller, and Thomas H. Lee pp. 2124-2126 Abstract    Full Text: [ HTML Sectioned HTML   PDF (493 kB)  GZipped PS   ]    Order
	Application of vector scanning in focused ion beam photomask repair system Anto Yasaka, Fumio Aramaki, Masashi Muramatsu, Tomokazu Kozakai, Osamu Matsuda, Yasuhiko Sugiyama, Toshio Doi, Osamu Takaoka, Ryoji Hagiwara, and Koji Nakamae pp. 2127-2130 Abstract    Full Text: [ HTML Sectioned HTML   PDF (592 kB)  GZipped PS   ]    Order
	Linewidth uniformity in Lloyd's mirror interference lithography systems Thomas B. O'Reilly and Henry I. Smith pp. 2131-2134 Abstract    Full Text: [ HTML Sectioned HTML   PDF (360 kB)  GZipped PS   ]    Order
	Spatial-frequency multiplication with multilevel interference lithography Chih-Hao Chang, Y. Zhao, R. K. Heilmann, and M. L. Schattenburg pp. 2135-2138 Abstract    Full Text: [ HTML Sectioned HTML   PDF (634 kB)  GZipped PS   ]    Order
	Light modulation with nanopatterned diffractive microelectromechanical system pixels Jack L. Skinner, A. Alec Talin, and David A. Horsley pp. 2139-2144 Abstract    Full Text: [ HTML Sectioned HTML   PDF (810 kB)  GZipped PS   ]    Order
	Improving lithography pattern fidelity and line-edge roughness by reducing laser speckle Oleg Kritsun, Ivan Lalovic, Slava Rokitski, Bill Partlo, Bruno La Fontaine, Nigel Farrar, and Harry Levinson pp. 2145-2150 Abstract    Full Text: [ HTML Sectioned HTML   PDF (738 kB)  GZipped PS   ]    Order
Nano-optical Devices [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Fabrication of metallic nanoslit waveguides with sharp bends M. Lu, L. E. Ocola, S. K. Gray, and G. P. Wiederrecht pp. 2151-2155 Abstract    Full Text: [ HTML Sectioned HTML   PDF (460 kB)  GZipped PS   ]    Order
	Optical antennas: A boost for infrared detection Huifeng Li and Xing Cheng pp. 2156-2159 Abstract    Full Text: [ HTML Sectioned HTML   PDF (309 kB)  GZipped PS   ]    Order
	Fabrication of Fresnel zone plates by holography in the extreme ultraviolet region Sankha S. Sarkar, Pratap K. Sahoo, Harun H. Solak, Christian David, and J. Friso Van der Veen pp. 2160-2163 Abstract    Full Text: [ HTML Sectioned HTML   PDF (317 kB)  GZipped PS   ]    Order
	Fabrication strategies for filter banks based on microring resonators C. W. Holzwarth, R. Amatya, M. Dahlem, A. Khilo, F. X. Kärtner, E. P. Ippen, R. J. Ram, and Henry I. Smith pp. 2164-2167 Abstract    Full Text: [ HTML Sectioned HTML   PDF (337 kB)  GZipped PS   ]    Order
	Focused in beam fabrication of metallic nanostructures on end faces of optical fibers for chemical sensing applications A. Dhawan, J. F. Muth, D. N. Leonard, M. D. Gerhold, J. Gleeson, T. Vo-Dinh, and P. E. Russell pp. 2168-2173 Abstract    Full Text: [ HTML Sectioned HTML   PDF (471 kB)  GZipped PS   ]    Order
	NIL processes and material characterization on transparent substrates for optical applications N. Chaix, C. Gourgon, C. Perret, S. Decossas, S. Landis, V. G. Lambertini, and N. Li Pira pp. 2174-2178 Abstract    Full Text: [ HTML Sectioned HTML   PDF (482 kB)  GZipped PS   ]    Order
	Fabrication of 200  nm period blazed transmission gratings on silicon-on-insulator wafers Minseung Ahn, Ralf K. Heilmann, and Mark L. Schattenburg pp. 2179-2182 Abstract    Full Text: [ HTML Sectioned HTML   PDF (599 kB)  GZipped PS   ]    Order
Metamaterials [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Engineering surface plasmon grating couplers through computer simulation Daniel P. Ceperley and Andrew R. Neureuther pp. 2183-2187 Abstract    Full Text: [ HTML Sectioned HTML   PDF (353 kB)  GZipped PS   ]    Order
	Light transmission through a metallic/dielectric nano-optic lens Hyungduk Ko, Hyun Chul Kim, and Mosong Cheng pp. 2188-2191 Abstract    Full Text: [ HTML Sectioned HTML   PDF (425 kB)  GZipped PS   ]    Order
	Photomask image enhancement using grating-generated surface waves Neal V. Lafferty, Anatoly Bourov, Andrew Estroff, and Bruce W. Smith pp. 2192-2196 Abstract    Full Text: [ HTML Sectioned HTML   PDF (550 kB)  GZipped PS   ]    Order
	Optical focusing of plasmonic Fresnel zone plate-based metallic structure covered with a dielectric layer Hyun Chul Kim, Hyungduk Ko, and Mosong Cheng pp. 2197-2203 Abstract    Full Text: [ HTML Sectioned HTML   PDF (603 kB)  GZipped PS   ]    Order
EUV Lithography [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Extreme ultraviolet lithography: Status and prospects Jos Benschop, Vadim Banine, Sjoerd Lok, and Erik Loopstra pp. 2204-2207 Abstract    Full Text: [ HTML Sectioned HTML   PDF (502 kB)  GZipped PS   ]    Order
	Effects of mask absorber structures on the extreme ultraviolet lithography Hwan-Seok Seo, Dong-Gun Lee, Hoon Kim, Sungmin Huh, Byung-Sup Ahn, Hakseung Han, Dongwan Kim, Seong-Sue Kim, Han-Ku Cho, and Eric M. Gullikson pp. 2208-2214 Abstract    Full Text: [ HTML Sectioned HTML   PDF (513 kB)  GZipped PS   ]    Order
	Experimental validation of full-field extreme ultraviolet lithography flare and shadowing corrections A. M. Myers, G. F. Lorusso, I. Kim, A. M. Goethals, R. Jonckheere, J. Hermans, B. Baudemprez, and K. Ronse pp. 2215-2219 Abstract    Full Text: [ HTML Sectioned HTML   PDF (425 kB)  GZipped PS   ]    Order
	Actinic extreme ultraviolet mask inspection beyond 0.25  numerical  aperture K. A. Goldberg, P. Naulleau, I. Mochi, E. H. Anderson, S. B. Rekawa, C. D. Kemp, R. F. Gunion, H.-S. Han, and S. Huh pp. 2220-2224 Abstract    Full Text: [ HTML Sectioned HTML   PDF (488 kB)  GZipped PS   ]    Order
	The effects of oxygen plasma on the chemical composition and morphology of the Ru capping layer of the extreme ultraviolet mask blanks Leonid Belau, Jeong Y. Park, Ted Liang, and Gabor A. Somorjai pp. 2225-2229 Abstract    Full Text: [ HTML Sectioned HTML   PDF (529 kB)  GZipped PS   ]    Order
	Protection and reduction of surface oxidation of Mo/Si multilayers for extreme ultraviolet lithography projection optics by control of hydrocarbon gas atmosphere Masahito Niibe, Keigo Koida, and Yukinobu Kakutani pp. 2230-2235 Abstract    Full Text: [ HTML Sectioned HTML   PDF (512 kB)  GZipped PS   ]    Order
	Decomposition of catechol and carbonaceous residues on TiO2(110): A model system for cleaning of extreme ultraviolet lithography optics Peter Jacobson, Shao-Chun Li, Chuandao Wang, and Ulrike Diebold pp. 2236-2240 Abstract    Full Text: [ HTML Sectioned HTML   PDF (397 kB)  GZipped PS   ]    Order
	Interaction of benzene with TiO2 surfaces: Relevance to contamination of extreme ultraviolet lithography mirror capping layers Shimon Zalkind, Boris V. Yakshinskiy, and Theodore E. Madey pp. 2241-2246 Abstract    Full Text: [ HTML Sectioned HTML   PDF (553 kB)  GZipped PS   ]    Order
Line Edge Roughness/Resists [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Stability of HSQ nanolines defined by e-beam lithography for Si nanowire field effect transistors Suresh Regonda, Mukti Aryal, and Wenchuang (Walter) Hu pp. 2247-2251 Abstract    Full Text: [ HTML Sectioned HTML   PDF (537 kB)  GZipped PS   ]    Order
	Novel negative-tone molecular resist based on polyphenol derivative for extreme ultraviolet lithography Hiroaki Oizumi, Takafumi Kumise, and Toshiro Itani pp. 2252-2256 Abstract    Full Text: [ HTML Sectioned HTML   PDF (568 kB)  GZipped PS   ]    Order
	Latent image formation in chemically amplified extreme ultraviolet resists with low activation energy for deprotection reaction Takahiro Kozawa, Seiichi Tagawa, Julius Joseph Santillan, and Toshiro Itani pp. 2257-2260 Abstract    Full Text: [ HTML Sectioned HTML   PDF (87 kB)  GZipped PS   ]    Order
	Dissolution characteristics of chemically amplified extreme ultraviolet resist Toshiro Itani, Koji Kaneyama, Takahiro Kozawa, and Seiichi Tagawa pp. 2261-2264 Abstract    Full Text: [ HTML Sectioned HTML   PDF (285 kB)  GZipped PS   ]    Order
	Improvement in linewidth roughness by postprocessing Manish Chandhok, Kent Frasure, E. Steve Putna, Todd R. Younkin, Willy Rachmady, Uday Shah, and Wang Yueh pp. 2265-2270 Abstract    Full Text: [ HTML Sectioned HTML   PDF (878 kB)  GZipped PS   ]    Order
	Epoxy silsesquioxane resists for UV nanoimprint lithography J. De Girolamo, M. Chouiki, J.-H. Tortai, C. Sourd, S. Derrough, M. Zelsmann, and J. Boussey pp. 2271-2275 Abstract    Full Text: [ HTML Sectioned HTML   PDF (248 kB)  GZipped PS   ]    Order
	Understanding the effects of photoacid distribution homogeneity and diffusivity on critical dimension control and line edge roughness in chemically amplified resists Cheng-Tsung Lee, Richard A. Lawson, and Clifford L. Henderson pp. 2276-2280 Abstract    Full Text: [ HTML Sectioned HTML   PDF (114 kB)  GZipped PS   ]    Order
	Contributions of resist polymers to innate material roughness Theodore H. Fedynyshyn, David K. Astolfi, Russell B. Goodman, Susan Cann, and Jeanette Roberts pp. 2281-2289 Abstract    Full Text: [ HTML Sectioned HTML   PDF (973 kB)  GZipped PS   ]    Order
	Optical characterization of a hydrogen silsesquioxane lithography process A. Samarelli, D. S. Macintyre, M. J. Strain, R. M. De La Rue, M. Sorel, and S. Thoms pp. 2290-2294 Abstract    Full Text: [ HTML Sectioned HTML   PDF (286 kB)  GZipped PS   ]    Order
	Influence of base and photoacid generator on deprotection blur in extreme ultraviolet photoresists and some thoughts on shot noise Christopher N. Anderson, Patrick P. Naulleau, Dimitra Niakoula, Elsayed Hassanein, Robert Brainard, Gregg Gallatin, and Kim Dean pp. 2295-2299 Abstract    Full Text: [ HTML Sectioned HTML   PDF (354 kB)  GZipped PS   ]    Order
	The effect of thin metal overlayers on the electron beam exposure of polymethyl methacrylate C. B. Samantaray and J. T. Hastings pp. 2300-2305 Abstract    Full Text: [ HTML Sectioned HTML   PDF (675 kB)  GZipped PS   ]    Order
	The effects of molecular weight on the exposure characteristics of poly(methylmethacrylate) developed at low temperatures M. Yan, S. Choi, K. R. V. Subramanian, and I. Adesida pp. 2306-2310 Abstract    Full Text: [ HTML Sectioned HTML   PDF (536 kB)  GZipped PS   ]    Order
	Effect of microstructure on deprotection kinetics in photoresist David S. Fryer, Vivek Singh, Srinivas B. Bollepalli, and Alex A. Granovsky pp. 2311-2315 Abstract    Full Text: [ HTML Sectioned HTML   PDF (438 kB)  GZipped PS   ]    Order
Metrology, Alignment, and Inspection [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Field-programmable gate array implementation of real-time spatial-phase locking for electron-beam lithography Yugu Yang and J. T. Hastings pp. 2316-2321 Abstract    Full Text: [ HTML Sectioned HTML   PDF (678 kB)  GZipped PS   ]    Order
	Abbe singular-value decomposition: Compact Abbe's kernel generation for microlithography aerial image simulation using singular-value decomposition method Charlie Chung Ping Chen, Ahmet Gurhanli, Tse-Yu Chiang, Jen-Jer Hong, and Lawrence S. Melvin, III pp. 2322-2330 Abstract    Full Text: [ HTML Sectioned HTML   PDF (994 kB)  GZipped PS   ]    Order
	Aberration correction for electron beam inspection, metrology, and lithography Eric Munro, John Rouse, Haoning Liu, and Liping Wang pp. 2331-2336 Abstract    Full Text: [ HTML Sectioned HTML   PDF (534 kB)  GZipped PS   ]    Order
	Study of machine to machine overlay error for sub-60-nm memory devices Jangho Shin, Sihyeung Lee, Jeongho Yeo, Hochul Kim, Junghyeon Lee, and Woosung Han pp. 2337-2340 Abstract    Full Text: [ HTML Sectioned HTML   PDF (456 kB)  GZipped PS   ]    Order
	Nanometer-level alignment to a substrate-embedded coordinate system Euclid E. Moon and Henry I. Smith pp. 2341-2344 Abstract    Full Text: [ HTML Sectioned HTML   PDF (341 kB)  GZipped PS   ]    Order
	Resist charging effect in photomask: Its impact on pattern placement error and critical dimension Jin Choi, Dong Seok Nam, Byung Gook Kim, Sang-Gyun Woo, and Han Ku Cho pp. 2345-2350 Abstract    Full Text: [ HTML Sectioned HTML   PDF (461 kB)  GZipped PS   ]    Order
	Self-assembled monolayer fiducial grids for spatial-phase-locked electron-beam lithography C. B. Samantaray and J. T. Hastings pp. 2351-2355 Abstract    Full Text: [ HTML Sectioned HTML   PDF (223 kB)  GZipped PS   ]    Order
Imaging/Microscopy [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Development of the compact low-energy soft x-ray CT instrument for the soft material structural analysis Motosuke Miyoshi, Takao Hamakubo, Tatsuhiko Kodama, Masatoshi Tsuchiya, Atsushi Koishikawa, and Nobutada Aoki pp. 2356-2361 Abstract    Full Text: [ HTML Sectioned HTML   PDF (478 kB)  GZipped PS   ]    Order
	X-ray diffraction microscopy: Reconstruction with partial magnitude and spatial a priori information Leili Baghaei Rad, Ian Downes, Bing Dai, Diling Zhu, Andreas Scherz, Jun Ye, Piero Pianetta, and R. Fabian W. Pease pp. 2362-2366 Abstract    Full Text: [ HTML Sectioned HTML   PDF (263 kB)  GZipped PS   ]    Order
	Scanning proximal probes for parallel imaging and lithography K. Ivanova, Y. Sarov, Tzv. Ivanov, A. Frank, J. Zöllner, Ch. Bitterlich, U. Wenzel, B. E. Volland, S. Klett, I. W. Rangelow, P. Zawierucha, M. Zielony, T. Gotszalk, D. Dontzov, W. Schott et al. pp. 2367-2373 Abstract    Full Text: [ HTML Sectioned HTML   PDF (1073 kB)  GZipped PS   ]    Order
	Neutral atom and molecule focusing using a Fresnel zone plate Thomas Reisinger and Bodil Holst pp. 2374-2379 Abstract    Full Text: [ HTML Sectioned HTML   PDF (603 kB)  GZipped PS   ]    Order
Nanoimprint [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Quality assessment of antisticking layers for thermal nanoimprint H.-C. Scheer, W. Häfner, A. Fidler, S. Möllenbeck, and N. Bogdanski pp. 2380-2384 Abstract    Full Text: [ HTML Sectioned HTML   PDF (111 kB)  GZipped PS   ]    Order
	Patterning of polyfluorene based polymer light emitting diodes by reversal imprint lithography B. L. Cardozo and S. W. Pang pp. 2385-2389 Abstract    Full Text: [ HTML Sectioned HTML   PDF (649 kB)  GZipped PS   ]    Order
	Fabrication of the nanoimprint mold using inorganic electron beam resist with post exposure bake Noriyuki Unno, Jun Taniguchi, Miyako Shizuno, and Kiyoshi Ishikawa pp. 2390-2393 Abstract    Full Text: [ HTML Sectioned HTML   PDF (720 kB)  GZipped PS   ]    Order
	Fluorinated diamondlike carbon templates for high resolution nanoimprint lithography M. Schvartzman, A. Mathur, Y. Kang, C. Jahnes, J. Hone, and S. J. Wind pp. 2394-2398 Abstract    Full Text: [ HTML Sectioned HTML   PDF (445 kB)  GZipped PS   ]    Order
	Experimental and numerical analyses on recovery of polymer deformation after demolding in the hot embossing process Hideki Takagi, Masaharu Takahashi, Ryutaro Maeda, Yuki Onishi, Yasuroh Iriye, Takuya Iwasaki, and Yoshihiko Hirai pp. 2399-2403 Abstract    Full Text: [ HTML Sectioned HTML   PDF (502 kB)  GZipped PS   ]    Order
	Improving organic thin-film transistor performance by nanoimprint-induced chain ordering Dehu Cui, Huifeng Li, Hyunsoo Park, and Xing Cheng pp. 2404-2409 Abstract    Full Text: [ HTML Sectioned HTML   PDF (549 kB)  GZipped PS   ]    Order
	Full field imprint masks using variable shape beam pattern generators Kosta Selinidis, Ecron Thompson, Gerard Schmid, Nick Stacey, Joseph Perez, John Maltabes, S. V. Sreenivasan, Douglas J. Resnick, Akjko Fujii, Yuko Sakai, Shiho Sasaki, and Naoya Hayashi pp. 2410-2415 Abstract    Full Text: [ HTML Sectioned HTML   PDF (2222 kB)  GZipped PS   ]    Order
	Contact angles in a thermal imprint process Nicolas Bogdanski, Saskia Möllenbeck, and Hella-Christin Scheer pp. 2416-2420 Abstract    Full Text: [ HTML Sectioned HTML   PDF (344 kB)  GZipped PS   ]    Order
	Metal transfer assisted nanolithography on rigid and flexible substrates Myung-Gyu Kang and L. Jay Guo pp. 2421-2425 Abstract    Full Text: [ HTML Sectioned HTML   PDF (833 kB)  GZipped PS   ]    Order
	Easy duplication of stamps using UV-cured fluoro-silsesquioxane for nanoimprint lithography Carlos Pina-Hernandez, Peng-Fei Fu, and L. Jay Guo pp. 2426-2429 Abstract    Full Text: [ HTML Sectioned HTML   PDF (277 kB)  GZipped PS   ]    Order
	Comparison of monomer and polymer resists in thermal nanoimprint lithography M. Zelsmann, K. Perez Toralla, J. De Girolamo, D. Boutry, and C. Gourgon pp. 2430-2433 Abstract    Full Text: [ HTML Sectioned HTML   PDF (356 kB)  GZipped PS   ]    Order
Process Simulation [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Exploration of etch step interactions in the dual patterning process for process modeling Lawrence S. Melvin, III, Brian S. Ward, Hua Song, Sang Uhk Rhie, Kevin D. Lucas, Vincent Wiaux, Staf Verhaegen, and Mireille Maenhoudt pp. 2434-2440 Abstract    Full Text: [ HTML Sectioned HTML   PDF (1095 kB)  GZipped PS   ]    Order
	Pattern specific optical models Edita Tejnil, Konstantinos Adam, Michael C. Lam, and Gabriel Berger pp. 2441-2446 Abstract    Full Text: [ HTML Sectioned HTML   PDF (616 kB)  GZipped PS   ]    Order
Beam Induced Processing [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Catalyst patterning for carbon nanotube growth on elevating posts by self-aligned double-layer electron beam lithography M. Häffner, A. Heeren, A. Haug, E. Schuster, A. Sagar, M. Fleischer, H. Peisert, M. Burghard, T. Chassé, and D. P. Kern pp. 2447-2450 Abstract    Full Text: [ HTML Sectioned HTML   PDF (598 kB)  GZipped PS   ]    Order
	Direct patterning of plasma enhanced chemical vapor deposition silicon dioxide by electron beam lithography Devin K. Brown pp. 2451-2454 Abstract    Full Text: [ HTML Sectioned HTML   PDF (577 kB)  GZipped PS   ]    Order
	Preferential orientation effects in partial melt laser crystallization of silicon D. J. Witte, M. P. A. Masbou, F. Crnogorac, R. F. W. Pease, and D. S. Pickard pp. 2455-2459 Abstract    Full Text: [ HTML Sectioned HTML   PDF (602 kB)  GZipped PS   ]    Order
	Electron-beam-induced deposition of platinum at low landing energies A. Botman, D. A. M. de Winter, and J. J. L. Mulders pp. 2460-2463 Abstract    Full Text: [ HTML Sectioned HTML   PDF (393 kB)  GZipped PS   ]    Order
	Investigation of morphological changes in platinum-containing nanostructures created by electron-beam-induced deposition A. Botman, M. Hesselberth, and J. J. L. Mulders pp. 2464-2467 Abstract    Full Text: [ HTML Sectioned HTML   PDF (557 kB)  GZipped PS   ]    Order
	Ion track lithography and graphitic nanowires in diamondlike carbon J. Krauser, A.-K. Nix, H.-G. Gehrke, H. Hofsäss, C. Trautmann, A. Weidinger, F. Wünsch, and J. Bruns pp. 2468-2472 Abstract    Full Text: [ HTML Sectioned HTML   PDF (432 kB)  GZipped PS   ]    Order
	Optical properties of sputtered fluorinated ethylene propylene and its application to surface-plasmon resonance sensor fabrication P. D. Keathley and J. T. Hastings pp. 2473-2477 Abstract    Full Text: [ HTML Sectioned HTML   PDF (362 kB)  GZipped PS   ]    Order
	Relief and trench formation on chalcogenide thin films using electron beams G. B. Hoffman, W.-C. Liu, W. Zhou, R. Sooryakumar, P. Boolchand, and R. M. Reano pp. 2478-2483 Abstract    Full Text: [ HTML Sectioned HTML   PDF (376 kB)  GZipped PS   ]    Order
Diblock Copolymers [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Impact of trench width roughness on the graphoepitaxial assembly of block copolymers Adam M. Welander, Paul F. Nealey, Heidi Cao, and Robert Bristol pp. 2484-2488 Abstract    Full Text: [ HTML Sectioned HTML   PDF (394 kB)  GZipped PS   ]    Order
	Si-containing block copolymers for self-assembled nanolithography C. A. Ross, Y. S. Jung, V. P. Chuang, F. Ilievski, J. K. W. Yang, I. Bita, E. L. Thomas, Henry I. Smith, K. K. Berggren, G. J. Vancso, and J. Y. Cheng pp. 2489-2494 Abstract    Full Text: [ HTML Sectioned HTML   PDF (897 kB)  GZipped PS   ]    Order
	Directed assembly of asymmetric ternary block copolymer-homopolymer blends using symmetric block copolymer into checkerboard trimming chemical pattern Huiman Kang, Gordon S. W. Craig, and Paul F. Nealey pp. 2495-2499 Abstract    Full Text: [ HTML Sectioned HTML   PDF (942 kB)  GZipped PS   ]    Order
	The replication of three dimensional structures using UV curable nanoimprint lithography K. Mohamed, M. M. Alkaisi, and R. J. Blaikie pp. 2500-2503 Abstract    Full Text: [ HTML Sectioned HTML   PDF (431 kB)  GZipped PS   ]    Order
	In situ characterization of block copolymer ordering on chemically nanopatterned surfaces by time-resolved small angle x-ray scattering K. O. Stuen, C. Liu, A. M. Welander, G. Liu, J. J. de Pablo, P. F. Nealey, D. K. Satapathy, K. Nygård, O. Bunk, H. H. Solak, and J. F. van der Veen pp. 2504-2508 Abstract    Full Text: [ HTML Sectioned HTML   PDF (402 kB)  GZipped PS   ]    Order
Directed Self Assembly [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Carbon nanotube–based magnetic actuation of origami membranes Hyun Jin In, Hyungwoo Lee, Anthony J. Nichol, Sang-Gook Kim, and George Barbastathis pp. 2509-2512 Abstract    Full Text: [ HTML Sectioned HTML   PDF (434 kB)  GZipped PS   ]    Order
	Assisted convective-capillary force assembly of gold colloids in a microfluidic cell: Plasmonic properties of deterministic nanostructures T. Pinedo Rivera, O. Lecarme, J. Hartmann, E. Rossitto, K. Berton, and D. Peyrade pp. 2513-2519 Abstract    Full Text: [ HTML Sectioned HTML   PDF (1100 kB)  GZipped PS   ]    Order
	Pulsed laser techniques for nanographoepitaxy F. Crnogorac, D. J. Witte, and R. F. W. Pease pp. 2520-2523 Abstract    Full Text: [ HTML Sectioned HTML   PDF (524 kB)  GZipped PS   ]    Order
	Directed self-assembly of individual vertically aligned carbon nanotubes Amit Goyal, Sheng Liu, Zafar Iqbal, Linus A. Fetter, and Reginald C. Farrow pp. 2524-2528 Abstract    Full Text: [ HTML Sectioned HTML   PDF (538 kB)  GZipped PS   ]    Order
New Nanopatterning Techniques [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Three-dimensional alignment with 10  nm order accuracy in electron-beam lithography on rotated sample for three-dimensional nanofabrication Kenji Yamazaki and Hiroshi Yamaguchi pp. 2529-2533 Abstract    Full Text: [ HTML Sectioned HTML   PDF (689 kB)  GZipped PS   ]    Order
	Microscale self-assembly using molten alloys with different melting points Christopher J. Morris and Madan Dubey pp. 2534-2538 Abstract    Full Text: [ HTML Sectioned HTML   PDF (643 kB)  GZipped PS   ]    Order
	Chip-based microfabricated electrospinning nozzles Leon M. Bellan, Chris Alpha, Tom Corso, Jack Henion, and Harold G. Craighead pp. 2539-2542 Abstract    Full Text: [ HTML Sectioned HTML   PDF (351 kB)  GZipped PS   ]    Order
Cell/Pattern Interactions [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	High-aspect-ratio plasma-induced nanotextured poly(dimethylsiloxane) surfaces with enhanced protein adsorption capacity M. E. Vlachopoulou, P. S. Petrou, S. E. Kakabakos, A. Tserepi, and E. Gogolides pp. 2543-2548 Abstract    Full Text: [ HTML Sectioned HTML   PDF (635 kB)  GZipped PS   ]    Order
	Fabrication of elastomer pillar arrays with modulated stiffness for cellular force measurements S. Ghassemi, N. Biais, K. Maniura, S. J. Wind, M. P. Sheetz, and J. Hone pp. 2549-2553 Abstract    Full Text: [ HTML Sectioned HTML   PDF (485 kB)  GZipped PS   ]    Order
	Optimizing substrate disorder for bone tissue engineering of mesenchymal stem cells Nikolaj Gadegaard, Matthew J. Dalby, Mathis O. Riehle, and Chris D. W. Wilkinson pp. 2554-2557 Abstract    Full Text: [ HTML Sectioned HTML   PDF (269 kB)  GZipped PS   ]    Order
	Nanomodified surfaces and guidance of nerve cell processes Fredrik Johansson, Waldemar Hällström, Per Gustavsson, Lars Wallman, Christelle Prinz, Lars Montelius, and Martin Kanje pp. 2558-2561 Abstract    Full Text: [ HTML Sectioned HTML   PDF (434 kB)  GZipped PS   ]    Order
Nanopattering and Energy [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Imprinted large-scale high density polymer nanopillars for organic solar cells Mukti Aryal, Fatih Buyukserin, Kamil Mielczarek, Xiao-Mei Zhao, Jinming Gao, Anvar Zakhidov, and Wenchuang (Walter) Hu pp. 2562-2566 Abstract    Full Text: [ HTML Sectioned HTML   PDF (509 kB)  GZipped PS   ]    Order
Nanobio Devices [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Direct write electron beam patterning of DNA complex thin films R. A. Jones, W. X. Li, H. Spaeth, and A. J. Steckl pp. 2567-2571 Abstract    Full Text: [ HTML Sectioned HTML   PDF (490 kB)  GZipped PS   ]    Order
	Hybridization sensing by electrical enhancement with nanoparticles in nanogap Chun-Chi Chen, Fu-Hsiang Ko, Edward Yi Chang, Feng-Chih Chang, and Shiao-Wei Kuo pp. 2572-2577 Abstract    Full Text: [ HTML Sectioned HTML   PDF (490 kB)  GZipped PS   ]    Order
	Control of DNA motion in microchannels integrated with dual electrodes B. L. Cardozo and S. W. Pang pp. 2578-2582 Abstract    Full Text: [ HTML Sectioned HTML   PDF (465 kB)  GZipped PS   ]    Order
Nanoelectronics [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Hybrid high resolution lithography (e-beam/deep ultraviolet) and etch process for the fabrication of stacked nanowire metal oxide semiconductor field effect transistors S. Pauliac-Vaujour, C. Comboroure, C. Vizioz, S. Barnola, P. Brianceau, V. Maffini Alvaro, C. Dupré, and T. Ernst pp. 2583-2586 Abstract    Full Text: [ HTML Sectioned HTML   PDF (1071 kB)  GZipped PS   ]    Order
	Silicon single-electron transistor with oxide tunnel barriers fabricated using chemical mechanical polishing Vishwanath Joshi, Alexei O. Orlov, and Gregory L. Snider pp. 2587-2591 Abstract    Full Text: [ HTML Sectioned HTML   PDF (605 kB)  GZipped PS   ]    Order
	Prospects of free electron analog to digital technology Rafael Aldana and R. Fabian Pease pp. 2592-2595 Abstract    Full Text: [ HTML Sectioned HTML   PDF (609 kB)  GZipped PS   ]    Order
	Single atom doping for quantum device development in diamond and silicon C. D. Weis, A. Schuh, A. Batra, A. Persaud, I. W. Rangelow, J. Bokor, C. C. Lo, S. Cabrini, E. Sideras-Haddad, G. D. Fuchs, R. Hanson, D. D. Awschalom, and T. Schenkel pp. 2596-2600 Abstract    Full Text: [ HTML Sectioned HTML   PDF (467 kB)  GZipped PS   ]    Order
	ZnO nanostructures grown on zinc nanocones by thermal oxidation Liang-Chiun Chao, Chung-Chi Liau, Syuan-Jhih Lin, and Jun-Wei Lee pp. 2601-2603 Abstract    Full Text: [ HTML Sectioned HTML   PDF (459 kB)  GZipped PS   ]    Order
Patterned Media/Data Storage [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Toward 1  Tdot/in.2 nanoimprint lithography for magnetic bit-patterned media: Opportunities and challenges XiaoMin Yang, Yuan Xu, Carl Seiler, Lei Wan, and Shuaigang Xiao pp. 2604-2610 Abstract    Full Text: [ HTML Sectioned HTML   PDF (1128 kB)  GZipped PS   ]    Order
	Potential of a rotary stage electron beam mastering system for fabricating patterned magnetic media T. Miyazaki, K. Hayashi, K. Kobayashi, Y. Kuba, H. Ohyi, T. Obara, O. Mizuta, N. Murayama, N. Tanaka, Y. Kawamura, and H. Uemoto pp. 2611-2618 Abstract    Full Text: [ HTML Sectioned HTML   PDF (2222 kB)  GZipped PS   ]    Order
Nanomachine, Nanomanipulation, and NEMS [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Electrothermal actuation studies on silicon carbide resonators Enrico Mastropaolo and Rebecca Cheung pp. 2619-2623 Abstract    Full Text: [ HTML Sectioned HTML   PDF (447 kB)  GZipped PS   ]    Order
	Novel SU-8 optical waveguide microgripper for simultaneous micromanipulation and optical detection Roberto R. Panepucci and Jose A. Martinez pp. 2624-2627 Abstract    Full Text: [ HTML Sectioned HTML   PDF (903 kB)  GZipped PS   ]    Order
	Resistivity change of the diamondlike carbon, deposited by focused-ion-beam chemical vapor deposition, induced by the annealing treatment Reo Kometani, Toshinari Ichihashi, Kazuhiro Kanda, Tsuneo Suzuki, Koichi Niihara, Sunao Ishihara, Takashi Kaito, and Shinji Matsui pp. 2628-2631 Abstract    Full Text: [ HTML Sectioned HTML   PDF (130 kB)  GZipped PS   ]    Order
	Nanofabrication of super-high-aspect-ratio structures in hydrogen silsesquioxane from direct-write e-beam lithography and hot development L. E. Ocola and V. R. Tirumala pp. 2632-2635 Abstract    Full Text: [ HTML Sectioned HTML   PDF (773 kB)  GZipped PS   ]    Order

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