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Journal of Vacuum Society and Technology B

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Journal of Vacuum Science & Technology B: Microelectronics and Nanometer Structures -- November 2007

Volume 25, Issue 6 , pp. 1743-2664

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Review Article Regular Articles PAPERS FROM THE 51st INTERNATIONAL CONFERENCE ON ELECTRON, ION, AND PHOTON BEAM TECHNOLOGY AND NANOFABRICATION Directed Self Assembly Electron Beam Lithography EUV Lithography Ion Beam Lithography and X-ray Lithography Maskless Lithography Modeling Simulation and CAD Nanoimprint and Soft Lithography Optical Lithography Photoresist Technology Metrology Nanodevices Photonics

Review Article
	Extreme ultraviolet lithography: A review Banqiu Wu and Ajay Kumar pp. 1743-1761 Abstract    Full Text: [ HTML Sectioned HTML   PDF (617 kB)  GZipped PS   ]    Order
Regular Articles
	Effect of process parameters on via formation in Si using deep reactive ion etching I. U. Abhulimen, S. Polamreddy, S. Burkett, L. Cai, and L. Schaper pp. 1762-1770 Abstract    Full Text: [ HTML Sectioned HTML   PDF (873 kB)  GZipped PS   ]    Order
	Fabrication of a Fresnel zone plate through electron beam lithographic process and its application to measuring of critical dimension scanning electron microscope performance J. Kim, K. Jalhadi, S.-Y. Lee, and D. C. Joy pp. 1771-1775 Abstract    Full Text: [ HTML Sectioned HTML   PDF (404 kB)  GZipped PS   ]    Order
	Defects in HgTe grown by molecular beam epitaxy on (211)B-oriented CdZnTe substrates E. Selvig, C. R. Tonheim, K. O. Kongshaug, T. Skauli, T. Lorentzen, and R. Haakenaasen pp. 1776-1784 Abstract    Full Text: [ HTML Sectioned HTML   PDF (725 kB)  GZipped PS   ]    Order
	Enhanced field emission from carbon nanotubes with a thin layer of low work function barium strontium oxide surface coating Feng Jin, Yan Liu, Christopher M. Day, and Scott A. Little pp. 1785-1788 Abstract    Full Text: [ HTML Sectioned HTML   PDF (417 kB)  GZipped PS   ]    Order
	Development of chemical-mechanical polished high-resolution zone plates Stefan Rehbein, Peter Guttmann, Stephan Werner, and Gerd Schneider pp. 1789-1793 Abstract    Full Text: [ HTML Sectioned HTML   PDF (781 kB)  GZipped PS   ]    Order
	Electrical properties and deep traps in ZnO films grown by molecular beam epitaxy A. Y. Polyakov, N. B. Smirnov, A. I. Belogorokhov, A. V. Govorkov, E. A. Kozhukhova, A. V. Osinsky, J. Q. Xie, B. Hertog, and S. J. Pearton pp. 1794-1798 Abstract    Full Text: [ HTML Sectioned HTML   PDF (352 kB)  GZipped PS   ]    Order
	Proposed single layer composite film used as high transmission phase shifting masks for the 32, 45, and 65  nm technology nodes Fu-Der Lai and Jian Long Huang pp. 1799-1803 Abstract    Full Text: [ HTML Sectioned HTML   PDF (347 kB)  GZipped PS   ]    Order
	Critical parameter determination of sonic flow controller diamond microtubes and micronozzles S. S. Mammana, F. T. Degasperi, M. C. Salvadori, D. C. Sparapani, M. F. Laino, R. C. Rangel, F. S. Teixeira, and M. Cattani pp. 1804-1807 Abstract    Full Text: [ HTML Sectioned HTML   PDF (240 kB)  GZipped PS   ]    Order
	On-wafer monitoring of charge accumulation and sidewall conductivity in high-aspect-ratio contact holes during SiO2 etching process Butsurin Jinnai, Toshiyuki Orita, Mamoru Konishi, Jun Hashimoto, Yoshinari Ichihashi, Akito Nishitani, Shingo Kadomura, Hiroto Ohtake, and Seiji Samukawa pp. 1808-1813 Abstract    Full Text: [ HTML Sectioned HTML   PDF (634 kB)  GZipped PS   ]    Order
	Influence of RuO2 nanoparticles on electron emission from carbon nanotubes Huarong Liu, Tsuneyuki Noguchi, and Shigeki Kato pp. 1814-1818 Abstract    Full Text: [ HTML Sectioned HTML   PDF (432 kB)  GZipped PS   ]    Order
	Yield improvement of 0.13  µm Cu/low-k dual-damascene interconnection by organic cleaning process Nam-Hoon Kim, Sang-Yong Kim, Hyun-Ki Lee, Kang-Yeon Lee, Chang-Il Kim, and Eui-Goo Chang pp. 1819-1822 Abstract    Full Text: [ HTML Sectioned HTML   PDF (555 kB)  GZipped PS   ]    Order
	Growth of ZnSe nanowires by pulsed-laser deposition Tinwei Zhang, Yiqun Shen, Wei Hu, Jian Sun, Jiada Wu, Zhifeng Ying, and Ning Xu pp. 1823-1826 Abstract    Full Text: [ HTML Sectioned HTML   PDF (466 kB)  GZipped PS   ]    Order
	Fabrication of periodic microstructures on flexible polyimide membranes D. J. Shelton, J. S. Tharp, G. Zummo, W. R. Folks, and G. D. Boreman pp. 1827-1831 Abstract    Full Text: [ HTML Sectioned HTML   PDF (310 kB)  GZipped PS   ]    Order
	Evolution of surface morphology of GaN thin films during photoelectrochemical etching J. H. Leach, Ü. Özgür, and H. Morkoç pp. 1832-1835 Abstract    Full Text: [ HTML Sectioned HTML   PDF (566 kB)  GZipped PS   ]    Order
	C-doped semi-insulating GaN HFETs on sapphire substrates with a high breakdown voltage and low specific on-resistance Y. C. Choi, J. Shi, M. Pophristic, M. G. Spencer, and L. F. Eastman pp. 1836-1841 Abstract    Full Text: [ HTML Sectioned HTML   PDF (386 kB)  GZipped PS   ]    Order
	Large-scale growth of single-walled carbon nanotubes using cold-wall chemical vapor deposition K. Y. Shin, C. T. Lee, J. S. Kao, C. C. Kei, C. M. Chang, C. N. Hsiao, J. H. Liang, K. C. Leou, and C. H. Tsai pp. 1842-1846 Abstract    Full Text: [ HTML Sectioned HTML   PDF (752 kB)  GZipped PS   ]    Order
	Formation of single crystal sulfur supersaturated silicon based junctions by pulsed laser melting Malek Tabbal, Taegon Kim, Jeffrey M. Warrender, Michael J. Aziz, B. L. Cardozo, and R. S. Goldman pp. 1847-1852 Abstract    Full Text: [ HTML Sectioned HTML   PDF (650 kB)  GZipped PS   ]    Order
	Effects and mechanisms of nitrogen incorporation into hafnium oxide by plasma immersion implantation Hei Wong, Banani Sen, B. L. Yang, A. P. Huang, and P. K. Chu pp. 1853-1858 Abstract    Full Text: [ HTML Sectioned HTML   PDF (605 kB)  GZipped PS   ]    Order
	Characterization of ruthenium thin films as capping layer for extreme ultraviolet lithography mask blanks Pei-yang Yan, Eberhard Spiller, and Paul Mirkarimi pp. 1859-1866 Abstract    Full Text: [ HTML Sectioned HTML   PDF (759 kB)  GZipped PS   ]    Order
	Zero-dimensional analysis for discharge characteristics Wontaek Park pp. 1867-1869 Abstract    Full Text: [ HTML Sectioned HTML   PDF (143 kB)  GZipped PS   ]    Order
	Highly selective zero-bias plasma etching of GaN over AlGaN Michael L. Schuette and Wu Lu pp. 1870-1874 Abstract    Full Text: [ HTML Sectioned HTML   PDF (554 kB)  GZipped PS   ]    Order
	Structural and optical characterization of WO3 nanorods/films prepared by oblique angle deposition W. Smith, Z.-Y. Zhang, and Y.-P. Zhao pp. 1875-1881 Abstract    Full Text: [ HTML Sectioned HTML   PDF (714 kB)  GZipped PS   ]    Order
	Ion energy control at substrates during plasma etching of patterned structures R. Silapunt, A. E. Wendt, and K. H. R. Kirmse pp. 1882-1887 Abstract    Full Text: [ HTML Sectioned HTML   PDF (254 kB)  GZipped PS   ]    Order
	Thermal model for a superstrate cooling apparatus for an integrated in-line manufacturing process for thin film photovoltaic devices R. A. Enzenroth, K. L. Barth, W. S. Sampath, and V. Manivannan pp. 1888-1891 Abstract    Full Text: [ HTML Sectioned HTML   PDF (67 kB)  GZipped PS   ]    Order
	Structure and magnetic property of c-axis oriented L10-FePt nanoparticles on TiN/a-Si underlayers Yoshiko Tsuji, Suguru Noda, and Yukio Yamaguchi pp. 1892-1895 Abstract    Full Text: [ HTML Sectioned HTML   PDF (539 kB)  GZipped PS   ]    Order
	Influence of different surface-passivation dielectrics on high-temperature strain relaxation of AlGaN in AlGaN/GaN heterostructures D. J. Chen, Y. Q. Tao, C. Chen, Z. L. Xie, Z. Y. Zhai, X. S. Wu, P. Han, R. Zhang, and Y. D. Zheng pp. 1896-1898 Abstract    Full Text: [ HTML Sectioned HTML   PDF (69 kB)  GZipped PS   ]    Order
	Effects of surface plasmon resonant scattering on the power conversion efficiency of organic thin-film solar cells Y. C. Chang, F. Y. Chou, P. H. Yeh, H. W. Chen, S.-H. Chang, Y. C. Lan, T. F. Guo, T. C. Tsai, and C. T. Lee pp. 1899-1902 Abstract    Full Text: [ HTML Sectioned HTML   PDF (309 kB)  GZipped PS   ]    Order
	Optimized plasma-deposited fluorocarbon coating for dry release and passivation of thin SU-8 cantilevers Stephan Keller, Daniel Haefliger, and Anja Boisen pp. 1903-1908 Abstract    Full Text: [ HTML Sectioned HTML   PDF (558 kB)  GZipped PS   ]    Order
	Structural characteristics of single-crystal nanowires grown by self-catalytic chemical vapor deposition method Maoqi He and S. Noor Mohammad pp. 1909-1915 Abstract    Full Text: [ HTML Sectioned HTML   PDF (447 kB)  GZipped PS   ]    Order
	Atomic diffusion and electronic structure in Al0.52In0.48P/GaAs heterostructures P. E. Smith, M. Lueck, S. A. Ringel, and L. J. Brillson pp. 1916-1921 Abstract    Full Text: [ HTML Sectioned HTML   PDF (707 kB)  GZipped PS   ]    Order
	Atomic layer deposited HfO2/HfSixOyNz stacked gate dielectrics for metal-oxide-semiconductor structures Seokhoon Kim, Sanghyun Woo, Hyungchul Kim, Wooho Jeong, Taeyong Park, Honggyu Kim, Sung Bae Kim, and Hyeongtag Jeon pp. 1922-1927 Abstract    Full Text: [ HTML Sectioned HTML   PDF (197 kB)  GZipped PS   ]    Order
	Mechanisms of porous dielectric film modification induced by reducing and oxidizing ash plasmas N. Posseme, T. Chevolleau, T. David, M. Darnon, O. Louveau, and O. Joubert pp. 1928-1940 Abstract    Full Text: [ HTML Sectioned HTML   PDF (781 kB)  GZipped PS   ]    Order
PAPERS FROM THE 51st INTERNATIONAL CONFERENCE ON ELECTRON, ION, AND PHOTON BEAM TECHNOLOGY AND NANOFABRICATION Directed Self Assembly [ Next Subject | Issue Index | Top / Bottom of Page]
	Graphoepitaxial cylindrical block copolymer nanodomains evaluated as bit patterned media template Shuaigang Xiao and XiaoMin Yang pp. 1953-1957 Abstract    Full Text: [ HTML Sectioned HTML   PDF (908 kB)  GZipped PS   ]    Order
	Imaging layers for the directed assembly of block copolymer films: Dependence of the physical and chemical properties of patterned polymer brushes on brush molecular weight K. O. Stuen, I. In, E. Han, J. A. Streifer, R. J. Hamers, P. F. Nealey, and P. Gopalan pp. 1958-1962 Abstract    Full Text: [ HTML Sectioned HTML   PDF (185 kB)  GZipped PS   ]    Order
	Pattern transfer using poly(styrene-block-methyl methacrylate) copolymer films and reactive ion etching Chi-Chun Liu, Paul F. Nealey, Yuk-Hong Ting, and Amy E. Wendt pp. 1963-1968 Abstract    Full Text: [ HTML Sectioned HTML   PDF (838 kB)  GZipped PS   ]    Order
	Exploring the manufacturability of using block copolymers as resist materials in conjunction with advanced lithographic tools Gordon S. W. Craig and Paul F. Nealey pp. 1969-1975 Abstract    Full Text: [ HTML Sectioned HTML   PDF (1162 kB)  GZipped PS   ]    Order
	Submicron aligned wafer bonding via capillary forces Michael R. Tupek and Kevin T. Turner pp. 1976-1981 Abstract    Full Text: [ HTML Sectioned HTML   PDF (423 kB)  GZipped PS   ]    Order
	Creation of sub-20-nm contact using diblock copolymer on a 300  mm wafer for complementary metal oxide semiconductor applications Wai-kin Li and Sam Yang pp. 1982-1984 Abstract    Full Text: [ HTML Sectioned HTML   PDF (418 kB)  GZipped PS   ]    Order
	Nanostructures using self-assembled multilayers as molecular rulers and etch resists C. Srinivasan, J. N. Hohman, M. E. Anderson, P. S. Weiss, and M. W. Horn pp. 1985-1988 Abstract    Full Text: [ HTML Sectioned HTML   PDF (496 kB)  GZipped PS   ]    Order
	Rapid partial melt crystallization of silicon for monolithic three-dimensional integration D. J. Witte, D. S. Pickard, F. Crnogorac, P. Pianetta, and R. F. W. Pease pp. 1989-1992 Abstract    Full Text: [ HTML Sectioned HTML   PDF (389 kB)  GZipped PS   ]    Order
	Surface energy induced patterning of organic and inorganic materials on heterogeneous Si surfaces L. Tao, A. Crouch, F. Yoon, B. K. Lee, J. S. Guthi, J. Kim, J. Gao, and W. Hu pp. 1993-1997 Abstract    Full Text: [ HTML Sectioned HTML   PDF (566 kB)  GZipped PS   ]    Order
Electron Beam Lithography [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Influence of the development process on ultimate resolution electron beam lithography, using ultrathin hydrogen silsesquioxane resist layers Anda E. Grigorescu, Marco C. van der Krogt, Cees W. Hagen, and Pieter Kruit pp. 1998-2003 Abstract    Full Text: [ HTML Sectioned HTML   PDF (666 kB)  GZipped PS   ]    Order
	Nanofabrication of high aspect ratio 24  nm x-ray zone plates for x-ray imaging applications Yan Feng, Michael Feser, Alan Lyon, Steve Rishton, Xianghui Zeng, Sharon Chen, Simone Sassolini, and Wenbing Yun pp. 2004-2007 Abstract    Full Text: [ HTML Sectioned HTML   PDF (956 kB)  GZipped PS   ]    Order
	Accurate control of remaining resist depth for nanoscale three-dimensional structures in electron-beam grayscale lithography S.-Y. Lee and K. Anbumony pp. 2008-2012 Abstract    Full Text: [ HTML Sectioned HTML   PDF (487 kB)  GZipped PS   ]    Order
	Optimal temperature for development of poly(methylmethacrylate) Bryan Cord, Jodie Lutkenhaus, and Karl K. Berggren pp. 2013-2016 Abstract    Full Text: [ HTML Sectioned HTML   PDF (471 kB)  GZipped PS   ]    Order
	Imaging with surface sensitive backscattered electrons T. Luo and A. Khursheed pp. 2017-2019 Abstract    Full Text: [ HTML Sectioned HTML   PDF (262 kB)  GZipped PS   ]    Order
	Novel magnetic microstigmator for electron beam astigmatism correction in the electron beam microcolumn system Rong Rong, Ho Seob Kim, Seong Soon Park, Nam Woo Hwang, Kyoung Wan Park, Sang Won Jin, and Chong H. Ahn pp. 2020-2024 Abstract    Full Text: [ HTML Sectioned HTML   PDF (894 kB)  GZipped PS   ]    Order
	Using high-contrast salty development of hydrogen silsesquioxane for sub-10-nm half-pitch lithography Joel K. W. Yang and Karl K. Berggren pp. 2025-2029 Abstract    Full Text: [ HTML Sectioned HTML   PDF (624 kB)  GZipped PS   ]    Order
	Sub-30-nm hybrid lithography (electron beam/deep ultraviolet) and etch process for fully depleted metal oxide semiconductor transistors S. Pauliac-Vaujour, P. Brianceau, S. Landis, J. Chiaroni, and O. Faynot pp. 2030-2033 Abstract    Full Text: [ HTML Sectioned HTML   PDF (318 kB)  GZipped PS   ]    Order
	Enhanced stitching for the fabrication of photonic structures by electron beam lithography M. Gnan, D. S. Macintyre, M. Sorel, R. M. De La Rue, and S. Thoms pp. 2034-2037 Abstract    Full Text: [ HTML Sectioned HTML   PDF (479 kB)  GZipped PS   ]    Order
	Evaluation of hybrid lithography and mix and match scenarios for electron beam direct write applications C. Hohle, C. Arndt, K.-H. Choi, J. Kretz, T. Lutz, F. Thrum, and K. Keil pp. 2038-2040 Abstract    Full Text: [ HTML Sectioned HTML   PDF (371 kB)  GZipped PS   ]    Order
	Patterning issues in superconducting nanowire single photon detector fabrication C. Constancias, R. Espiau de Lamaëstre, O. Louveau, P. Cavalier, and J.-C. Villégier pp. 2041-2044 Abstract    Full Text: [ HTML Sectioned HTML   PDF (253 kB)  GZipped PS   ]    Order
	Influence of temperature on HSQ electron-beam lithography M. Häffner, A. Haug, A. Heeren, M. Fleischer, H. Peisert, T. Chassé, and D. P. Kern pp. 2045-2048 Abstract    Full Text: [ HTML Sectioned HTML   PDF (625 kB)  GZipped PS   ]    Order
	Extracting the Boersch effect contribution from experimental energy spread measurements for Schottky electron emitters M. S. Bronsgeest, J. E. Barth, G. A. Schwind, L. W. Swanson, and P. Kruit pp. 2049-2054 Abstract    Full Text: [ HTML Sectioned HTML   PDF (348 kB)  GZipped PS   ]    Order
	Multilayer phase-only diffraction gratings: Fabrication and application to extreme ultraviolet optics Farhad Salmassi, Eric M. Gullikson, Erik H. Anderson, and Patrick P. Naulleau pp. 2055-2058 Abstract    Full Text: [ HTML Sectioned HTML   PDF (410 kB)  GZipped PS   ]    Order
	Process characterization of inductively coupled plasma etched silicon nanopillars by micro-Raman G. M. Laws, A. Handugan, T. Eschrich, P. Boland, C. Sinclair, S. Myhajlenko, and C. D. Poweleit pp. 2059-2063 Abstract    Full Text: [ HTML Sectioned HTML   PDF (507 kB)  GZipped PS   ]    Order
	Improving electron beam resist sensitivity by preexposure to deep ultraviolet radiation Raghunath Murali, Devin Brown, Kevin P. Martin, and James D. Meindl pp. 2064-2067 Abstract    Full Text: [ HTML Sectioned HTML   PDF (447 kB)  GZipped PS   ]    Order
	Fabrication of spiral-phase diffractive elements using scanning-electron-beam lithography Hsin-Yu Tsai, Henry I. Smith, and Rajesh Menon pp. 2068-2071 Abstract    Full Text: [ HTML Sectioned HTML   PDF (571 kB)  GZipped PS   ]    Order
	Real-time spatial-phase locking for vector-scan electron beam lithography Yugu Yang and J. T. Hastings pp. 2072-2076 Abstract    Full Text: [ HTML Sectioned HTML   PDF (472 kB)  GZipped PS   ]    Order
	Metal-semiconductor-metal electron detectors Rafael Aldana and R. Fabian Pease pp. 2077-2080 Abstract    Full Text: [ HTML Sectioned HTML   PDF (712 kB)  GZipped PS   ]    Order
	Nanometer-scale gaps in hydrogen silsesquioxane resist for T-gate fabrication Niu Jin, Sookyung Choi, Liang Wang, Guang Chen, DongHyun Kim, Vipan Kumar, and Ilesanmi Adesida pp. 2081-2084 Abstract    Full Text: [ HTML Sectioned HTML   PDF (496 kB)  GZipped PS   ]    Order
	Effects of developer temperature on electron-beam-exposed hydrogen silsesquioxane resist for ultradense silicon nanowire fabrication Sookyung Choi, Niu Jin, Vipan Kumar, Ilesanmi Adesida, and Mark Shannon pp. 2085-2088 Abstract    Full Text: [ HTML Sectioned HTML   PDF (322 kB)  GZipped PS   ]    Order
EUV Lithography [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Extreme ultraviolet lithography: From research to manufacturing Bruno La Fontaine, Yunfei Deng, Ryoung-han Kim, Harry J. Levinson, Uzodinma Okoroanyanwu, Richard Sandberg, Tom Wallow, and Obert Wood pp. 2089-2093 Abstract    Full Text: [ HTML Sectioned HTML   PDF (435 kB)  GZipped PS   ]    Order
	Nanoscale patterning in high resolution HSQ photoresist by interferometric lithography with tabletop extreme ultraviolet lasers P. W. Wachulak, M. G. Capeluto, M. C. Marconi, D. Patel, C. S. Menoni, and J. J. Rocca pp. 2094-2097 Abstract    Full Text: [ HTML Sectioned HTML   PDF (304 kB)  GZipped PS   ]    Order
	Growth and printability of multilayer phase defects on extreme ultraviolet mask blanks Ted Liang, Erdem Ultanir, Guojing Zhang, Seh-Jin Park, Erik Anderson, Eric Gullikson, Patrick Naulleau, Farhad Salmassi, Paul Mirkarimi, Eberhard Spiller, and Sherry Baker pp. 2098-2103 Abstract    Full Text: [ HTML Sectioned HTML   PDF (568 kB)  GZipped PS   ]    Order
	Evaluation of surface roughness of Zerodur® substrates machined by Ar+ ion beam with energy of 3–10  keV Yuichi Kurashima, Ryou Uozumi, Iwao Miyamoto, Manabu Ando, and Atsushi Numata pp. 2104-2109 Abstract    Full Text: [ HTML Sectioned HTML   PDF (815 kB)  GZipped PS   ]    Order
	Figuring and smoothing capabilities of elastic emission machining for low-thermal-expansion glass optics M. Kanaoka, C. Liu, K. Nomura, M. Ando, H. Takino, Y. Fukuda, H. Mimura, K. Yamauchi, and Y. Mori pp. 2110-2113 Abstract    Full Text: [ HTML Sectioned HTML   PDF (231 kB)  GZipped PS   ]    Order
	Estimation of diffusion lengths of acid and quencher in chemically amplified resist on the basis of extreme ultraviolet exposure results Yuusuke Tanaka, Yukiko Kikuchi, DooHoon Goo, Hiroaki Oizumi, and Iwao Nishiyama pp. 2114-2117 Abstract    Full Text: [ HTML Sectioned HTML   PDF (970 kB)  GZipped PS   ]    Order
	In situ x-ray absorption near-edge structure analysis for extreme ultraviolet lithography projection optics contamination Masahito Niibe, Yukinobu Kakutani, Keigo Koida, Shuichi Matsunari, Takashi Aoki, Shigeru Terashima, Hiromitsu Takase, Katsuhiko Murakami, and Yasuaki Fukuda pp. 2118-2122 Abstract    Full Text: [ HTML Sectioned HTML   PDF (437 kB)  GZipped PS   ]    Order
	Bit-array patterns with density over 1  Tbit/in.2 fabricated by extreme ultraviolet interference lithography Harun H. Solak and Yasin Ekinci pp. 2123-2126 Abstract    Full Text: [ HTML Sectioned HTML   PDF (388 kB)  GZipped PS   ]    Order
	Extreme ultraviolet lithography at IMEC: Shadowing compensation and flare mitigation strategy G. F. Lorusso, A. M. Goethals, R. Jonckheere, J. Hermans, K. Ronse, A. M. Myers, I. Kim, A. Niroomand, F. Iwamoto, and D. Ritter pp. 2127-2131 Abstract    Full Text: [ HTML Sectioned HTML   PDF (407 kB)  GZipped PS   ]    Order
	Advanced resist testing using the SEMATECH Berkeley extreme ultraviolet microfield exposure tool Patrick P. Naulleau, Christopher N. Anderson, Kim Dean, Paul Denham, Kenneth A. Goldberg, Brian Hoef, Dimitra Niakoula, Bruno La Fontaine, and Tom Wallow pp. 2132-2135 Abstract    Full Text: [ HTML Sectioned HTML   PDF (397 kB)  GZipped PS   ]    Order
	Effects of photoacid generator incorporation into the polymer main chain on 193  nm chemically amplified resist behavior and lithographic performance Cheng-Tsung Lee, Clifford L. Henderson, Mingxing Wang, Kenneth E. Gonsalves, and Wang Yueh pp. 2136-2139 Abstract    Full Text: [ HTML Sectioned HTML   PDF (216 kB)  GZipped PS   ]    Order
	Influence of solubility switching mechanism on resist performance in molecular glass resists Richard A. Lawson, Cheng-Tsung Lee, Clifford L. Henderson, Robert Whetsell, Laren Tolbert, and Wang Yueh pp. 2140-2144 Abstract    Full Text: [ HTML Sectioned HTML   PDF (309 kB)  GZipped PS   ]    Order
	Progress in extreme ultraviolet interferometric and holographic lithography A. Isoyan, Y.-C. Cheng, F. Jiang, J. Wallace, F. Cerrina, and S. Bollepalli pp. 2145-2150 Abstract    Full Text: [ HTML Sectioned HTML   PDF (659 kB)  GZipped PS   ]    Order
	Dual-domain scanning illuminator for the SEMATECH Berkeley microfield exposure tool Christopher N. Anderson, Patrick P. Naulleau, Paul Denham, Drew Kemp, and Senajith Rekawa pp. 2151-2154 Abstract    Full Text: [ HTML Sectioned HTML   PDF (449 kB)  GZipped PS   ]    Order
	Analysis of Coulomb and Johnsen-Rahbek electrostatic chuck performance for extreme ultraviolet lithography M. R. Sogard, A. R. Mikkelson, M. Nataraju, K. T. Turner, and R. L. Engelstad pp. 2155-2161 Abstract    Full Text: [ HTML Sectioned HTML   PDF (768 kB)  GZipped PS   ]    Order
Ion Beam Lithography and X-ray Lithography [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Production of noble gas ion beams in a focused ion beam machine using an electron beam ion trap Falk Ullmann, Frank Grossmann, Vladimir P. Ovsyannikov, Jacques Gierak, Eric Bourhis, Jacques Ferré, Jean Pierre Jamet, Alexandra Mougin, and Günter Zschornack pp. 2162-2167 Abstract    Full Text: [ HTML Sectioned HTML   PDF (732 kB)  GZipped PS   ]    Order
	Fabrication of zinc nanotip arrays by ion beam sputtering Liang-Chiun Chao, Chung-Chi Liau, Jun-Wei Lee, and Fu-Chieh Tsai pp. 2168-2170 Abstract    Full Text: [ HTML Sectioned HTML   PDF (551 kB)  GZipped PS   ]    Order
	Fabrication of three-dimensional structures of resist by proton beam writing Yusuke Furuta, Naoyuki Uchiya, Hiroyuki Nishikawa, Junji Haga, Takahiro Sato, Masakazu Oikawa, Yasuyuki Ishii, and Tomihiro Kamiya pp. 2171-2174 Abstract    Full Text: [ HTML Sectioned HTML   PDF (596 kB)  GZipped PS   ]    Order
	Focused ion beam iodine-enhanced etching of high aspect ratio holes in InP photonic crystals V. Callegari, P. M. Nellen, J. Kaufmann, P. Strasser, F. Robin, and U. Sennhauser pp. 2175-2179 Abstract    Full Text: [ HTML Sectioned HTML   PDF (515 kB)  GZipped PS   ]    Order
	Deposition of carbonaceous structures using focused Au and Si ion-beam-induced chemical vapor deposition methods Ryo Okada, Takuma Yo, Junichi Yanagisawa, and Shinji Matsui pp. 2180-2183 Abstract    Full Text: [ HTML Sectioned HTML   PDF (547 kB)  GZipped PS   ]    Order
	Membrane folding by helium ion implantation for three-dimensional device fabrication William J. Arora, Sybren Sijbrandij, Lewis Stern, John Notte, Henry I. Smith, and George Barbastathis pp. 2184-2187 Abstract    Full Text: [ HTML Sectioned HTML   PDF (253 kB)  GZipped PS   ]    Order
	Design studies for a high brightness, energetic neutral atom source for proximity lithography Hong-jie Guo, Barry Craver, Jackson Reynolds, and John C. Wolfe pp. 2188-2191 Abstract    Full Text: [ HTML Sectioned HTML   PDF (190 kB)  GZipped PS   ]    Order
	Mechanical nanostepping for atom beam lithography B. Craver, A. Roy, H. Nounu, and J. C. Wolfe pp. 2192-2195 Abstract    Full Text: [ HTML Sectioned HTML   PDF (376 kB)  GZipped PS   ]    Order
	Fabrication of a needle array using a Si gray mask for x-ray lithography Harutaka Mekaru, Takayuki Takano, Koichi Awazu, Masaharu Takahashi, and Ryutaro Maeda pp. 2196-2201 Abstract    Full Text: [ HTML Sectioned HTML   PDF (729 kB)  GZipped PS   ]    Order
Maskless Lithography [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Challenges in 1  Teradot/in.2 dot patterning using electron beam lithography for bit-patterned media XiaoMin Yang, Shuaigang Xiao, Wei Wu, Yuan Xu, Keith Mountfield, Robert Rottmayer, Kim Lee, David Kuo, and Dieter Weller pp. 2202-2209 Abstract    Full Text: [ HTML Sectioned HTML   PDF (1726 kB)  GZipped PS   ]    Order
	In situ monitoring and control of material growth for high resolution electron beam induced deposition W. F. van Dorp, C. W. Hagen, P. A. Crozier, and P. Kruit pp. 2210-2214 Abstract    Full Text: [ HTML Sectioned HTML   PDF (457 kB)  GZipped PS   ]    Order
	Redeposition characteristics of focused ion beam milling for nanofabrication D. A. M. de Winter and J. J. L. Mulders pp. 2215-2218 Abstract    Full Text: [ HTML Sectioned HTML   PDF (570 kB)  GZipped PS   ]    Order
	Resolution in focused electron- and ion-beam induced processing Ivo Utke, Vinzenz Friedli, Martin Purrucker, and Johann Michler pp. 2219-2223 Abstract    Full Text: [ HTML Sectioned HTML   PDF (333 kB)  GZipped PS   ]    Order
	Fabrication of 22  nm half-pitch silicon lines by single-exposure self-aligned spatial-frequency doubling Alex K. Raub, Dong Li, Andrew Frauenglass, and S. R. J. Brueck pp. 2224-2227 Abstract    Full Text: [ HTML Sectioned HTML   PDF (336 kB)  GZipped PS   ]    Order
	Focused electron beam induced deposition of nickel A. Perentes, G. Sinicco, G. Boero, B. Dwir, and P. Hoffmann pp. 2228-2232 Abstract    Full Text: [ HTML Sectioned HTML   PDF (208 kB)  GZipped PS   ]    Order
	Oxygen assisted focused electron beam induced deposition of Si-containing materials: Growth dynamics A. Perentes and P. Hoffmann pp. 2233-2238 Abstract    Full Text: [ HTML Sectioned HTML   PDF (212 kB)  GZipped PS   ]    Order
	High brightness 100-electron-beam source for high-resolution applications Yanxia Zhang and P. Kruit pp. 2239-2244 Abstract    Full Text: [ HTML Sectioned HTML   PDF (547 kB)  GZipped PS   ]    Order
	Cathode ray tube type electron gun as a source for multibeam electron lithography A. J. van den Brom, A. H. V. van Veen, W. M. Weeda, G. Z. M. Berglund, M. Wieland, and P. Kruit pp. 2245-2249 Abstract    Full Text: [ HTML Sectioned HTML   PDF (165 kB)  GZipped PS   ]    Order
	Annealing of electron beam induced deposits of platinum from Pt(PF3)4 Matthew H. Ervin, Daniel Chang, Barbara Nichols, Alma Wickenden, John Barry, and John Melngailis pp. 2250-2254 Abstract    Full Text: [ HTML Sectioned HTML   PDF (758 kB)  GZipped PS   ]    Order
	Electrospun DNA nanofibers Leon M. Bellan, Elizabeth A. Strychalski, and Harold G. Craighead pp. 2255-2257 Abstract    Full Text: [ HTML Sectioned HTML   PDF (231 kB)  GZipped PS   ]    Order
	Multiple beam sub-80-nm lithography with miniature electron beam column arrays C. S. Silver, J. P. Spallas, and L. P. Muray pp. 2258-2265 Abstract    Full Text: [ HTML Sectioned HTML   PDF (1000 kB)  GZipped PS   ]    Order
	CsBr/GaN heterojunction photoelectron source Juan R. Maldonado, Zhi Liu, Yun Sun, Scott Schuetter, Piero Pianetta, and R. F. W. Pease pp. 2266-2270 Abstract    Full Text: [ HTML Sectioned HTML   PDF (758 kB)  GZipped PS   ]    Order
	Subwavelength proximity nanolithography using a plasmonic lens Sungkyu Seo, Hyun Chul Kim, Hyungduk Ko, and Mosong Cheng pp. 2271-2276 Abstract    Full Text: [ HTML Sectioned HTML   PDF (530 kB)  GZipped PS   ]    Order
	Monolithic multichannel secondary electron detector for distributed axis electron beam lithography and inspection D. S. Pickard, C. Kenney, S. Tanimoto, T. Crane, T. Groves, and R. F. W. Pease pp. 2277-2283 Abstract    Full Text: [ HTML Sectioned HTML   PDF (954 kB)  GZipped PS   ]    Order
	Atomic-force lithography with interferometric tip-to-substrate position metrology Euclid E. Moon, Jan Kupec, Mark K. Mondol, Henry I. Smith, and Karl K. Berggren pp. 2284-2287 Abstract    Full Text: [ HTML Sectioned HTML   PDF (363 kB)  GZipped PS   ]    Order
Modeling Simulation and CAD [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Electron beam and optical proximity effect reduction for nanolithography: New results Martin Peckerar, David Sander, Ankur Srivastava, Adakou Foli, and Uzi Vishkin pp. 2288-2294 Abstract    Full Text: [ HTML Sectioned HTML   PDF (303 kB)  GZipped PS   ]    Order
	Image contrast slope and line edge roughness of chemically amplified resists for postoptical lithography Takahiro Kozawa, Seiichi Tagawa, Julius Joseph Santillan, Minoru Toriumi, and Toshiro Itani pp. 2295-2300 Abstract    Full Text: [ HTML Sectioned HTML   PDF (260 kB)  GZipped PS   ]    Order
	Study of the assist features effect on the through focus behavior in isoline with an innovative method Jianliang Li, Qiliang Yan, and Lawrence S. Melvin, III pp. 2301-2306 Abstract    Full Text: [ HTML Sectioned HTML   PDF (406 kB)  GZipped PS   ]    Order
	Pattern matching, simulation, and metrology of complex layouts fabricated by electron beam lithography N. Tsikrikas, D. Drygiannakis, G. P. Patsis, I. Raptis, A. Gerardino, S. Stavroulakis, and E. Voyiatzis pp. 2307-2311 Abstract    Full Text: [ HTML Sectioned HTML   PDF (530 kB)  GZipped PS   ]    Order
Nanoimprint and Soft Lithography [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Visualization of mold filling stages in thermal nanoimprint by using pressure gradients Helmut Schift, Sandro Bellini, Morten Bo Mikkelsen, and Jens Gobrecht pp. 2312-2316 Abstract    Full Text: [ HTML Sectioned HTML   PDF (516 kB)  GZipped PS   ]    Order
	Ultrastiff stage for imprint lithography Y. Jeon, M. Feldman, and L. Jiang pp. 2317-2320 Abstract    Full Text: [ HTML Sectioned HTML   PDF (263 kB)  GZipped PS   ]    Order
	Chemical nanoimprint lithography for step-and-repeat Si patterning Hideo Namatsu, Masatoshi Oda, Atsushi Yokoo, Makoto Fukuda, Koichi Irisa, Shigeyuki Tsurumi, and Kazuhiko Komatsu pp. 2321-2324 Abstract    Full Text: [ HTML Sectioned HTML   PDF (393 kB)  GZipped PS   ]    Order
	Optimizing nanoimprint and transfer-bonding techniques for three-dimensional polymer microstructures Hyunsoo Park, Huifeng Li, and Xing Cheng pp. 2325-2328 Abstract    Full Text: [ HTML Sectioned HTML   PDF (267 kB)  GZipped PS   ]    Order
	Fabrication of terahertz holograms E. D. Walsby, J. Alton, C. H. Worrall, H. E. Beere, D. A. Ritchie, J. Leach, M. Padgett, and D. R. S. Cumming pp. 2329-2332 Abstract    Full Text: [ HTML Sectioned HTML   PDF (416 kB)  GZipped PS   ]    Order
	UV-nanoimprint with the assistance of gas condensation at atmospheric environmental pressure Hiroshi Hiroshima and Masanori Komuro pp. 2333-2336 Abstract    Full Text: [ HTML Sectioned HTML   PDF (577 kB)  GZipped PS   ]    Order
	Fabrication of 3D-photonic crystals via UV-nanoimprint lithography Thomas Glinsner, Paul Lindner, Michael Mühlberger, Iris Bergmair, Rainer Schöftner, Kurt Hingerl, Holger Schmid, and Ernst-Bernhard Kley pp. 2337-2340 Abstract    Full Text: [ HTML Sectioned HTML   PDF (408 kB)  GZipped PS   ]    Order
	Time dependent analysis of the resist deformation in thermal nanoimprint Yoshihiko Hirai, Yuki Onishi, Toshiaki Tanabe, Masayoshi Nishihata, Takuya Iwasaki, Hiroaki Kawata, and Yasuroh Iriye pp. 2341-2345 Abstract    Full Text: [ HTML Sectioned HTML   PDF (585 kB)  GZipped PS   ]    Order
	Nanoimprint lithography processes on 200  mm Si wafer for optical application: Residual thickness etching anisotropy N. Chaix, C. Gourgon, C. Perret, S. Landis, and T. Leveder pp. 2346-2351 Abstract    Full Text: [ HTML Sectioned HTML   PDF (960 kB)  GZipped PS   ]    Order
	Stretching and selective immobilization of DNA in SU-8 micro- and nanochannels B. Yang, V. R. Dukkipati, D. Li, B. L. Cardozo, and S. W. Pang pp. 2352-2356 Abstract    Full Text: [ HTML Sectioned HTML   PDF (271 kB)  GZipped PS   ]    Order
	Fabrication of three dimensional structures for an UV curable nanoimprint lithography mold using variable dose control with critical-energy electron beam exposure K. Mohamed, M. M. Alkaisi, and R. J. Blaikie pp. 2357-2360 Abstract    Full Text: [ HTML Sectioned HTML   PDF (555 kB)  GZipped PS   ]    Order
	Sub-100-nm three-dimensional nanoimprint lithography Noriyuki Unno, Jun Taniguchi, and Yoshiaki Ishii pp. 2361-2364 Abstract    Full Text: [ HTML Sectioned HTML   PDF (653 kB)  GZipped PS   ]    Order
	Surface characterization of imprinted resist above glass transition temperature T. Lévéder, S. Landis, L. Davoust, S. Soulan, J.-H. Tortai, and N. Chaix pp. 2365-2369 Abstract    Full Text: [ HTML Sectioned HTML   PDF (455 kB)  GZipped PS   ]    Order
	Micro-nano mixture patterning by thermal-UV novel nanoimprint Keisuke Okuda, Naoyuki Niimi, Hiroaki Kawata, and Yoshihiko Hirai pp. 2370-2372 Abstract    Full Text: [ HTML Sectioned HTML   PDF (396 kB)  GZipped PS   ]    Order
	Benchmarking of 50  nm features in thermal nanoimprint C. Gourgon, N. Chaix, H. Schift, M. Tormen, S. Landis, C. M. Sotomayor Torres, A. Kristensen, R. H. Pedersen, M. B. Christiansen, I. Fernandez-Cuesta, D. Mendels, L. Montelius, and T. Haatainen pp. 2373-2378 Abstract    Full Text: [ HTML Sectioned HTML   PDF (512 kB)  GZipped PS   ]    Order
	Coarse-grain simulation of viscous flow and stamp deformation in nanoimprint V. Sirotkin, A. Svintsov, S. Zaitsev, and H. Schift pp. 2379-2383 Abstract    Full Text: [ HTML Sectioned HTML   PDF (814 kB)  GZipped PS   ]    Order
	Photopolymerization kinetic study of UV nanoimprint lithography dedicated resists P. Voisin, M. Zelsmann, H. Ridaoui, M. Chouiki, C. Gourgon, J. Boussey, and K. Zahouily pp. 2384-2387 Abstract    Full Text: [ HTML Sectioned HTML   PDF (197 kB)  GZipped PS   ]    Order
	Bilayer metal wire-grid polarizer fabricated by roll-to-roll nanoimprint lithography on flexible plastic substrate Se Hyun Ahn, Jin-Sung Kim, and L. Jay Guo pp. 2388-2391 Abstract    Full Text: [ HTML Sectioned HTML   PDF (409 kB)  GZipped PS   ]    Order
	Impact of glass temperature for thermal nanoimprint H.-C. Scheer, N. Bogdanski, M. Wissen, and S. Möllenbeck pp. 2392-2395 Abstract    Full Text: [ HTML Sectioned HTML   PDF (276 kB)  GZipped PS   ]    Order
	Characterizing nanoimprint profile shape and polymer flow behavior using visible light angular scatterometry Rayan M. Al-Assaad, Suresh Regonda, Li Tao, Stella W. Pang, and Wenchuang (Walter) Hu pp. 2396-2401 Abstract    Full Text: [ HTML Sectioned HTML   PDF (468 kB)  GZipped PS   ]    Order
	Nonresidual layer imprinting and new replication capabilities demonstrated for fast thermal curable polydimethysiloxanes Carlos Pina-Hernandez, Jin-Sung Kim, Peng-Fei Fu, and L. Jay Guo pp. 2402-2406 Abstract    Full Text: [ HTML Sectioned HTML   PDF (454 kB)  GZipped PS   ]    Order
	Simple fabrication of UV nanoimprint templates using critical energy electron beam lithography Jaebum Joo, Kimin Jun, and Joseph M. Jacobson pp. 2407-2411 Abstract    Full Text: [ HTML Sectioned HTML   PDF (403 kB)  GZipped PS   ]    Order
	Creating micro- and nanostructures on tubular and spherical surfaces O. Lima, L. Tan, A. Goel, M. Negahban, and Z. Li pp. 2412-2418 Abstract    Full Text: [ HTML Sectioned HTML   PDF (918 kB)  GZipped PS   ]    Order
	Solid-state electrochemical nanoimprinting of copper Peter L. Schultz, Keng H. Hsu, Nicholas X. Fang, and Placid M. Ferreira pp. 2419-2424 Abstract    Full Text: [ HTML Sectioned HTML   PDF (624 kB)  GZipped PS   ]    Order
	Economic approximate models for backscattered electrons Leili Baghaei Rad, Ian Downes, Jun Ye, David Adler, and R. Fabian W. Pease pp. 2425-2429 Abstract    Full Text: [ HTML Sectioned HTML   PDF (628 kB)  GZipped PS   ]    Order
	Improved release strategy for UV nanoimprint lithography Sophie Garidel, Marc Zelsmann, Nicolas Chaix, Pauline Voisin, Jumana Boussey, Arnaud Beaurain, and Bernard Pelissier pp. 2430-2434 Abstract    Full Text: [ HTML Sectioned HTML   PDF (327 kB)  GZipped PS   ]    Order
	Viscosity measurement of nanoimprint lithography resists with a rheological nanoindenter A. A. Svintsov, O. V. Trofimov, and S. I. Zaitsev pp. 2435-2438 Abstract    Full Text: [ HTML Sectioned HTML   PDF (779 kB)  GZipped PS   ]    Order
Optical Lithography [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Phase control in multiexposure spatial frequency multiplication Yong Zhao, Chih-Hao Chang, Ralf K. Heilmann, and Mark L. Schattenburg pp. 2439-2443 Abstract    Full Text: [ HTML Sectioned HTML   PDF (705 kB)  GZipped PS   ]    Order
	Study of process contributions to total overlay error budget for sub-60-nm memory devices Jangho Shin, Hyunjae Kang, SungWon Choi, Seoukhoon Woo, Hochul Kim, SukJoo Lee, Junghyeon Lee, and Chang-Jin Kang pp. 2444-2446 Abstract    Full Text: [ HTML Sectioned HTML   PDF (248 kB)  GZipped PS   ]    Order
	Deep ultraviolet photolithography capability of ZEP520A electron beam resist for mix and match lithography Devin K. Brown pp. 2447-2450 Abstract    Full Text: [ HTML Sectioned HTML   PDF (542 kB)  GZipped PS   ]    Order
	Photolithography using an optical microscope Ron Gonski and John Melngailis pp. 2451-2452 Abstract    Full Text: [ HTML Sectioned HTML   PDF (282 kB)  GZipped PS   ]    Order
	Experimental demonstration of dark field illumination using contact hole features Michael M. Crouse, Emil Schmitt-Weaver, Steven G. Hansen, and Robert Routh pp. 2453-2460 Abstract    Full Text: [ HTML Sectioned HTML   PDF (1334 kB)  GZipped PS   ]    Order
	Double patterning overlay budget for 45  nm technology node single and double mask approach Pierluigi Rigolli, Catia Turco, Umberto Iessi, Gianfranco Capetti, Paolo Canestrari, and Aldo Fradilli pp. 2461-2465 Abstract    Full Text: [ HTML Sectioned HTML   PDF (484 kB)  GZipped PS   ]    Order
	Application of contrast enhancement layer to 193  nm lithography Ryoung-han Kim and Harry J. Levinson pp. 2466-2470 Abstract    Full Text: [ HTML Sectioned HTML   PDF (592 kB)  GZipped PS   ]    Order
	Lithography, plasmonics, and subwavelength aperture exposure technology Yves Ngu, Marty Peckerar, Mario Dagenais, John Barry, and Birendra (Raj) Dutt pp. 2471-2475 Abstract    Full Text: [ HTML Sectioned HTML   PDF (455 kB)  GZipped PS   ]    Order
	Laser interferometric nanolithography using a new positive chemical amplified resist R. Luttge, H. A. G. M. van Wolferen, and L. Abelmann pp. 2476-2480 Abstract    Full Text: [ HTML Sectioned HTML   PDF (477 kB)  GZipped PS   ]    Order
Photoresist Technology [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Acid distribution in chemically amplified extreme ultraviolet resist Takahiro Kozawa, Seiichi Tagawa, Heidi B. Cao, Hai Deng, and Michael J. Leeson pp. 2481-2485 Abstract    Full Text: [ HTML Sectioned HTML   PDF (169 kB)  GZipped PS   ]    Order
	Dissolution characteristics and reaction kinetics of molecular resists for extreme-ultraviolet lithography Minoru Toriumi, Julius Santillan, Toshiro Itani, Takahiro Kozawa, and Seiichi Tagawa pp. 2486-2489 Abstract    Full Text: [ HTML Sectioned HTML   PDF (85 kB)  GZipped PS   ]    Order
	Are extreme ultraviolet resists ready for the 32  nm node? Karen Petrillo, Yayi Wei, R. Brainard, G. Denbeaux, Dario Goldfarb, C.-S. Koay, J. Mackey, Warren Montgomery, W. Pierson, T. Wallow, and Obert Wood pp. 2490-2495 Abstract    Full Text: [ HTML Sectioned HTML   PDF (668 kB)  GZipped PS   ]    Order
	Measurements of acid generation by extreme ultraviolet irradiation in lithographic films Martin Glodde, Dario L. Goldfarb, David R. Medeiros, Gregory M. Wallraff, and Gregory P. Denbeaux pp. 2496-2503 Abstract    Full Text: [ HTML Sectioned HTML   PDF (520 kB)  GZipped PS   ]    Order
	Geometry impact on ultrahigh resolution pattern collapse A. Jouve, J. Simon, L. Gonon, and J. H. Tortai pp. 2504-2507 Abstract    Full Text: [ HTML Sectioned HTML   PDF (345 kB)  GZipped PS   ]    Order
	Pixelated chemically amplified resists: Investigation of material structure on the spatial distribution of photoacids and line edge roughness Young-Hye La, Insik-In, Sang-Min Park, Robert P. Meagley, Melvina Leolukman, Padma Gopalan, and Paul F. Nealey pp. 2508-2513 Abstract    Full Text: [ HTML Sectioned HTML   PDF (532 kB)  GZipped PS   ]    Order
	Direct measurement of the spatial extent of the in situ developed latent image by neutron reflectivity Vivek M. Prabhu, Bryan D. Vogt, Shuhui Kang, Ashwin Rao, Eric K. Lin, and Sushil K. Satija pp. 2514-2520 Abstract    Full Text: [ HTML Sectioned HTML   PDF (500 kB)  GZipped PS   ]    Order
Metrology [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	High throughput defect detection with multiple parallel electron beams H. M. P. van Himbergen, M. D. Nijkerk, P. W. H. de Jager, T. C. Hosman, and P. Kruit pp. 2521-2525 Abstract    Full Text: [ HTML Sectioned HTML   PDF (396 kB)  GZipped PS   ]    Order
	Photoresist cross-sectioning with negligible damage using a dual-beam FIB-SEM: A high throughput method for profile imaging James S. Clarke, Michael B. Schmidt, and Ndubuisi G. Orji pp. 2526-2530 Abstract    Full Text: [ HTML Sectioned HTML   PDF (558 kB)  GZipped PS   ]    Order
Nanodevices [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Hybrid semiconductor/nanoelectronic circuits: Freeing advanced lithography from the alignment accuracy burden Konstantin K. Likharev pp. 2531-2536 Abstract    Full Text: [ HTML Sectioned HTML   PDF (739 kB)  GZipped PS   ]    Order
	Photolithographic synthesis of high-density DNA probe arrays: Challenges and opportunities Adam R. Pawloski, Glenn McGall, Robert G. Kuimelis, Dale Barone, Andrea Cuppoletti, Paul Ciccolella, Eric Spence, Farhana Afroz, Paul Bury, Christy Chen, Chuan Chen, Dexter Pao, Mary Le, Becky McGee, Elizabeth Harkins et al. pp. 2537-2546 Abstract    Full Text: [ HTML Sectioned HTML   PDF (1141 kB)  GZipped PS   ]    Order
	Helium ion microscope invasiveness and imaging study for semiconductor applications Richard H. Livengood, Yuval Greenzweig, Ted Liang, and Michael Grumski pp. 2547-2552 Abstract    Full Text: [ HTML Sectioned HTML   PDF (860 kB)  GZipped PS   ]    Order
	Dry etch release processes for micromachining applications Tongtong Zhu, Petros Argyrakis, Enrico Mastropaolo, Kin Kiong Lee, and Rebecca Cheung pp. 2553-2557 Abstract    Full Text: [ HTML Sectioned HTML   PDF (451 kB)  GZipped PS   ]    Order
	Mechanical properties of suspended graphene sheets I. W. Frank, D. M. Tanenbaum, A. M. van der Zande, and P. L. McEuen pp. 2558-2561 Abstract    Full Text: [ HTML Sectioned HTML   PDF (306 kB)  GZipped PS   ]    Order
	Surface gate and contact alignment for buried, atomically precise scanning tunneling microscopy–patterned devices Martin Fuechsle, Frank J. Rueß, Thilo C. G. Reusch, Mladen Mitic, and Michelle Y. Simmons pp. 2562-2567 Abstract    Full Text: [ HTML Sectioned HTML   PDF (592 kB)  GZipped PS   ]    Order
	Novel coexisted sol-gel derived poly-Si-oxide-nitride-oxide-silicon type memory Hsin-Chiang You, Chi-Chang Wu, Fu-Hsiang Ko, Tan-Fu Lei, and Wen-Luh Yang pp. 2568-2571 Abstract    Full Text: [ HTML Sectioned HTML   PDF (515 kB)  GZipped PS   ]    Order
	Adaptive wiring for 20  nm scale epitaxial silicon Ohmic contacts to silicon nanowires M. J. Rooks, G. M. Cohen, J. O. Chu, P. M. Solomon, J. A. Ott, R. J. Miller, R. Viswanathan, and W. Haensch pp. 2572-2576 Abstract    Full Text: [ HTML Sectioned HTML   PDF (426 kB)  GZipped PS   ]    Order
	Hybrid carbon nanotube-silicon complementary metal oxide semiconductor circuits I. Meric, V. Caruso, R. Caldwell, J. Hone, K. L. Shepard, and S. J. Wind pp. 2577-2580 Abstract    Full Text: [ HTML Sectioned HTML   PDF (397 kB)  GZipped PS   ]    Order
	Hydrogen plasma-enhanced atomic layer deposition of copper thin films Liqi Wu and Eric Eisenbraun pp. 2581-2585 Abstract    Full Text: [ HTML Sectioned HTML   PDF (375 kB)  GZipped PS   ]    Order
	Emission characteristics of Au60Be40 and Au62Si23Be15 liquid metal ion sources G. A. Schwind and L. W. Swanson pp. 2586-2592 Abstract    Full Text: [ HTML Sectioned HTML   PDF (129 kB)  GZipped PS   ]    Order
	Fabrication of ultrahigh aspect ratio freestanding gratings on silicon-on-insulator wafers Minseung Ahn, Ralf K. Heilmann, and Mark L. Schattenburg pp. 2593-2597 Abstract    Full Text: [ HTML Sectioned HTML   PDF (818 kB)  GZipped PS   ]    Order
	Soft x-ray imaging of spin dynamics at high spatial and temporal resolution Brooke L. Mesler, Peter Fischer, Weilun Chao, Erik H. Anderson, and Dong-Hyun Kim pp. 2598-2602 Abstract    Full Text: [ HTML Sectioned HTML   PDF (306 kB)  GZipped PS   ]    Order
	Ultrathin magnetic multilayer films for low-field microwave notch filters Bijoy K. Kuanr, Alka V. Kuanr, T. Fal, R. E. Camley, and Z. Celinski pp. 2603-2606 Abstract    Full Text: [ HTML Sectioned HTML   PDF (291 kB)  GZipped PS   ]    Order
	Study of fluorine bombardment on the electrical properties of AlGaN/GaN heterostructures Anirban Basu, Vipan Kumar, and Ilesanmi Adesida pp. 2607-2610 Abstract    Full Text: [ HTML Sectioned HTML   PDF (167 kB)  GZipped PS   ]    Order
	Prospects for nanowire sculptured-thin-film devices Sean M. Pursel and Mark W. Horn pp. 2611-2615 Abstract    Full Text: [ HTML Sectioned HTML   PDF (636 kB)  GZipped PS   ]    Order
	First-principles calculation of electronic structure and magnetic properties of copper adsorbed polar-ZnO surface Yoon-Suk Kim and Yong-Chae Chung pp. 2616-2618 Abstract    Full Text: [ HTML Sectioned HTML   PDF (221 kB)  GZipped PS   ]    Order
	Nickel nanowires for planer microwave circuit applications and characterization Ryan L. Marson, Bijoy K. Kuanr, Sanjay R. Mishra, R. E. Camley, and Z. Celinski pp. 2619-2623 Abstract    Full Text: [ HTML Sectioned HTML   PDF (204 kB)  GZipped PS   ]    Order
	In situ visualization of local electric field in an ultrasharp tungsten emitter under a low voltage scanning transmission electron microscope Jun-Ichi Fujita, Yuta Ikeda, Satoshi Okada, Kodai Higashi, Shotaro Nakasawa, Masahiko Ishida, and Shinji Matsui pp. 2624-2627 Abstract    Full Text: [ HTML Sectioned HTML   PDF (417 kB)  GZipped PS   ]    Order
Photonics [ Previous / Next Subject | Issue Index | Top / Bottom of Page]
	Fabrication and tuning of nanoscale metallic ring and split-ring arrays A. K. Sheridan, A. W. Clark, A. Glidle, J. M. Cooper, and D. R. S. Cumming pp. 2628-2631 Abstract    Full Text: [ HTML Sectioned HTML   PDF (418 kB)  GZipped PS   ]    Order
	Fabrication of two dimensional GaN nanophotonic crystals (31) Bifeng Rong, Huub W. M. Salemink, Erik M. Roeling, Rob van der Heijden, Fouad Karouta, and Emile van der Drift pp. 2632-2636 Abstract    Full Text: [ HTML Sectioned HTML   PDF (296 kB)  GZipped PS   ]    Order
	Semitransparent Cu electrode on a flexible substrate and its application in organic light emitting diodes Myung-Gyu Kang and L. Jay Guo pp. 2637-2641 Abstract    Full Text: [ HTML Sectioned HTML   PDF (508 kB)  GZipped PS   ]    Order
	Photoluminescence enhancement in metallic nanocomposite printable polymer V. Reboud, N. Kehagias, M. Striccoli, T. Placido, A. Panniello, M. L. Curri, M. Zelsmann, F. Reuther, G. Gruetzner, and C. M. Sotomayor Torres pp. 2642-2644 Abstract    Full Text: [ HTML Sectioned HTML   PDF (176 kB)  GZipped PS   ]    Order
	Fabrication of high aspect ratio Si nanogratings with smooth sidewalls for a deep UV-blocking particle filter Pran Mukherjee, Myung-Gyu Kang, Thomas H. Zurbuchen, L. Jay Guo, and Fred A. Herrero pp. 2645-2648 Abstract    Full Text: [ HTML Sectioned HTML   PDF (442 kB)  GZipped PS   ]    Order
	V-groove plasmonic waveguides fabricated by nanoimprint lithography Irene Fernandez-Cuesta, Rasmus Bundgaard Nielsen, Alexandra Boltasseva, Xavier Borrisé, Francesc Pérez-Murano, and Anders Kristensen pp. 2649-2653 Abstract    Full Text: [ HTML Sectioned HTML   PDF (439 kB)  GZipped PS   ]    Order
	58  nm half-pitch plastic wire-grid polarizer by nanoimprint lithography Lei Chen, Jian Jim Wang, Frank Walters, Xuegong Deng, Mike Buonanno, Stephen Tai, and Xiaoming Liu pp. 2654-2657 Abstract    Full Text: [ HTML Sectioned HTML   PDF (625 kB)  GZipped PS   ]    Order
	Optimization of hydrogen silsesquioxane for photonic applications C. W. Holzwarth, T. Barwicz, and Henry I. Smith pp. 2658-2661 Abstract    Full Text: [ HTML Sectioned HTML   PDF (220 kB)  GZipped PS   ]    Order
	Membrane stacking: A new approach for three-dimensional nanostructure fabrication Amil A. Patel and Henry I. Smith pp. 2662-2664 Abstract    Full Text: [ HTML Sectioned HTML   PDF (292 kB)  GZipped PS   ]    Order

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